公开(公告)号：US4909862A

公开(公告)日：1990-03-20

申请号：US365856

申请日：1989-06-13

申请人： Hideo Tachikawa ,  Tohru Arai ,  Hironori Fujita ,  Kazuyuki Oguri

发明人： Hideo Tachikawa ,  Tohru Arai ,  Hironori Fujita ,  Kazuyuki Oguri

IPC分类号： C23C8/36 ,  C23F4/00

CPC分类号： C23C8/36

摘要： A process for ion nitriding aluminum material which comprises the steps of placing an object of aluminum or aluminum alloy for treatment in a closed vessel; evacuating residual oxygen gas from said closed vessel; charging said closed vessel with a heating gas and inducing discharges in said closed vessel, thereby heating the surface of the object for treatment to a prescribed nitriding temperature; charging said closed vessel with a surface-roughening gas composed of a rare gas and 5-2000 ppm of a gas containing at least one element of oxygen, nitrogen, and carbon, and roughening the surface of the object for treatment by means of glow discharges or ion beams in the atmosphere of said surface roughening gas; and charging said closed vessel with a nitriding gas and simultaneously inducing glow discharges in said closed vessel, thereby forming a nitride layer on the surface of the object for treatment.

公开(公告)号：US4597808A

公开(公告)日：1986-07-01

申请号：US718788

申请日：1985-03-29

申请人： Hideo Tachikawa ,  Takatoshi Suzuki ,  Hironori Fujita ,  Tohru Arai

发明人： Hideo Tachikawa ,  Takatoshi Suzuki ,  Hironori Fujita ,  Tohru Arai

IPC分类号： C23C8/36 ,  C21D1/48

CPC分类号： C23C8/36

摘要： A process for ion nitriding aluminum or an aluminum alloy as an article to be treated, in which: the article is disposed in a sealed vessel; the oxygen gas in the vessel is removed; the surface of the article is heated to a prescribed nitriding temperature; the surface of the article is activated to facilitate the formation of an aluminum nitride layer by the subsequent nitriding treatment; and thereafter the article is subjected to ion nitriding, thereby forming an aluminum nitride layer having excellent wear resistance and high hardness. This ion nitriding treatment for aluminum material can be carried out even at temperatures lower than a solution treatment temperature of aluminum material.

摘要翻译： 一种用于将铝或铝合金作为待处理物品的离子氮化方法，其中：将物品置于密封容器中; 去除容器中的氧气; 将制品的表面加热到规定的氮化温度; 活性物质的表面通过随后的氮化处理促进形成氮化铝层; 然后将制品进行离子氮化，从而形成具有优异的耐磨性和高硬度的氮化铝层。 即使在低于铝材的固溶处理温度的温度下也可以进行铝材的离子渗氮处理。

公开(公告)号：US5443662A

公开(公告)日：1995-08-22

申请号：US84322

申请日：1993-06-30

申请人： Tohru Arai ,  Kazuyuki Nakanishi ,  Hiromasa Takeda ,  Hideo Tachikawa

发明人： Tohru Arai ,  Kazuyuki Nakanishi ,  Hiromasa Takeda ,  Hideo Tachikawa

IPC分类号： C23C8/06 ,  C23C8/24 ,  C23C8/30 ,  C23C16/442 ,  C23C16/44 ,  B05D1/22

CPC分类号： C23C16/442

摘要： A nitride or carbonitride layer is formed on the surface of a metal material as follows: A treating agent composed of a refractory powder of alumina or the like and a powder of a metal for forming a nitride or a carbide or an alloy thereof is disposed in a fluidized bed furnace; the treating agent is fluidized to form a fluidized bed by introducing an inert gas; the fluidized bed furnace is heated to a temperature of not higher than 700.degree. C.; an activator of a halogenated ammonium salt is intermittently supplied into the fluidized bed at a rate of 0.001 to 5 wt %/hour based on the total amount of the treating agent; and the metal material to be treated is disposed in the fluidized bed during or after any of the above steps. For example, a nitride layer composed of only a metal for forming a nitride which contains almost no Fe--N is formed on the surface of iron steel even at a temperature as low as not higher than 700.degree. C. The layer is very hard and efficient in wear resistance, and the toughness of the base metal is hardly lowered.

摘要翻译： 在金属材料的表面上如下形成氮化物或碳氮化物层：由氧化铝等的耐火材料粉末和用于形成氮化物的金属粉末或其合金构成的处理剂设置在 流化床炉; 通过引入惰性气体使处理剂流化形成流化床; 将流化床炉加热至不高于700℃的温度; 基于处理剂的总量，以0.001至5重量％/小时的速率将卤化铵盐的活化剂间歇地供给到流化床中; 并且在任何上述步骤期间或之后将要处理的金属材料设置在流化床中。 例如，即使在700℃以下的温度下，也在铁钢的表面上形成仅由形成几乎不含Fe-N的氮化物的金属构成的氮化物层。该层非常硬， 耐磨损性高，贱金属的韧性几乎不降低。

公开(公告)号：US07833626B2

公开(公告)日：2010-11-16

申请号：US11720154

申请日：2005-11-24

申请人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

发明人： Takashi Iseki ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Munehisa Matsui ,  Shintaro Igarashi ,  Fumio Shimizu ,  Yoshinari Tsuchiya ,  Tadashi Oshima

IPC分类号： B32B9/00 ,  H05H1/24

CPC分类号： C23C16/26 ,  Y10T428/30

摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

摘要翻译： 当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。 当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp2混合轨道的碳构成。 还公开了一种制备无定形碳膜的方法。

公开(公告)号：US07721642B2

公开(公告)日：2010-05-25

申请号：US12021673

申请日：2008-01-29

申请人： Takahiro Sugioka ,  Takayuki Kato ,  Shuichi Yasuda ,  Atsushi Saito ,  Masahiro Suzuki ,  Hitotoshi Murase ,  Takashi Iseki ,  Hideo Tachikawa ,  Kazuyuki Nakanishi ,  Takao Kobayashi ,  Ken-ichi Suzuki

发明人： Takahiro Sugioka ,  Takayuki Kato ,  Shuichi Yasuda ,  Atsushi Saito ,  Masahiro Suzuki ,  Hitotoshi Murase ,  Takashi Iseki ,  Hideo Tachikawa ,  Kazuyuki Nakanishi ,  Takao Kobayashi ,  Ken-ichi Suzuki

IPC分类号： F01B31/10

CPC分类号： F04B27/1054 ,  F05C2203/0817 ,  F05C2203/0882 ,  F05C2225/00 ,  F05C2251/14 ,  F05C2253/12 ,  F16C33/201

摘要： To provide a sliding member that exhibits excellent durability and is free of lead. A swash plate for a compressor as the sliding member of the invention contains a base material having on the surface thereof a sliding layer constituting at least a sliding surface, on which shoes slide. The sliding layer contains a first layer that contains an amorphous hard carbon (diamond-like carbon) film containing Si (DLC-Si film) and is formed on the base material, and a second layer that is formed on the first layer and contains polyamideimide (PAI) containing a solid lubricant such as MoS2.

摘要翻译： 提供具有优异耐久性且不含铅的滑动构件。 作为本发明的滑动构件的压缩机的斜盘包含基材，其表面上具有至少构成滑动面的滑动层，滑块滑动。 滑动层含有含有Si（DLC-Si膜）的无定形硬碳（类金刚石碳）薄膜并形成在基材上的第一层，第二层形成在第一层上并含有聚酰胺酰亚胺 （PAI），其包含固体润滑剂如MoS2。

公开(公告)号：US20090114353A1

公开(公告)日：2009-05-07

申请号：US11922880

申请日：2005-12-14

申请人： Tsugio Tachikawa ,  Hiroshi Tachikawa ,  Hideo Tachikawa

发明人： Tsugio Tachikawa ,  Hiroshi Tachikawa ,  Hideo Tachikawa

IPC分类号： D21C11/00

CPC分类号： D21F1/66 ,  C02F1/66 ,  C02F1/76 ,  C02F2103/28 ,  C02F2209/29 ,  C02F2303/04 ,  D21C5/02 ,  D21C9/12 ,  D21C9/14 ,  D21H17/11 ,  Y02W30/648

摘要： An inventive method of papermaking can be provided for creating an optimum wet end environment. In a preferred method, an aqueous solution of sodium hypochlorite acidified by hydrochloric acid to have a pH of greater than or equal to 4 and less than 7 and adjusted to have an effective chlorine concentration of 1,000 to 10,000 ppm, preferably 3,000 to 8,000 ppm is prepared and charged to a white water pit in a manner to be effective chlorine concentration therein to greater than or equal to 0.5 ppm. Before a step of papermaking, it is preferred that aqueous solution sodium hypochlorite having pH of greater than or equal to 4 and less than 7 is added continuously or intermittently to a raw material water with the expectation that at breaching a residual chlorine concentration becomes greater than or equal to 500 ppm.

摘要翻译： 可以提供创造造纸最佳湿端环境的创造性的造纸方法。 在优选的方法中，通过盐酸酸化以具有大于或等于4且小于7的pH调节至具有1,000至10,000ppm，优选3,000至8,000ppm的有效氯浓度的次氯酸钠水溶液是 制备并以其中有效氯浓度的方式将其装入白水坑中至大于或等于0.5ppm。 在造纸步骤之前，优选将pH大于或等于4且小于7的水溶液次氯酸钠连续或间歇地添加到原料水中，期望在破坏残留氯浓度时大于 或等于500ppm。

公开(公告)号：US07507305B2

公开(公告)日：2009-03-24

申请号：US10580463

申请日：2004-12-10

申请人： Minoru Kawasaki ,  Tadashi Oshima ,  Takao Kobayashi ,  Kazuyuki Nakanishi ,  Hideo Tachikawa

发明人： Minoru Kawasaki ,  Tadashi Oshima ,  Takao Kobayashi ,  Kazuyuki Nakanishi ,  Hideo Tachikawa

IPC分类号： C22C9/06

CPC分类号： C22C9/06 ,  C22C9/00

摘要： This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.

摘要翻译： 本发明的目的在于提供一种耐磨铜基合金，其优点在于不仅在高温范围内提高耐磨性，而且提高抗裂性和切削性，特别适合于形成包覆层。 耐磨铜基合金按重量计含有4.7〜22.0％的镍，0.5〜5.0％的硅，2.7〜22.0％的铁，1.0〜15.0％的铬，0.01〜2.00％的钴，2.7〜22.0％的一种或多种 的钽，钛，锆和铪，余量为铜与不可避免的杂质。

公开(公告)号：US07396735B2

公开(公告)日：2008-07-08

申请号：US10538222

申请日：2003-12-09

申请人： Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hideo Hasegawa ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Yukio Miyachi ,  Yasushi Yamada ,  Hiroyuki Ueda ,  Masayasu Ishiko

发明人： Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hideo Hasegawa ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Yukio Miyachi ,  Yasushi Yamada ,  Hiroyuki Ueda ,  Masayasu Ishiko

IPC分类号： H01L21/76

CPC分类号： H01L23/3732 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/49109 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/13091 ,  H01L2924/19107 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2924/00

摘要： A semiconductor element heat dissipating member is provided which has excellent heat dissipation characteristics and adhesion characteristics and enables production of a semiconductor device at a low cost. A semiconductor device using the same, and a method of producing the same are also provided. The semiconductor element heat dissipating member has a conductive substrate and an electrically insulating amorphous carbon film containing hydrogen, and the electrically insulating amorphous carbon film is formed at least on a region of the conductive substrate on which region a semiconductor element is to be mounted.

摘要翻译： 提供了具有优异的散热特性和粘合特性的半导体元件散热构件，并且能够以低成本制造半导体器件。 还提供了使用该半导体器件的半导体器件及其制造方法。 半导体元件散热构件具有导电基板和含有氢的电绝缘非晶碳膜，并且至少在导电基板的要安装半导体元件的区域的区域上形成电绝缘非晶碳膜。

公开(公告)号：US20050257684A1

公开(公告)日：2005-11-24

申请号：US11133848

申请日：2005-05-20

申请人： Manabu Sugiura ,  Takahiro Sugioka ,  Hiroyuki Kawaura ,  Takao Kobayashi ,  Goro Watanabe ,  Kenichi Suzuki ,  Hideo Tachikawa ,  Hideo Hasegawa

发明人： Manabu Sugiura ,  Takahiro Sugioka ,  Hiroyuki Kawaura ,  Takao Kobayashi ,  Goro Watanabe ,  Kenichi Suzuki ,  Hideo Tachikawa ,  Hideo Hasegawa

IPC分类号： C08J5/16 ,  C08J5/18 ,  C09D5/00 ,  C10M125/02 ,  C10M125/22 ,  C10M147/00 ,  F01B3/00 ,  F04B27/10

CPC分类号： C10M103/00 ,  C10M105/50 ,  C10M131/00 ,  C10M2201/003 ,  C10M2201/041 ,  C10M2201/0413 ,  C10M2201/061 ,  C10M2201/0613 ,  C10M2201/065 ,  C10M2201/0653 ,  C10M2201/066 ,  C10M2201/0663 ,  C10M2201/081 ,  C10M2213/02 ,  C10M2213/023 ,  C10M2213/062 ,  C10M2213/0623 ,  C10N2240/30 ,  C10N2250/18 ,  F04B27/1054 ,  F05C2201/049 ,  F05C2201/0493 ,  F05C2251/14 ,  F05C2253/12 ,  F05C2253/20

摘要： A sliding film includes a solid lubricant, a binder resin, and a low-melting-point material. The binder resin is for holding the solid lubricant on a surface of a substrate, and exhibits a glass transition temperature. The low-melting-point material exhibits a melting point lower than the glass transition temperature of the binder resin. The low-melting-point material demonstrates a latent heat which can absorb frictional heat generated between sliding members, and accordingly retards the degradation of the binder resin. As a result, the sliding film produces high seizure resistance.

摘要翻译： 滑动膜包括固体润滑剂，粘合剂树脂和低熔点材料。 粘合剂树脂用于将固体润滑剂保持在基材的表面上，并显示玻璃化转变温度。 低熔点材料的熔点低于粘合剂树脂的玻璃化转变温度。 低熔点材料表现出潜热，其可以吸收滑动构件之间产生的摩擦热，并因此延缓粘合剂树脂的降解。 结果，滑膜产生高的耐咬住性。

公开(公告)号：US5620521A

公开(公告)日：1997-04-15

申请号：US386230

申请日：1995-02-10

申请人： Hideo Tachikawa ,  Hiromasa Takeda ,  Kazuyuki Nakanishi

发明人： Hideo Tachikawa ,  Hiromasa Takeda ,  Kazuyuki Nakanishi

IPC分类号： C23C10/34 ,  B01J8/32 ,  C23C16/442 ,  F27B15/00 ,  C23C16/00

CPC分类号： F27B15/00 ,  B01J8/32 ,  C23C16/442 ,  B22F2998/00 ,  Y10S118/05

摘要： A method for surface treatment in which a fluidizable powder mixture consisting of a powder of a refractory material, and a surface layer-forming powder of a metal, or alloy or both is fluidized by a fluidizing gas supplied through a gas distributor to form above the gas distributor a fluidized bed in which a surface layer is formed on the material to be treated under heating in the presence of a halide. A layer of coarse particles is disposed between the fluidized bed and the gas distributor, and the coarse particles have a mean diameter, D(m), as defined below:(1650V.mu./PG).sup.1/2

摘要翻译： 一种表面处理方法，其中由耐火材料粉末和金属或合金的表面层形成粉末组成的可流化粉末混合物通过气体分配器供应的流化气体流化，形成在 气体分配器是在卤化物存在下在加热下在待处理材料上形成表面层的流化床。 在流化床和气体分配器之间设置一层粗颗粒，粗颗粒具有如下定义的平均直径D（m）：（1650V / PG）+ E，fra 1/2 + EE < D <6.5d其中V：流化气体的速度（m / s）; mu：流化气体的粘度系数（kg / mxs）; P：粗颗粒的平均密度（kg / m3）; G：重力加速度（9.8 m / s2）; d：表面层形成粉末的平均粒径（μm）。 粗颗粒层可以防止流化床粉末的聚集，并保护气体分布器免受高反应性粉末和气体的暴露。