-
公开(公告)号：US20070125458A1
公开(公告)日：2007-06-07
申请号：US10580463
申请日：2004-12-10
摘要： This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.
摘要翻译： 本发明的目的在于提供一种耐磨铜基合金，其优点在于不仅在高温范围内提高耐磨性，而且提高抗裂性和切削性，特别适合于形成包覆层。 耐磨铜基合金按重量计含有4.7〜22.0％的镍，0.5〜5.0％的硅，2.7〜22.0％的铁，1.0〜15.0％的铬，0.01〜2.00％的钴，2.7〜22.0％的一种或多种 的钽，钛，锆和铪，余量为铜与不可避免的杂质。
-
公开(公告)号：US07507305B2
公开(公告)日：2009-03-24
申请号：US10580463
申请日：2004-12-10
IPC分类号： C22C9/06
摘要： This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.
摘要翻译： 本发明的目的在于提供一种耐磨铜基合金，其优点在于不仅在高温范围内提高耐磨性，而且提高抗裂性和切削性，特别适合于形成包覆层。 耐磨铜基合金按重量计含有4.7〜22.0％的镍，0.5〜5.0％的硅，2.7〜22.0％的铁，1.0〜15.0％的铬，0.01〜2.00％的钴，2.7〜22.0％的一种或多种 的钽，钛，锆和铪，余量为铜与不可避免的杂质。
-
公开(公告)号：US07850795B2
公开(公告)日：2010-12-14
申请号：US11319053
申请日：2005-12-28
IPC分类号： C22C9/06
CPC分类号： C22C9/06 , C22C32/0078 , C23C24/10 , C23C26/02 , C23C30/00 , F01L3/02 , F01L3/04 , F01L2101/00 , F01L2810/02
摘要： While securing the building-up ability and crack resistance, to provide a build-up wear-resistant copper alloy and valve seat. The build-up wear-resistant copper alloy and valve seat are characterized by having a composition of nickel: 5.0-24.5%, iron: 3.0-20.0%, silicon: 0.5-5.0%, boron: 0.05-0.5%, chromium: 0.3-5.0%, one member or two members or more selected from the group consisting of molybdenum, tungsten and vanadium: 3.0-20.0%, by weight %, and the balance being copper and inevitable impurities.
摘要翻译： 在确保建筑能力和抗裂性的同时，提供耐磨铜合金和阀座。 积层耐磨铜合金和阀座的特征在于镍的组成为：5.0-24.5％，铁：3.0-20.0％，硅：0.5-5.0％，硼：0.05-0.5％，铬：0.3 -5.0％，选自钼，钨和钒的一种或两种以上成分：3.0〜20.0％（重量），余量为铜和不可避免的杂质。
-
公开(公告)号：US07815756B2
公开(公告)日：2010-10-19
申请号：US11521335
申请日：2006-09-15
IPC分类号： C22C9/06
CPC分类号： B22F7/08 , B22F3/105 , C22C9/05 , C22C9/06 , C22C29/005 , C22C32/0047 , C22C32/0078 , C23C4/06 , C23C24/10 , C23C26/02 , C23C30/00 , F01L3/02
摘要： This is to provide a build-up wear-resistant copper-based alloy, which is advantageous for enhancing the cracking resistance and machinability, which is appropriate for cases of building up to form built-up layers especially, and which is equipped with the wear resistance, cracking resistance and machinability combinedly in a well balanced manner. A build-up wear-resistant copper-based alloy is characterized in that it has a composition, which includes nickel: 5.0-20.0%; silicon: 0.5-5.0%; manganese: 3.0-30.0%; and an element, which combines with manganese to form a Laves phase and additionally to form silicide: 3.0-30.0%; by weight %, and inevitable impurities; and additionally the balance being copper. The element can be one member or two or more members of titanium, hafnium, zirconium, vanadium, niobium and tantalum.
摘要翻译： 这是为了提供一种积层耐磨铜基合金，其有利于提高抗开裂性和机械加工性，这适合于特别构建成型层的情况，并且配备有磨损 电阻，抗开裂性和机械加工性以良好的平衡性结合在一起。 积层耐磨铜基合金的特征在于，其组成包括镍：5.0〜20.0％; 硅：0.5-5.0％; 锰：3.0-30.0％; 以及与锰结合形成Laves相并另外形成硅化物的元素：3.0-30.0％; （重量％）和不可避免的杂质; 另外还有铜。 元素可以是钛，铪，锆，钒，铌和钽的一种或两种以上成分。
-
公开(公告)号：US20060108029A1
公开(公告)日：2006-05-25
申请号：US11319053
申请日：2005-12-28
IPC分类号： C22C9/06
CPC分类号： C22C9/06 , C22C32/0078 , C23C24/10 , C23C26/02 , C23C30/00 , F01L3/02 , F01L3/04 , F01L2101/00 , F01L2810/02
摘要： While securing the building-up ability and crack resistance, to provide a build-up wear-resistant copper alloy and valve seat. The build-up wear-resistant copper alloy and valve seat are characterized by having a composition of nickel: 5.0-24.5%, iron: 3.0-20.0%, silicon: 0.5-5.0%, boron: 0.05-0.5%, chromium: 0.3-5.0%, one member or two members or more selected from the group consisting of molybdenum, tungsten and vanadium: 3.0-20.0%, by weight %, and the balance being copper and inevitable impurities.
摘要翻译： 在确保建筑能力和抗裂性的同时，提供耐磨铜合金和阀座。 积层耐磨铜合金和阀座的特征在于镍的组成为：5.0-24.5％，铁：3.0-20.0％，硅：0.5-5.0％，硼：0.05-0.5％，铬：0.3 -5.0％，选自钼，钨和钒的一种或两种以上成分：3.0〜20.0％（重量），余量为铜和不可避免的杂质。
-
公开(公告)号：US20070065331A1
公开(公告)日：2007-03-22
申请号：US11521335
申请日：2006-09-15
CPC分类号： B22F7/08 , B22F3/105 , C22C9/05 , C22C9/06 , C22C29/005 , C22C32/0047 , C22C32/0078 , C23C4/06 , C23C24/10 , C23C26/02 , C23C30/00 , F01L3/02
摘要： This is to provide a build-up wear-resistant copper-based alloy, which is advantageous for enhancing the cracking resistance and machinability, which is appropriate for cases of building up to form built-up layers especially, and which is equipped with the wear resistance, cracking resistance and machinability combinedly in a well balanced manner. A build-up wear-resistant copper-based alloy is characterized in that it has a composition, which includes nickel: 5.0-20.0%; silicon: 0.5-5.0%; manganese: 3.0-30.0%; and an element, which combines with manganese to form a Laves phase and additionally to form silicide: 3.0-30.0%; by weight %, and inevitable impurities; and additionally the balance being copper. The element can be one member or two or more members of titanium, hafnium, zirconium, vanadium, niobium and tantalum.
摘要翻译： 这是为了提供一种积层耐磨铜基合金，其有利于提高抗开裂性和机械加工性，这适合于特别构建成型层的情况，并且配备有磨损 电阻，抗开裂性和机械加工性以良好的平衡性结合在一起。 积层耐磨铜基合金的特征在于，其组成包括镍：5.0〜20.0％; 硅：0.5-5.0％; 锰：3.0-30.0％; 以及与锰结合形成Laves相并另外形成硅化物的元素：3.0-30.0％; （重量％）和不可避免的杂质; 另外还有铜。 元素可以是钛，铪，锆，钒，铌和钽的一种或两种以上成分。
-
7.发明申请公开(公告)号：US20080188383A1
公开(公告)日：2008-08-07
申请号：US11720154
申请日：2005-11-24
申请人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
发明人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
CPC分类号： C23C16/26 , Y10T428/30
摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.
摘要翻译： 当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。 当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp 2 SUB混合轨道的碳构成。 还公开了一种制备无定形碳膜的方法。
-
8.发明申请Semiconductor element heat dissipating member, semiconductor device using same and manufacturing same 失效半导体元件散热构件，使用其的半导体器件及其制造公开(公告)号：US20060057768A1
公开(公告)日：2006-03-16
申请号：US10538222
申请日：2003-12-09
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Hideo Tachikawa , Yukio Miyachi , Yasushi Yamada , Hiroyuki Ueda , Masayasu Ishiko
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Hideo Tachikawa , Yukio Miyachi , Yasushi Yamada , Hiroyuki Ueda , Masayasu Ishiko
IPC分类号： H01L21/44
CPC分类号： H01L23/3732 , H01L2224/48091 , H01L2224/48247 , H01L2224/49109 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/19107 , H01L2924/3025 , H01L2924/00014 , H01L2924/00
摘要： A semiconductor element heat dissipating member is provided which has excellent heat dissipation characteristics and adhesion characteristics and enables production of a semiconductor device at a low cost. A semiconductor device using the same, and a method of producing the same are also provided. The semiconductor element heat dissipating member has a conductive substrate and an electrically insulating amorphous carbon film containing hydrogen, and the electrically insulating amorphous carbon film is formed at least on a region of the conductive substrate on which region a semiconductor element is to be mounted.
摘要翻译： 提供了具有优异的散热特性和粘合特性的半导体元件散热构件，并且能够以低成本制造半导体器件。 还提供了使用该半导体器件的半导体器件及其制造方法。 半导体元件散热构件具有导电基板和含有氢的电绝缘非晶碳膜，并且至少在导电基板的要安装半导体元件的区域的区域上形成电绝缘非晶碳膜。
-
9.发明授权Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film 有权无定形碳，无定形碳涂层构件和形成无定形碳膜的方法公开(公告)号：US07455824B2
公开(公告)日：2008-11-25
申请号：US11002125
申请日：2004-12-03
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
IPC分类号： B32B9/00
CPC分类号： C23C16/26 , Y10T428/30
摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
摘要翻译： 为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。 无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。 此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。 另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。 不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和 等离子体动力源被操作成与相邻两个基板的负发光重叠。
-
公开(公告)号：US07404866B2
公开(公告)日：2008-07-29
申请号：US10480653
申请日：2002-06-26
CPC分类号： F16H57/041 , B22F7/08 , B22F2999/00 , C23C4/04 , C23C4/06 , C23C4/08 , C23C4/12 , C23C8/02 , C23C24/08 , F16C33/06 , F16C33/12 , F16C2204/20 , F16C2204/60 , B22F3/115
摘要： A sliding member includes a superficial portion forming a sliding surface. The superficial portion includes an oxygen-containing alloy containing at least one metallic element selected from the group consisting of molybdenum and tungsten in an amount of from 2 to 80% by weight; and oxygen in an amount of from 0.5 to 15% by weight. The sliding member sustains lubricating characteristics given to the sliding surface over a long period of time to maintain a low friction coefficient and durability.
摘要翻译： 滑动构件包括形成滑动表面的表面部分。 表面部分包括含有至少一种金属元素的含氧合金，其含量为2-80重量％的钼和钨组成的组; 和氧浓度为0.5〜15重量％。 滑动构件在长时间内保持给予滑动面的润滑特性，以保持低摩擦系数和耐久性。
-
-
-
-
-
-
-
-
-
搜索结果
61 条记录 (耗时 0.026 秒)
