利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.033 秒)

    Heat stable photocurable resin composition for dry film resist
    1.
    发明申请
    Heat stable photocurable resin composition for dry film resist 失效
    用于干膜抗蚀剂的热稳定的光固化树脂组合物

    公开(公告)号：US20050260520A1

    公开(公告)日：2005-11-24

    申请号：US10520701

    申请日：2003-07-01

    申请人： Hidetaka Oka ,  Masaki Ohwa ,  James Taylor

    发明人： Hidetaka Oka ,  Masaki Ohwa ,  James Taylor

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/09 ,  G03F7/105 ,  G03F7/11 ,  G03F7/16 ,  H05K3/06 ,  H05K3/18 ,  G03C1/492

    CPC分类号： G03F7/029 ,  G03F7/027 ,  G03F7/092 ,  G03F7/105 ,  G03F7/11 ,  G03F7/161 ,  Y10S430/111

    摘要： The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 μm and optionally laminate a protective film onto the photocursable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20-90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.1 to 10% by weight of a leuco triphenylmethane dye of the formula (I), wherein R1 is a residue selected from (II), R2 is C1-C12 alkyl or phenyl which may be mono-, di- or tri-substituted by C1-C6 alkyl, trifluoromethyl, C1-6 alkoxy, C1-6 alkylthio, halogen and nitro; R3 is hydrogen or C1-C12 alkyl; R4 to R9 independently of one another are hydrogen or C1-C12 alkyl; X is O, S, NH or N—C1-C12-alkyl; (a) to (e) being 100% by weight. The above composition is useful to avoid unfavourable colour generation during the heat lamination.

    摘要翻译： 本发明涉及一种通过将光固化树脂组合物形成在厚度为1-50μm的支撑膜上制备干膜抗蚀剂的方法，并且任选地将保护膜层压到可光固化组合物层上以获得干膜抗蚀剂; 由此可光固化树脂由包含（a）20-90重量％的碱溶性粘合剂低聚物或聚合物的均匀混合物形成; （b）5至60重量％的与组分（a）的低聚物和聚合物相容的一种或多种可光聚合单体; （c）0.01至20重量％的一种或多种光引发剂; （d）0至20重量％的添加剂和/或助剂; 和（e）0.1至10重量％的式（I）的无色三苯甲烷染料，其中R 1是选自（II），R 2 O / 是C 1 -C 12烷基或可以被C 1 -C 1亚烷基取代的苯基， C 1-6烷基，三氟甲基，C 1-6烷氧基，C 1-6烷基硫基，卤素和硝基; R 3是氢或C 1 -C 12烷基; R 3是氢或C 1 -C 12烷基; R 9与R 9彼此独立地是氢或C 1 -C 12烷基; X是O，S，NH或N-C 1 -C 12 - 烷基; （a）至（e）为100重量％。 上述组合物可用于在热层压期间避免不利的颜色产生。

    Photopolymerizable thermosetting resin compositions
    3.
    发明授权
    Photopolymerizable thermosetting resin compositions 有权
    光聚合性热固性树脂组合物

    公开(公告)号：US06485885B1

    公开(公告)日：2002-11-26

    申请号：US09720441

    申请日：2000-12-22

    申请人： Hidetaka Oka ,  Masaki Ohwa ,  Akira Matsumoto ,  Hisatoshi Kura

    发明人： Hidetaka Oka ,  Masaki Ohwa ,  Akira Matsumoto ,  Hisatoshi Kura

    IPC分类号： G03F7004

    CPC分类号： G03F7/031 ,  G03F7/038

    摘要： Compositions comprising (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule; (B) at least one compound of formulas (I, II, III, IV, V or VI), wherein R1 inter alia is phenyl or alkyl; R2 is for example C2-C12alkonoyl which is unsubstituted or substituted or is benzoyl; R3, R4, R5, R6 and R7 independently of one another are for instance hydrogen, C1-C12alkyl, cyclohexyl or phenyl which is unsubstituted or substituted, or are benzyl, benzoyl, C2-C12alkanoyl or phenoxycarbonyl; R8 is for example hydrogen or C1-C12alkyl or a group (B); M is for example C1-C12alkylene, cyclohexylene or phenylene; M1 inter alia is a direct bond or C1-C12alkylenoxy; and Ar is a 5- or 6-membered aromatic heterocyclic ring; (C) a photopolymerizable reactive or unreactive diluent; and (D) as a thermosetting component an epoxy compound containing at least two epoxy groups in one molecule; are highly suitable as resists which are alkaline developable.

    摘要翻译： 包含（A）在分子中含有至少一个羧酸基团的低聚物或聚合物的组合物; （B）至少一种式（I，II，III，IV，V或VI）化合物，其中R 1特别是苯基或烷基; R2是例如未取代或取代的C 2 -C 12烷氧基或苯甲酰基; R 3，R 4，R 5，R 6和R 7彼此独立地是例如氢，C 1 -C 12烷基，环己基或未取代或取代的苯基，或者是苄基，苯甲酰基，C 2 -C 12烷酰基或苯氧基羰基; R8是例如氢或C1-C12烷基或基团（B）; M为例如C 1 -C 12亚烷基，亚环己基或亚苯基; M1特别是直接键或C1-C12亚烷基氧基; 且Ar为5-或6-元芳族杂环; （C）可光聚合反应性或非活性稀释剂; 和（D）作为热固性组分在一个分子中含有至少两个环氧基团的环氧化合物; 非常适合作为碱性显影的抗蚀剂。

    Oxime ester photoinitiators
    4.
    发明授权
    Oxime ester photoinitiators 有权
    肟酯光引发剂

    公开(公告)号：US07759043B2

    公开(公告)日：2010-07-20

    申请号：US11660346

    申请日：2005-08-08

    申请人： Junichi Tanabe ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    发明人： Junichi Tanabe ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    IPC分类号： G03C1/00 ,  C07D213/00 ,  C07D207/00 ,  C07D209/56 ,  C09B5/00 ,  G03F7/26 ,  C08F2/50

    CPC分类号： G03F7/031 ,  B33Y70/00 ,  C07D209/86 ,  C07D413/10

    摘要： Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.

    摘要翻译： 式（I）化合物，其中R 1，R 2和R 10彼此独立地是C 1 -C 20烷基，苯基，C 1 -C 12烷基苯基或苯基-C 1 -C 6烷基; R 3和R 4彼此独立地是氢，C 1 -C 20烷基，NR 6 R 7或SR 8，条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R5是氢或C1-C20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基，或者R 6和R 7与它们所连接的N原子一起形成5或6元环，其任选地被O，S或NR 9中断，并且任选地另外是 被一个或多个C 1 -C 4烷基取代; R8是苯基，联苯基，萘基，蒽基或菲基，它们全部被一个或多个C 1 -C 4烷基取代; 且R 9为氢，C 1 -C 20烷基，C 2 -C 4羟烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。

    O-acyloxime photoinitiators
    6.
    发明授权
    O-acyloxime photoinitiators 有权
    O-酰基肟光引发剂

    公开(公告)号：US06596445B1

    公开(公告)日：2003-07-22

    申请号：US09338152

    申请日：1999-06-23

    申请人： Akira Matsumoto ,  Hidetaka Oka ,  Masaki Ohwa ,  Hisatoshi Kura ,  Jean-Luc Birbaum ,  Kurt Dietliker

    发明人： Akira Matsumoto ,  Hidetaka Oka ,  Masaki Ohwa ,  Hisatoshi Kura ,  Jean-Luc Birbaum ,  Kurt Dietliker

    IPC分类号： C07C25164

    CPC分类号： C07C251/66 ,  B33Y70/00 ,  C07C251/68 ,  C07C323/47 ,  C07D295/135 ,  C07D335/18 ,  C08F2/50 ,  G03F7/0007 ,  G03F7/002 ,  G03F7/0045 ,  G03F7/031 ,  G03F7/0388

    摘要： Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.

    摘要翻译： 式I，II，III和IV其中R 1的肟酯化合物是苯基，任选被-O - ，C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基，或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基，或R1'是苯氧基羰基，或R1'是-CONR10R11或CN; R2是C2-C12烷酰基，C4-C6链烯酰基，苯甲酰基，C2-C6烷氧基羰基或苯氧基羰基; R3，R4，R5，R6和R7是氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12烷酰基，C2-C12烷氧基羰基，苯氧基羰基或OR8，SR9，SOR9，SO2R9或NR10R11; R4'，R5'和R6'为氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12-烷酰基，C2-C12烷氧基羰基，苯氧基羰基，或为OR8，SR9，SOR9，SO2R9 ，NR10R11; 条件是R3，R4，R5，R6，R7，R'4，R'5和R'6中的至少一个是OR8，SR9或NR10R

    Photosensitive resin composition
    8.
    发明授权
    Photosensitive resin composition 有权
    感光树脂组合物

    公开(公告)号：US07829257B2

    公开(公告)日：2010-11-09

    申请号：US09734635

    申请日：2000-12-12

    申请人： Hidetaka Oka ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Masaki Ohwa ,  Junichi Tanabe

    发明人： Hidetaka Oka ,  Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Masaki Ohwa ,  Junichi Tanabe

    IPC分类号： G03C1/00

    CPC分类号： C08F2/50 ,  G03F7/031

    摘要： Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.

    摘要翻译： 光敏组合物，其包含（A）碱溶性化合物; （B）至少一种式I或II的化合物，其中R 1特别是C 4 -C 9环烷酰基，C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基，其各自为未取代或取代的; x为2或3; M1当x为2时，特别是亚苯基或亚萘基，其各自任选被取代。 由OR3，SR4或NR5R6; 或M1，当x为3时，为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH，-SH，-CN，C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢，C1-C12烷基，C3-C12链烯基，环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢，C 1 -C 12烷基，C 2 -C 4羟烷基，C 2 -C 10烷氧基烷基，C 3 -C 5烯基，C 3 -C 8环烷基，苯基-C 1 -C 3烷基，C 1 -C 4烷酰基，C 3 -C 6烯酰基，苯甲酰基或苯基 未取代或取代; 和（C）可光聚合化合物; 表现出意想不到的良好性能，特别是在光刻胶技术中。

    Oxime ester photoinitiators with heteroaromatic groups
    9.
    发明授权
    Oxime ester photoinitiators with heteroaromatic groups 有权
    具有杂芳族基团的肟酯光引发剂

    公开(公告)号：US07648738B2

    公开(公告)日：2010-01-19

    申请号：US10535962

    申请日：2003-11-24

    申请人： Junichi Tanabe ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    发明人： Junichi Tanabe ,  Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    IPC分类号： C07C251/60 ,  G03F1/00 ,  G03C1/73

    CPC分类号： C07D207/333 ,  B33Y70/00 ,  C07D207/335 ,  C07D209/12 ,  C07D209/14 ,  C07D209/42 ,  C07D333/22 ,  C07D333/38 ,  C07D333/58 ,  C07D401/06 ,  C07D403/06 ,  C07D405/06 ,  C07D409/06 ,  C07D409/14 ,  C08F2/50 ,  G03F7/031

    摘要： Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2′ e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1′ i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2′ for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.

    摘要翻译： 式（I），（II），（III）和（IV）的化合物，其中Ch1是例如。 式（Ⅴ）或（Ⅵ）; Ch2是式（VII）或（VIII）; Het1例如是呋喃基，噻吩基，吡咯基，吡啶基，苯并噻吩基，喹啉基或二噻吩基; 它们各自任选被取代; Het2和Het2' 呋喃基，噻吩乙烯基，吡咯基，苯并噻吩基，喹啉基，呋喃基羰基，噻吩羰基，苯并噻吩羰基或二噻吩羰基; 它们各自任选被取代; A1和Ar1'i.a. 是苯基，萘基，苯甲酰基或萘甲酰基，其各自任选被取代; Ar 2是例如亚苯基，任选被取代; 我是 是C 1 -C 20亚烷基; R1是例如C1-C12烷基或苯基; R2和R2'例如是氢或C1-C20烷基; 在光聚合反应中表现出出人意料的良好性能。

    Photosensitive resin composition
    10.
    发明授权
    Photosensitive resin composition 有权
    感光树脂组合物

    公开(公告)号：US07556843B2

    公开(公告)日：2009-07-07

    申请号：US11818073

    申请日：2007-06-13

    申请人： Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    发明人： Hisatoshi Kura ,  Hidetaka Oka ,  Masaki Ohwa

    IPC分类号： G03F7/00 ,  C08J3/28

    CPC分类号： C08F2/50 ,  B33Y70/00 ,  C07D295/112 ,  C07D295/135 ,  G03F7/0007 ,  G03F7/031

    摘要： A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises (A) a polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200,000 or less, (B) selected α-aminoalkylphenone compounds as photoinitiators and (C) an ester of a polyol, wherein the polyol is partially or fully esterified with an ethylenically unsaturated carboxylic acid a monomeric, oligomeric or polymeric compound having at least one olefinic double bond.

    摘要翻译： 用于制备着色和非着色物品的光聚合方法包括用190-600nm范围内的电磁辐射或用电子束或X射线照射可由碱溶液显影的感光组合物，该组合物包含（A） 在分子中含有至少一个羧酸基并且分子量为200,000以下的聚合物，（B）作为光引发剂的选择的α-氨基烷基苯酮化合物和（C）多元醇的酯，其中所述多元醇部分或完全酯化 烯键式不饱和羧酸是具有至少一个烯属双键的单体，低聚物或聚合物。