Ceramic heater
    1.
    发明授权
    Ceramic heater 有权
    陶瓷加热器

    公开(公告)号:US06225606B1

    公开(公告)日:2001-05-01

    申请号:US09222223

    申请日:1998-12-29

    IPC分类号: H05B368

    摘要: A ceramic heater includes a ceramic substrate having a heating surface, and a resistance heating element buried inside the ceramic substrate, wherein at least a part of the resistance heating element is constituted by a conductive network member, and a ceramic material constituting the ceramic substrate is filled in meshes of the network member.

    摘要翻译: 陶瓷加热器包括具有加热面的陶瓷基板和埋在陶瓷基板内的电阻加热元件,其中电阻加热元件的至少一部分由导电网络构件构成,构成陶瓷基板的陶瓷材料为 填充网络成员的网格。

    Ceramic member-electric power supply connector coupling structure
    4.
    发明授权
    Ceramic member-electric power supply connector coupling structure 失效
    陶瓷构件 - 电源连接器耦合结构

    公开(公告)号:US5995357A

    公开(公告)日:1999-11-30

    申请号:US13045

    申请日:1998-01-26

    CPC分类号: H01J37/32577 H01R13/24

    摘要: A ceramic member-electric power supply connector coupling structure includes a ceramic member with a hole and is provided with a metallic member therein so as to be partially exposed to the hole. An electric power supply connector and a tubular atmosphere-shielding member are provided in the hole. Further, a stress-mitigating, low heat expansion conductor is provided inside the atmosphere-shielding member and the power supply connector is partially positioned therein. The atmosphere-shielding member is gas-tightly joined to the power supply connector, and the expansion conductor and the tubular atmosphere-shielding member are joined to the metallic member. The coupling structure has high heat and corrosion resistance, high joining strength, and remains highly conductive even at high temperature conditions in an oxidative or corrosive environment.

    摘要翻译: 陶瓷构件 - 电源连接器联接结构包括具有孔的陶瓷构件,并且在其中设置有金属构件以部分地暴露于孔。 电源连接器和管状气氛屏蔽部件设置在孔中。 此外,在气氛屏蔽部件内部设置有减轻应力的低热膨胀导体,电源连接器部分地位于其中。 气密屏蔽构件气密地接合到电源连接器,并且膨胀导体和管状气氛屏蔽构件接合到金属构件。 连接结构具有高耐热腐蚀性,接合强度高,即使在氧化或腐蚀性环境的高温条件下也能保持高导电性。

    Ceramics joint structure and method of producing the same
    5.
    发明授权
    Ceramics joint structure and method of producing the same 失效
    陶瓷接头结构及其制造方法

    公开(公告)号:US06617514B1

    公开(公告)日:2003-09-09

    申请号:US09095157

    申请日:1998-06-10

    IPC分类号: H01R400

    CPC分类号: H01L21/6833

    摘要: The disclosed ceramics joint structure, in which a ceramics member having an oxidation resistance property and a metal member are joined via a joint layer, has a structure such that a part of the embedded member is exposed to a joint surface of the ceramics member, which is contacted with the joint layer to form a metal exposing portion, and the ceramics member and the metal exposing portion are joined via the joint layer to the metal member respectively. Moreover, the joint layer is mainly made of one or more metal selected from the group consisting of gold, platinum and palladium.

    摘要翻译: 所公开的具有耐氧化性的陶瓷构件和金属构件的陶瓷接头结构通过接合层接合,具有使嵌入构件的一部分暴露于陶瓷构件的接合面的结构, 与接合层接触以形成金属暴露部分,并且陶瓷构件和金属暴露部分分别经由接合层接合到金属构件。 此外,接合层主要由选自金,铂和钯的一种或多种金属制成。

    Systems for supporting ceramic susceptors
    7.
    发明授权
    Systems for supporting ceramic susceptors 有权
    支撑陶瓷感受体的系统

    公开(公告)号:US07022947B2

    公开(公告)日:2006-04-04

    申请号:US10884294

    申请日:2004-07-02

    IPC分类号: F27B5/14

    摘要: A support structure for supporting a ceramic susceptor in a chamber is provided. The support structure includes a supporting portion joined with a back face of the ceramic susceptor. The supporting portion includes an inner space that is separated from the atmosphere of the chamber. A cooling system is provided below the supporting portion 6. At least one thermal control portion is provided between the cooling system and the supporting portion for reducing thermal conduction from the susceptor to the cooling system.

    摘要翻译: 提供了用于在腔室中支撑陶瓷基座的支撑结构。 支撑结构包括与陶瓷基座的后表面连接的支撑部分。 支撑部分包括与腔室的气氛分离的内部空间。 冷却系统设置在支撑部分6的下方。至少一个热控制部分设置在冷却系统和支撑部分之间,用于减少从基座到冷却系统的热传导。

    Systems for supporting ceramic susceptors
    8.
    发明申请
    Systems for supporting ceramic susceptors 有权
    支撑陶瓷感受体的系统

    公开(公告)号:US20050006374A1

    公开(公告)日:2005-01-13

    申请号:US10884294

    申请日:2004-07-02

    摘要: An object of the present invention is to provide a practical and low-cost method of reducing cold spots generated on the heating face of a ceramic susceptor and the temperature distribution on the heating face when the supporting portion is joined with the susceptor at the back face and is fitted to a chamber through a cooling system. A supporting portion 6 is joined with the back face of a ceramic susceptor. An inner space 6f separated from atmosphere in a chamber is formed. A cooling system is provided between the supporting portion 6 and chamber. Thermal control portions 12A and 12B are provided between the cooling system and supporting body 6 for reducing thermal conduction from the susceptor to the cooling system.

    摘要翻译: 本发明的目的是提供一种实用且低成本的方法,当将支撑部分与基座在背面接合时,减少在陶瓷基座的加热面上产生的冷点和加热面上的温度分布 并通过冷却系统安装到腔室。 支撑部6与陶瓷基座的背面接合。 形成与室内的气氛分离的内部空间6f。 在支撑部分6和室之间设置冷却系统。 热控制部12A和12B设置在冷却系统和支撑体6之间,用于减少从基座到冷却系统的热传导。

    Electrostatic chunks
    9.
    发明授权
    Electrostatic chunks 有权
    静电吸盘

    公开(公告)号:US06608745B2

    公开(公告)日:2003-08-19

    申请号:US09756555

    申请日:2001-01-08

    IPC分类号: H02N1300

    CPC分类号: H01L21/6833

    摘要: An electrostatic chuck includes a chuck body, an insulating layer formed on a surface of the chuck body and having an installation surface on which a wafer is to be installed, an inner electrode installed inside the insulating-layer, and projections projecting from the installation surface and having contact surfaces to which the wafer is to contact. A back side gas is flown into a space defined by the installation surface, the projections and the wafer, heat is supplied to the wafer, and heat of the wafer is conducted to the electrostatic chuck through the projections and the back side gas. The total area of the contact surfaces of the projections is not more than 1% of the area of the inner electrode, and the height of the projections are not less than 1 &mgr;m and not more than 10 &mgr;m.

    摘要翻译: 静电卡盘包括卡盘主体,形成在卡盘主体的表面上并具有安装表面的绝缘层,安装在其上的晶片的安装表面,安装在绝缘层内部的内部电极和从安装表面突出的突起 并具有与晶片接触的接触表面。 背面气体流入由安装表面,突起和晶片限定的空间中,将热量供应到晶片,并且通过突起和背侧气体将晶片的热量传导到静电卡盘。 突起的接触表面的总面积不大于内部电极的面积的1%,突起的高度不小于1mum且不大于10um。

    Plasma processing member
    10.
    发明授权
    Plasma processing member 有权
    等离子体处理部件

    公开(公告)号:US07582184B2

    公开(公告)日:2009-09-01

    申请号:US11361177

    申请日:2006-02-24

    摘要: A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode. The impedance of the plasma processing member when plasma is generated using high frequency power at a frequency higher than 13.56 MHz is adjusted to 25Ω or less.

    摘要翻译: 等离子体处理部件包括陶瓷基体,嵌入在陶瓷基体中的等离子体产生电极以及与等离子体产生电极连接的电极电源部件。 当使用高于13.56MHz的频率的高频功率产生等离子体时的等离子体处理部件的阻抗被调整为25Om以下。