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40 条记录 (耗时 0.056 秒)

    Ceramic member-electric power supply connector coupling structure
    3.
    发明授权
    Ceramic member-electric power supply connector coupling structure 失效
    陶瓷构件 - 电源连接器耦合结构

    公开(公告)号：US5995357A

    公开(公告)日：1999-11-30

    申请号：US13045

    申请日：1998-01-26

    申请人： Ryusuke Ushikoshi ,  Hideyoshi Tsuruta ,  Tomoyuki Fujii

    发明人： Ryusuke Ushikoshi ,  Hideyoshi Tsuruta ,  Tomoyuki Fujii

    IPC分类号： H01L21/683 ,  H01R13/24 ,  H02N13/00

    CPC分类号： H01J37/32577 ,  H01R13/24

    摘要： A ceramic member-electric power supply connector coupling structure includes a ceramic member with a hole and is provided with a metallic member therein so as to be partially exposed to the hole. An electric power supply connector and a tubular atmosphere-shielding member are provided in the hole. Further, a stress-mitigating, low heat expansion conductor is provided inside the atmosphere-shielding member and the power supply connector is partially positioned therein. The atmosphere-shielding member is gas-tightly joined to the power supply connector, and the expansion conductor and the tubular atmosphere-shielding member are joined to the metallic member. The coupling structure has high heat and corrosion resistance, high joining strength, and remains highly conductive even at high temperature conditions in an oxidative or corrosive environment.

    摘要翻译： 陶瓷构件 - 电源连接器联接结构包括具有孔的陶瓷构件，并且在其中设置有金属构件以部分地暴露于孔。 电源连接器和管状气氛屏蔽部件设置在孔中。 此外，在气氛屏蔽部件内部设置有减轻应力的低热膨胀导体，电源连接器部分地位于其中。 气密屏蔽构件气密地接合到电源连接器，并且膨胀导体和管状气氛屏蔽构件接合到金属构件。 连接结构具有高耐热腐蚀性，接合强度高，即使在氧化或腐蚀性环境的高温条件下也能保持高导电性。

    Ceramics joint structure and method of producing the same
    4.
    发明授权
    Ceramics joint structure and method of producing the same 失效
    陶瓷接头结构及其制造方法

    公开(公告)号：US06617514B1

    公开(公告)日：2003-09-09

    申请号：US09095157

    申请日：1998-06-10

    申请人： Ryusuke Ushikoshi ,  Hideyoshi Tsuruta ,  Tomoyuki Fujii

    发明人： Ryusuke Ushikoshi ,  Hideyoshi Tsuruta ,  Tomoyuki Fujii

    IPC分类号： H01R400

    CPC分类号： H01L21/6833

    摘要： The disclosed ceramics joint structure, in which a ceramics member having an oxidation resistance property and a metal member are joined via a joint layer, has a structure such that a part of the embedded member is exposed to a joint surface of the ceramics member, which is contacted with the joint layer to form a metal exposing portion, and the ceramics member and the metal exposing portion are joined via the joint layer to the metal member respectively. Moreover, the joint layer is mainly made of one or more metal selected from the group consisting of gold, platinum and palladium.

    摘要翻译： 所公开的具有耐氧化性的陶瓷构件和金属构件的陶瓷接头结构通过接合层接合，具有使嵌入构件的一部分暴露于陶瓷构件的接合面的结构， 与接合层接触以形成金属暴露部分，并且陶瓷构件和金属暴露部分分别经由接合层接合到金属构件。 此外，接合层主要由选自金，铂和钯的一种或多种金属制成。

    Ceramic heater
    6.
    发明授权
    Ceramic heater 有权
    陶瓷加热器

    公开(公告)号：US06225606B1

    公开(公告)日：2001-05-01

    申请号：US09222223

    申请日：1998-12-29

    申请人： Hideyoshi Tsuruta ,  Ryusuke Ushikoshi ,  Kazuaki Yamaguchi

    发明人： Hideyoshi Tsuruta ,  Ryusuke Ushikoshi ,  Kazuaki Yamaguchi

    IPC分类号： H05B368

    CPC分类号： H05B3/74 ,  H05B3/283 ,  H05B2203/014

    摘要： A ceramic heater includes a ceramic substrate having a heating surface, and a resistance heating element buried inside the ceramic substrate, wherein at least a part of the resistance heating element is constituted by a conductive network member, and a ceramic material constituting the ceramic substrate is filled in meshes of the network member.

    摘要翻译： 陶瓷加热器包括具有加热面的陶瓷基板和埋在陶瓷基板内的电阻加热元件，其中电阻加热元件的至少一部分由导电网络构件构成，构成陶瓷基板的陶瓷材料为 填充网络成员的网格。

    Plasma processing member
    8.
    发明授权
    Plasma processing member 有权
    等离子体处理部件

    公开(公告)号：US07582184B2

    公开(公告)日：2009-09-01

    申请号：US11361177

    申请日：2006-02-24

    申请人： Yasumitsu Tomita ,  Hideyoshi Tsuruta

    发明人： Yasumitsu Tomita ,  Hideyoshi Tsuruta

    IPC分类号： H01L21/3065 ,  C23C16/50 ,  C23C16/503 ,  C23C16/509 ,  C23C16/46

    CPC分类号： H01J37/32532 ,  H01J37/32009 ,  H01J37/32577 ,  H01J2237/0206

    摘要： A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode. The impedance of the plasma processing member when plasma is generated using high frequency power at a frequency higher than 13.56 MHz is adjusted to 25Ω or less.

    摘要翻译： 等离子体处理部件包括陶瓷基体，嵌入在陶瓷基体中的等离子体产生电极以及与等离子体产生电极连接的电极电源部件。 当使用高于13.56MHz的频率的高频功率产生等离子体时的等离子体处理部件的阻抗被调整为25Om以下。

    Systems for producing semiconductors and members therefor
    9.
    发明授权
    Systems for producing semiconductors and members therefor 有权
    半导体制造系统及其成员

    公开(公告)号：US07157666B2

    公开(公告)日：2007-01-02

    申请号：US10753583

    申请日：2004-01-08

    申请人： Yoshinobu Goto ,  Hideyoshi Tsuruta

    发明人： Yoshinobu Goto ,  Hideyoshi Tsuruta

    IPC分类号： C23C16/00 ,  F27B5/08 ,  F27B5/16

    CPC分类号： F27B17/0025 ,  F27D11/02 ,  H01L21/67109

    摘要： A member provided around a susceptor for mounting a semiconductor in a chamber of a semiconductor production system. The member has a face opposing the susceptor and a center line average surface roughness of the face opposing the susceptor is 0.5 μm or less. Alternatively, the face opposing the susceptor has a thermal emissivity ε of 0.5 or lower. The member can also be a liner [4] having a supported face [4] whose area is not more than 20 percent of that of the face [4] opposing the susceptor.

    摘要翻译： 设置在基座周围的构件，用于将半导体安装在半导体生产系统的腔室中。 该构件具有与基座相对的面，并且与基座相对的面的中心线平均表面粗糙度为0.5μm以下。 或者，与感受器相对的面的热发射率ε为0.5以下。 该构件还可以是具有支撑面[4]的衬垫[4]，其面积不大于与感受器相对的面部[4]面积的20％。

    ELECTROSTATIC CHUCK
    10.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开
    静电卡

    公开(公告)号：US20070146961A1

    公开(公告)日：2007-06-28

    申请号：US11611905

    申请日：2006-12-18

    申请人： Ikuhisa Morioka ,  Hideyoshi Tsuruta ,  Tetsuya Kawajiri ,  Takeru Torigoe

    发明人： Ikuhisa Morioka ,  Hideyoshi Tsuruta ,  Tetsuya Kawajiri ,  Takeru Torigoe

    IPC分类号： H01L21/683

    CPC分类号： H02N13/00 ,  H01L21/6831 ,  H01L21/6875

    摘要： An electrostatic chuck includes: a base body; an electrode formed on the base body and generating coulomb force; and a dielectric layer formed on the base body and electrode, having a plurality of projections on a first main face on the side supporting a substrate attracted by the coulomb force, and supporting the substrate on the upper surfaces of these projections. The projections are arranged at substantially uniform intervals. The surface roughness (Ra) of the projection upper faces is 0.5 μm or smaller. The height of the projections is 5 to 20 μm. The relation A1/2×B2>200 is satisfied where A (number/100 cm2) is the number of the projections per unit area of 100 cm2 in the first main face, and B (μm) is the height of the projections.

    摘要翻译： 静电卡盘包括：基体; 形成在基体上并产生库仑力的电极; 以及形成在基体和电极上的电介质层，在支撑被库仑力吸引的基板的一侧的第一主面上具有多个突起，并且将基板支撑在这些突起的上表面上。 突起以大致均匀的间隔布置。 投影面的表面粗糙度（Ra）为0.5μm以下。 突起的高度为5至20毫米。 满足关系A <1/2>×B <2> 200，其中A（数/ 100cm 2）是每单位的突起数 第一主面的面积为100cm 2，B（mum）是突起的高度。