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    Pattern drawing method by scanning beam and pattern drawing apparatus
    4.
    发明授权
    Pattern drawing method by scanning beam and pattern drawing apparatus 失效
    扫描光束和图案绘制装置的图案绘制方法

    公开(公告)号：US07053387B2

    公开(公告)日：2006-05-30

    申请号：US10639165

    申请日：2003-08-11

    申请人： Osamu Masuda ,  Kazumi Furuta

    发明人： Osamu Masuda ,  Kazumi Furuta

    IPC分类号： G21K5/10

    CPC分类号： H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/1857 ,  G02B5/1876 ,  G11B7/13922 ,  H01J37/3174 ,  H01J2237/30461 ,  H01J2237/31764 ,  H01J2237/31766

    摘要： A pattern drawing method of drawing a desired pattern on a base material by irradiating an electronic beam and scanning the base material with the electronic beam with a predetermined dose amount, comprising: a first step of drawing a first region on the base material by scanning with the electronic beam with a first dose amount; a second step of drawing a second region on the base material by scanning with the electronic beam with a second dose amount; and a inclining step of inclining a boundary between the first region and the second region to form an inclined surface by conducting a first scanning to scan with the electronic beam with the first dose amount and a second scanning to scan with the electronic beam with the second does amount in a mixed arrangement.

    摘要翻译： 一种通过用电子束照射电子束并用电子束以预定剂量扫描基底材料来在基材上绘制所需图案的图案描绘方法，包括：第一步骤，通过扫描基底材料上的第一区域， 具有第一剂量的电子束; 第二步骤，通过用第二剂量的电子束扫描来在基材上绘制第二区域; 以及倾斜步骤，通过用电子束以第一剂量进行第一次扫描扫描以及第二次扫描，使第二区域和第二区域之间的边界倾斜以形成倾斜表面，并用第二扫描电子束扫描第二扫描 确实是混合排列的。

    Optical element, optical element manufacturing method and optical pickup device
    6.
    发明授权
    Optical element, optical element manufacturing method and optical pickup device 失效
    光学元件，光学元件制造方法和光学拾取装置

    公开(公告)号：US07907499B2

    公开(公告)日：2011-03-15

    申请号：US12309495

    申请日：2007-07-09

    申请人： Osamu Masuda ,  Masahiro Morikawa ,  Hiroshi Miyakoshi

    发明人： Osamu Masuda ,  Masahiro Morikawa ,  Hiroshi Miyakoshi

    IPC分类号： G11B7/135

    CPC分类号： G02B5/3083 ,  G02B5/3058 ,  G02B27/28 ,  G11B7/1367 ,  G11B7/1381 ,  G11B2007/0013

    摘要： An optical element includes: opposing surfaces each including two areas each of which includes a fine-periodic structure. The fine-periodic structures of the two areas have different directions from each other in each of the opposing surfaces. One of the opposing surfaces with the fine-periodic structures works as a quarter-wave plate and the other of the opposing surfaces with the fine-periodic structures works as a polarization separating element. A boundary of the two areas in one of the opposing surfaces and a boundary of the two areas in the other of the opposing surfaces are positionally identical.

    摘要翻译： 光学元件包括：各自包括两个区域的相对表面，每个区域包括精细周期性结构。 两个区域的精细周期结构在每个相对表面中彼此具有不同的方向。 具有精细周期性结构的相对表面之一用作四分之一波片，并且具有精细周期结构的另一个相对表面用作偏振分离元件。 一个相对表面中的两个区域的边界和另一个相对表面中的两个区域的边界在位置上是相同的。

    Optical Element, Optical Element Manufacturing Method and Optical Pickup Device
    7.
    发明申请
    Optical Element, Optical Element Manufacturing Method and Optical Pickup Device 失效
    光学元件，光学元件制造方法和光学拾取装置

    公开(公告)号：US20100002299A1

    公开(公告)日：2010-01-07

    申请号：US12309495

    申请日：2007-07-09

    申请人： Osamu Masuda ,  Masahiro Morikawa ,  Hiroshi Miyakoshi

    发明人： Osamu Masuda ,  Masahiro Morikawa ,  Hiroshi Miyakoshi

    IPC分类号： G02B5/30 ,  B29D11/00

    CPC分类号： G02B5/3083 ,  G02B5/3058 ,  G02B27/28 ,  G11B7/1367 ,  G11B7/1381 ,  G11B2007/0013

    摘要： An optical element includes: opposing surfaces each including two areas each of which includes a fine-periodic structure. The fine-periodic structures of the two areas have different directions from each other in each of the opposing surfaces. One of the opposing surfaces with the fine-periodic structures works as a quarter-wave plate and the other of the opposing surfaces with the fine-periodic structures works as a polarization separating element. A boundary of the two areas in one of the opposing surfaces and a boundary of the two areas in the other of the opposing surfaces are positionally identical.

    摘要翻译： 光学元件包括：各自包括两个区域的相对表面，每个区域包括精细周期性结构。 两个区域的精细周期结构在每个相对表面中彼此具有不同的方向。 具有精细周期性结构的相对表面之一用作四分之一波片，并且具有精细周期结构的另一个相对表面用作偏振分离元件。 一个相对表面中的两个区域的边界和另一个相对表面中的两个区域的边界在位置上是相同的。

    Wide-band wave plate and a controlling method thereof
    8.
    发明授权
    Wide-band wave plate and a controlling method thereof 失效
    宽带波片及其控制方法

    公开(公告)号：US07319558B2

    公开(公告)日：2008-01-15

    申请号：US11360947

    申请日：2006-02-23

    申请人： Osamu Masuda ,  Kazumi Furuta ,  Makiko Imae

    发明人： Osamu Masuda ,  Kazumi Furuta ,  Makiko Imae

    IPC分类号： G02B5/30

    CPC分类号： G02B5/3083 ,  G02B5/1809

    摘要： A wide-band wave plate having at least two wave plates, each of which has a microstructure to generate a phase difference, the microstructure having a cycle not shorter than 1/nmin of a shortest wavelength of light in use, wherein the two wave plates are arranged to face opposite with their main axes in non-parallel with each other, wherein nmin is a refractive index of a wave plate material with respect to the shortest wavelength.

    摘要翻译： 具有至少两个波片的宽带波片，每个波片具有微结构以产生相位差，所述微结构具有不短于最短波长的光的1 / n 的周期 在使用中，其中两个波片布置成彼此不平行地与其主轴线相对，其中n分钟是波片材料相对于最短波长的折射率 。

    Wide-band wave plate and a controlling method thereof
    9.
    发明申请
    Wide-band wave plate and a controlling method thereof 失效
    宽带波片及其控制方法

    公开(公告)号：US20060193045A1

    公开(公告)日：2006-08-31

    申请号：US11360947

    申请日：2006-02-23

    申请人： Osamu Masuda ,  Kazumi Furuta ,  Makiko Imae

    发明人： Osamu Masuda ,  Kazumi Furuta ,  Makiko Imae

    IPC分类号： G02B27/28 ,  G02B5/30

    CPC分类号： G02B5/3083 ,  G02B5/1809

    摘要： A wide-band wave plate having at least two wave plates, each of which has a microstructure to generate a phase difference, the microstructure having a cycle not shorter than 1/nmin of a shortest wavelength of light in use, wherein the two wave plates are arranged to face opposite with their main axes in non-parallel with each other, wherein nmin is a refractive index of a wave plate material with respect to the shortest wavelength.

    摘要翻译： 具有至少两个波片的宽带波片，每个波片具有微结构以产生相位差，所述微结构具有不短于最短波长的光的1 / n 的周期 在使用中，其中两个波片布置成彼此不平行地与其主轴线相对，其中n分钟是波片材料相对于最短波长的折射率 。

    Electron-beam writing device and electron-beam writing method
    10.
    发明申请
    Electron-beam writing device and electron-beam writing method 失效
    电子束写入装置和电子束写入方法

    公开(公告)号：US20050018496A1

    公开(公告)日：2005-01-27

    申请号：US10897344

    申请日：2004-07-22

    申请人： Osamu Masuda ,  Kazumi Furuta ,  Kunito Hayashi ,  Kazuhiko Kobayashi

    发明人： Osamu Masuda ,  Kazumi Furuta ,  Kunito Hayashi ,  Kazuhiko Kobayashi

    IPC分类号： G11C5/00 ,  H01J37/302 ,  H01J37/304 ,  H01J37/317

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/31761

    摘要： The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point distance L of a writing pattern (S502), and number-of-scan-clocks calculating means 312 calculates the number of scan clocks required to write the writing pattern based on the start-to-end point distance L and a unit distance corresponding to the minimum time resolution for a high-speed D/A converter 306 (S503). Count conversion means 605 separates the start-to-end point distance L into X and Y components to convert them in an equation using the number of scan clocks (S504). Based on the equation, variable rate calculating means 314 calculates an extinction ratio to determine the extinction ratio at a variable attenuator 307 (S505). ATT D/A converter 303 specifies the extinction ratio at the attenuator 307 to reduce the unit distance corresponding to the resolving power of the high-speed D/A converter 306 so that an electron beam will be irradiated and scanned at intervals of the reduced unit distance to perform writing.

    摘要翻译： 本发明旨在提供一种以高速度高精度地写入线的装置和方法。 距离计算装置311计算写入模式的起点到终点距离L（S502），并且扫描时间计算装置312基于开始时间计算装置312计算写入写入模式所需的扫描时钟数， 端点距离L和对应于高速D / A转换器306的最小时间分辨率的单位距离（S503）。 计数转换装置605将起点到终点距离L分离为X和Y分量，以使用扫描时钟数在等式中转换它们（S504）。 基于该方程，可变速率计算装置314计算消光比以确定可变衰减器307处的消光比（S505）。 ATT D / A转换器303指定衰减器307处的消光比，以减小对应于高速D / A转换器306的分辨率的单位距离，使得将电子束以缩小单位的间隔照射和扫描 执行写作的距离