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公开(公告)号：US20060207969A1
公开(公告)日：2006-09-21
申请号：US11438613
申请日：2006-05-19
IPC分类号： B08B3/12 , B44C1/22 , H01L21/306 , C23F1/00
CPC分类号： H01L21/67253 , B08B3/10
摘要： In a substrate treating unit, a removal liquid supplying mechanism supplies a removal liquid to the surface of a substrate. In order to retain the removal liquid on the surface of the substrate for a fixed time, a spin chuck is operated to spin the substrate at such a low speed as to retain the removal liquid on the substrate, or spins the substrate intermittently, or temporarily stops spinning of the substrate. Thus, treatment with the removal liquid progresses without a further supply of the removal liquid, thereby restraining consumption of the removal liquid.
摘要翻译： 在基板处理单元中，去除液体供给机构将去除液体供给到基板的表面。 为了将固定时间的基板表面上的去除液体保持在一定的时间，操作旋转卡盘以使该基板以低速旋转，以将去除液体保持在基板上，或者间歇地或暂时地旋转基板 停止旋转衬底。 因此，除去液体的处理不会再进一步供给除去液体，从而抑制去除液体的消耗。
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公开(公告)号：US07074726B2
公开(公告)日：2006-07-11
申请号：US10355960
申请日：2003-01-30
IPC分类号： H01L21/302
CPC分类号： H01L21/67253 , B08B3/10
摘要： In a substrate treating unit, a removal liquid supplying mechanism supplies a removal liquid to the surface of a substrate. In order to retain the removal liquid on the surface of the substrate for a fixed time, a spin chuck is operated to spin the substrate at such a low speed as to retain the removal liquid on the substrate, or spins the substrate intermittently, or temporarily stops spinning of the substrate. Thus, treatment with the removal liquid progresses without a further supply of the removal liquid, thereby restraining consumption of the removal liquid.
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公开(公告)号：US07479205B2
公开(公告)日：2009-01-20
申请号：US10841646
申请日：2004-05-10
申请人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
发明人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
IPC分类号： H01L21/027 , H01L21/44
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/02 , B08B2203/0288
摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
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公开(公告)号：US20050124518A1
公开(公告)日：2005-06-09
申请号：US11037521
申请日：2005-01-18
申请人： Hiroaki Sugimoto , Seiichiro Okuda , Takuya Kuroda
发明人： Hiroaki Sugimoto , Seiichiro Okuda , Takuya Kuroda
IPC分类号： B08B5/00 , B08B3/02 , B08B3/08 , B08B7/00 , H01L21/304 , H01L21/306 , C11D1/00
CPC分类号： H01L21/02052 , B08B3/02
摘要： A substrate treating apparatus includes a cleaning medium feed mechanism having a discharge nozzle for discharging warm water as a cleaning medium toward a substrate. The discharge nozzle is reciprocable between a position opposed to the center of rotation of the substrate held and rotated by a spin chuck and a position opposed to the edge of the substrate. The discharge nozzle is connected to a deionized water source through a solenoid valve and a heater. Deionized water fed from the deionized water source is heated warm and supplied to the substrate through the discharge nozzle.
摘要翻译： 基板处理装置包括具有用于将温水作为清洁介质朝向基板排出的排出喷嘴的清洗介质供给机构。 排出喷嘴可以在通过旋转卡盘保持和旋转的基板的旋转中心与与基板的边缘相对的位置相对的位置之间往复运动。 排放喷嘴通过电磁阀和加热器连接到去离子水源。 从去离子水源供给的去离子水被加温，并通过排出喷嘴供给到基材。
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公开(公告)号：US07428907B2
公开(公告)日：2008-09-30
申请号：US10838926
申请日：2004-05-05
申请人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
发明人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
IPC分类号： B08B3/02
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/02 , B08B2203/0288 , H01L21/67051 , Y10S134/902
摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
摘要翻译： 基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。 液体可以是去除液体，中间漂洗液体或去离子水。 在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。
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公开(公告)号：US06550988B2
公开(公告)日：2003-04-22
申请号：US09984533
申请日：2001-10-30
申请人： Hiroaki Sugimoto , Seiichiro Okuda , Takuya Kuroda
发明人： Hiroaki Sugimoto , Seiichiro Okuda , Takuya Kuroda
IPC分类号： G03D500
CPC分类号： H01L21/67051 , G03F7/3021 , H01L21/67028 , Y10S134/902
摘要： A removal liquid is supplied to a substrate on which a thin film formed is patterned by dry etching using a resist film as a mask, and cleaning is made with de-ionized water, thereby removing a reaction product generated on the surface of the substrate. After that, the processed substrate is heated, thereby completely drying the substrate from which the reaction product has been eliminated.
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公开(公告)号：US07267130B2
公开(公告)日：2007-09-11
申请号：US10836283
申请日：2004-05-03
申请人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
发明人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
IPC分类号： B08B3/02
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/02 , B08B2203/0288 , H01L21/67051 , Y10S134/902
摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
摘要翻译： 基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。 液体可以是去除液体，中间漂洗液体或去离子水。 在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。
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公开(公告)号：US06951221B2
公开(公告)日：2005-10-04
申请号：US09957652
申请日：2001-09-21
申请人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
发明人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/02 , B08B2203/0288 , H01L21/67051 , Y10S134/902
摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
摘要翻译： 基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。 液体可以是去除液体，中间漂洗液体或去离子水。 在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。
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公开(公告)号：US07330570B2
公开(公告)日：2008-02-12
申请号：US10444978
申请日：2003-05-27
申请人： Koji Sogo , Mihoko Takahashi , Takuya Kuroda
发明人： Koji Sogo , Mihoko Takahashi , Takuya Kuroda
CPC分类号： G06K9/00288
摘要： The invention provides a highly-reliable face collation apparatus and biometrics data collation apparatus in both of which when a person is to be identified, even at the time of a collation in which characteristic data on the person approximates to characteristic data on one of the other persons, the characteristic data are comprehensively collated by combination, whereby the person and the other person can be clearly discriminated from each other to reduce collation errors. The face collation apparatus includes a face image acquiring unit for acquiring face images, a storage unit in which a plurality of different face images on each of persons who are collation targets are stored in advance in such a manner as to be associated with each of the persons, a calculating unit for calculating collation degree data obtained by comparing the acquired face images with the stored face images, an extracting unit for extracting face images of high collation degrees by a predetermined number from among the calculated collation degree data, and an identifying unit for identifying a person when all face images of the person are contained in results extracted by the extracting unit.
摘要翻译： 本发明提供了一种高度可靠的面部对照装置和生物特征数据对照装置，即使在人物的特征数据近似于其他一个的特征数据的对照时，即使在人物被识别的情况下， 人员，特征数据通过组合进行全面整理，可以清楚地区分对方和对方，以减少对照错误。 面部对照装置包括：面部图像获取单元，用于获取面部图像;存储单元，其中预先存储作为对照目标的每个人的多个不同的面部图像，以便与每个 人，计算单元，用于计算通过比较所获取的面部图像与所存储的面部图像获得的对照度数据;提取单元，用于从计算的核对度数据中提取预定数量的高对照度的面部图像，以及识别单元 用于当人的所有脸部图像包含在由提取单元提取的结果中时识别人。
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公开(公告)号：US08956695B2
公开(公告)日：2015-02-17
申请号：US13359388
申请日：2012-01-26
CPC分类号： G03F7/30 , B05D1/005 , G03F7/2041 , G03F7/3021 , H01L21/6715
摘要： A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.
摘要翻译： 用于显影衬底的方法包括用旋转保持器旋转衬底并将显影剂从显影剂供给器上排列成排的多个排气口排出到衬底。 该方法还包括使移动机构在平面图中沿着延伸到基板中心的一个方向移动所述显影剂供给器，同时保持所述排气口在所述一个方向上的布置方向，从而使所述显影剂进料器基本上 中心和基底的边缘。 所述方法还包括使从所述排气口排出的显影剂在基板上分离的流中撞击，并使每一个分离的流在基板上螺旋地冲击，从而显影基板。 对应于所述排气口的显影剂冲击位置的至少两个轨迹彼此重叠。
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