Process control device and process control method
    10.
    发明授权
    Process control device and process control method 有权
    过程控制装置和过程控制方法

    公开(公告)号:US06788990B1

    公开(公告)日:2004-09-07

    申请号:US09656839

    申请日:2000-09-07

    IPC分类号: G06F1900

    摘要: A process control device controls a plurality of processing devices placed in parallel to perform at least two process steps for consecutively processing workpieces in a lot. The process control device includes a device group information for grouping of a plurality of processing devices into a plurality of device groups. For example, when the workpieces are semiconductor devices, processing devices having identical deviating characteristics are grouped into the same group to perform a plurality of photolithographic steps. The process control device further includes a device group selecting unit for selecting the device group such that the lot is processed in the second process step using a processing device included in the same device group as a processing device used in the first process step.

    摘要翻译: 过程控制装置控制并行放置的多个处理装置,以执行至少两个用于连续处理工件的处理步骤。 过程控制装置包括用于将多个处理装置分组成多个装置组的装置组信息。 例如,当工件是半导体器件时,具有相同偏差特性的处理器件被分组成相同的组以执行多个光刻步骤。 过程控制装置还包括:设备组选择单元,用于选择设备组,使得使用包括在与第一处理步骤中使用的处理设备相同的设备组中的处理设备在第二处理步骤中处理批次。