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    Method and equipment for plasma processing
    1.
    发明授权
    Method and equipment for plasma processing 失效
    等离子体处理方法和设备

    公开(公告)号：US5401356A

    公开(公告)日：1995-03-28

    申请号：US922487

    申请日：1992-07-31

    申请人： Hiromichi Enami ,  Kiyomi Yagi ,  Masanori Katsuyama ,  Akihiko Konno

    发明人： Hiromichi Enami ,  Kiyomi Yagi ,  Masanori Katsuyama ,  Akihiko Konno

    IPC分类号： C23C16/50 ,  C23C16/44 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/311 ,  H01L21/3213 ,  H05H1/46 ,  H01L21/306

    CPC分类号： H01J37/32871 ,  C23C16/4401 ,  H01L21/31116 ,  H01L21/32136 ,  H01L21/32137

    摘要： The amount of dust particles deposited on a semiconductor wafer during plasma etching or CVD in manufacturing a semiconductor integrated circuit is decreased by second plasma generating electrode 28 disposed around a lower electrode 15 in a plasma etching chamber 4a. High frequency voltage is applied to the second plasma generating electrode 18 just before the stop of plasma discharge to form a sub-plasma of high density along the outer periphery of the lower electrode 15, there is formed a sub-potential distribution acting to push out negatively charged dust particles stagnating near the main surface of a semiconductor substrate 7 toward the outer periphery of the wafer. The negatively charged dust particles thus pushed out from the vicinity of the main surface of the wafer 7 are moved to the second plasma generating electrode 28 and exhausted by a vacuum pump through an exhaust port 25.

    摘要翻译： 在制造半导体集成电路的等离子体蚀刻或CVD期间沉积在半导体晶片上的尘埃颗粒的量由在等离子体蚀刻室4a中的下部电极15周围设置的第二等离子体产生电极28而降低。 在等离子体放电停止之前将高频电压施加到第二等离子体产生电极18，以形成沿着下电极15的外周的高密度的亚等离子体，形成用于推出的次电位分布 滞留在半导体衬底7的主表面附近的带负电的灰尘颗粒朝向晶片的外周。 从晶片7的主表面附近推出的带负电的灰尘颗粒被移动到第二等离子体产生电极28，并通过排气口25由真空泵排出。

    Developing paper
    8.
    发明授权
    Developing paper 有权
    开发论文

    公开(公告)号：US06368766B2

    公开(公告)日：2002-04-09

    申请号：US09794923

    申请日：2001-02-27

    申请人： Akihiro Horii ,  Akihiko Konno ,  Masanobu Hida ,  Satoru Shinohara

    发明人： Akihiro Horii ,  Akihiko Konno ,  Masanobu Hida ,  Satoru Shinohara

    IPC分类号： G03E800

    CPC分类号： B41M5/5227

    摘要： A developing paper having an image receiving dye layer containing a plasticizing agent on a substrate, the plasticizing agent including a solid plasticizing agent which is solid in the application temperature and a liquid plasticizing agent which is liquid in the application temperature. Since the developing paper contains a plasticizing agent including a liquid plasticizing agent and a solid plasticizing agent, the developing paper has an excellent light resistance. Moreover, since the plasticizing agent contains a liquid plasticizing agent and a solid plasticizing agent, there is no danger of precipitation of the plasticizing agent from the surface of the developing paper. Furthermore, the developing paper containing the aforementioned plasticizing agent enables to obtain a desirable plasticizing effect.

    摘要翻译： 一种显影纸，其具有在基材上含有增塑剂的图像接收染料层，所述增塑剂包括在使用温度下为固体的固体增塑剂和在施加温度下为液体的液体增塑剂。由于显影纸含有 包括液体增塑剂和固体增塑剂的增塑剂，显影纸具有优异的耐光性。 此外，由于增塑剂含有液体增塑剂和固体增塑剂，因此不会从显影纸的表面沉淀塑化剂的危险。 此外，含有上述增塑剂的显影纸能够获得理想的增塑效果。