摘要:
An insert rotary cutter for processing a metal workpiece includes a cutter body of a generally circular cross-section having an axis of rotation therethrough. The cutter includes one or more cutter inserts releasably mounted on a periphery of the cutter body. The insert includes a generally quadrilateral plate defined by a front face, a rear face disposed generally parallel to the front face and four side faces. The insert has a pair of main cutting edges defined by the front face and one pair of the opposite side faces. The pair of opposite side faces serve as respective rake surfaces for the main cutting edges. Each of the rake surfaces is convexly curved in such a manner that the width of the insert between the rake surfaces is larger at a central portion of each main cutting edge than at opposite ends of the main cutting edge.
摘要:
An insert rotary cutter for processing a metal workpiece includes a cutter body having an axis of rotation therethrough. The cutter includes at least one cutter insert releasably mounted on an outer periphery of the body. The insert is of a generally polygonal shape having a curved front face. The front face has a pair of opposed marginal ridges serving as respective main cutting edges. The front face has marginal portions disposed adjacent and extending along the main cutting edges, and the marginal portions serve as respective rake surfaces for the main cutting edges. Each of the rake surface is convexly curved as viewed from a respective one of the main cutting edges and is concavely curved as viewed along a respective one of the main cutting edges.
摘要:
An insert cutter includes a body having at least one generally radially outwardly-opening recess disposed adjacent a forward end face thereof. A cutter insert is received in the recess. The insert is a polygonal shape having a front face, a rear face and side faces. Each corner portion where adjacent side faces intersect each other is removed to provide first and second corner faces. The insert has main cutting edges each defined by the front face and a respective one of the side faces, auxiliary cutting edges each defined by the front face and a respective one of the first corner faces, and corner cutting edges each defined by the front face and a respective one of the second corner faces. Each side face serves as a flank of a respective one of the main cutting edges with a positive clearance angle A. Each first corner face serves as a flank of a respective one of the auxiliary cutting edges with a positive clearance angle B. Each second corner face serves as a flank of a respective one of the corner cutting edges with a positive clearance angle C. The angles A, B and C are so selected as to satisfy A
摘要:
A non-aqueous electrolyte secondary cell containing an electricity-generating element with at least a cathode, a separator and an anode and a non-aqueous electrolyte inside a cathode case, electrode units each consisting of the cathode and the anode opposite to each another via the separator laminated to form an electrode group, or an electrode unit in a sheet form consisting of the cathode and the anode opposite to each another via the separator wound to form an electrode group, or a sheet-shape cathode wrapped with the separator except for a part contacting at inner face of cathode case and a sheet-shaped anode set on the sheet-shaped cathode in a right angled position each other and bent alternately to form an electrode group, and the total sum of the areas of the opposing cathode and anode in the electrode group larger than the area of the opening of an insulating gasket in a sealed portion in the cathode case or than the area of an opening in a sealed plate in a sealed portion in the cathode case.
摘要:
A device for supplying masks to be used in a chamber having a wall, comprises an opening formed in the wall of the chamber, and a rotatable shelf disposed in the opening and for carrying thereon the masks. The rotatable shelf is coupled, by way of a rotational shaft, to a portion of the wall adjacent to the opening and the rotational shelf has a mask carrying portion which is rotationally movable, about the rotational shaft, through the opening to and from the inside of the chamber and from and to the outside of the chamber.
摘要:
The optical fiber fusion-splice device comprises a pair of electric discharge electrodes provided opposed to each other along a predetermined axis, a conductor electrode disposed on one side with respect to a plane with the predetermined axis contained therein, and section for generating electrostatic attraction in the direction tending from the above-described plane toward the one side, between the conductor electrode and the electric discharge path produced between the electric discharge electrodes. The means for generating electrostatic attraction is connected to the conductor electrode. This fusion splicer fusion-splices together the end portions of optical fibers disposed on the other side with respect to the above plane by electric discharge produced between the electric discharge electrodes.
摘要:
Herein disclosed are a method and an apparatus for supplying an electrical energy to a pair of discharge electrodes spaced apart from each other to cause an electric discharge in a gap between the discharge electrodes. There are firstly provided an alternating voltage generator for generating, as the electrical energy, an alternating voltage having a frequency, and a capacitor connected to the discharge electrodes in series. The alternating voltage generator has a series resonant frequency. The alternating voltage of the alternating voltage generator is applied to the discharge electrodes through the capacitor. The frequency of the alternating voltage is set approximately to the series resonant frequency of the alternating voltage generator to cause a dielectric breakdown in and allow an electric discharge current to flow through the gap between the discharge electrodes. Alternatively, the frequency of the alternating voltage may be approximated to the series resonant frequency of the alternating voltage generator, for example, from a frequency higher than the series resonant frequency.
摘要:
A projection exposure apparatus with a small size and low cost suitable for repeated pattern exposure. The apparatus includes an illumination system which irradiates light to a mask including plural columns of a mask pattern for repeated exposure to a member to form plural columns of an exposure pattern, a projection system which projects light from the mask onto the member, an exposure stage which moves the member, and a mask stage which moves the mask. The light irradiation and step driving of the exposure stage for moving the member by a movement amount equal to n times a pitch of the columns of the exposure pattern are alternately performed. The mask is moved by a movement amount equal to n times a pitch of the columns of the mask pattern with step driving of the exposure stage in early and later phases of the repeated exposure.
摘要:
A projection exposure apparatus includes a projection exposure mask. The projection exposure mask includes a first mask pattern for exposing a member to form a continuous pattern thereon and a second mask pattern for exposing the member to form a discontinuous pattern thereon, one of the first and second mask patterns being a reflecting type mask and the other mask pattern being a transmitting type mask pattern, a projection system which projects light from the reflecting type mask pattern and light from the transmitting type mask pattern onto the member, a first illumination system which irradiates light to the reflecting type mask pattern from one side of the projection exposure mask, a second illumination system which irradiates light to the transmitting type mask pattern from the opposite side of the one side of the projection exposure mask, and a substrate stage which moves the member in a direction substantially orthogonal to a projection light axis of the projection system.
摘要:
The invention provides a wafer polishing apparatus and a wafer manufacturing method which can improve uniformity in polishing wafer surfaces. A wafer holding head comprises a head body; a diaphragm stretched inside the head body; a carrier fixed to the diaphragm to be displaceable in the direction of a head axis while holding the wafer; a retainer ring disposed around the carrier in concentric relation and fixed to the diaphragm to be displaceable in the direction of the head axis; and a thin plate disposed so as to project from the head body along a surface of the diaphragm. With the provision of the thin plate, an excessive pressing force acting upon the retainer ring from the diaphragm is suppressed, and the wafer surface can be prevented from being excessively polished at an outer peripheral edge.