Ion beam system and machining method
    2.
    发明授权
    Ion beam system and machining method 有权
    离子束系统和加工方法

    公开(公告)号:US07952083B2

    公开(公告)日:2011-05-31

    申请号:US12020150

    申请日:2008-01-25

    IPC分类号: G21K5/08

    摘要: An ion beam system includes a sample stage which holds a sample, an ion source which generates an ion beam so that the ion beam is extracted from the ion source along an extraction axis, an irradiation optical system having an irradiation axis along which the ion beam is irradiated toward the sample held on the sample stage, and a charged particle beam observation system for observing a surface of the sample which is machined by the irradiated ion beam. The extraction axis along which the ion beam is extracted from the ion source and the irradiation axis along which the sample is irradiated are inclined with respect to one another.

    摘要翻译: 离子束系统包括保持样品的样品台,产生离子束的离子源,使得离子束沿着提取轴从离子源提取;照射光学系统,具有照射轴,沿着该离子束的离子束 照射到保持在样品台上的样品,以及带电粒子束观察系统,用于观察被照射的离子束加工的样品的表面。 离子束从离子源提取的提取轴和样品照射的照射轴相对于彼此倾斜。

    Ion beam system and machining method
    3.
    发明授权
    Ion beam system and machining method 有权
    离子束系统和加工方法

    公开(公告)号:US07326942B2

    公开(公告)日:2008-02-05

    申请号:US11210732

    申请日:2005-08-25

    摘要: There is a machining method which shortens a cross-section forming time by an ion beam, a machining method which shortens a machining time for separating a micro sample from a wafer, and an ion beam machining system. The ion beam machining system has a vacuum container containing a duoplasmatron, non-axially symmetric ion beam lens and stencil mask, wherein a micro sample is removed from a sample by an argon ion beam having a steep beam profile in a direction perpendicular to the cross-section. The cross-section observations for wafer inspection/defect analysis used in device manufacture can be obtained in a short time. Further, there is a inspection/analysis method which does not cause defects even if a sample is removed and a wafer is returned to the process.

    摘要翻译: 存在通过离子束缩短截面形成时间的加工方法,缩短用于从晶片分离微型样品的加工时间的加工方法以及离子束加工系统。 离子束加工系统具有含有双质子,非轴对称的离子束透镜和模板掩模的真空容器,其中通过具有垂直于十字的方向的陡峭波束轮廓的氩离子束从样品中除去微量样品 -部分。 用于器件制造的晶圆检查/缺陷分析的横截面观察可以在短时间内获得。 此外,存在即使去除样品并且晶片返回到该过程也不会引起缺陷的检查/分析方法。

    Ion beam system and machining method
    4.
    发明申请
    Ion beam system and machining method 有权
    离子束系统和加工方法

    公开(公告)号:US20060065854A1

    公开(公告)日:2006-03-30

    申请号:US11210732

    申请日:2005-08-25

    IPC分类号: H01J37/08

    摘要: There is a machining method which shortens a cross-section forming time by an ion beam, a machining method which shortens a machining time for separating a micro sample from a wafer, and an ion beam machining system. The ion beam machining system has a vacuum container containing a duoplasmatron, non-axially symmetric ion beam lens and stencil mask, wherein a micro sample is removed from a sample by an argon ion beam having a steep beam profile in a direction perpendicular to the cross-section. The cross-section observations for wafer inspection/defect analysis used in device manufacture can be obtained in a short time. Further, there is a inspection/analysis method which does not cause defects even if a sample is removed and a wafer is returned to the process.

    摘要翻译: 存在通过离子束缩短截面形成时间的加工方法,缩短用于从晶片分离微型样品的加工时间的加工方法以及离子束加工系统。 离子束加工系统具有含有双质子,非轴对称的离子束透镜和模板掩模的真空容器,其中通过具有垂直于十字的方向的陡峭波束轮廓的氩离子束从样品中除去微量样品 -部分。 用于器件制造的晶圆检查/缺陷分析的横截面观察可以在短时间内获得。 此外,存在即使去除样品并且晶片返回到该过程也不会引起缺陷的检查/分析方法。

    Negative electrode for lithium secondary battery, and lithium secondary battery including the same
    6.
    发明授权
    Negative electrode for lithium secondary battery, and lithium secondary battery including the same 失效
    锂二次电池用负极和包含锂二次电池的锂二次电池

    公开(公告)号:US08399129B2

    公开(公告)日:2013-03-19

    申请号:US12297836

    申请日:2007-10-02

    IPC分类号: H01M4/02 H01M4/36

    摘要: A negative electrode for a lithium secondary battery of the present invention includes a current collector and a negative electrode active material layer carried on the current collector. The negative electrode active material layer includes a plurality of columnar particles. The current collector has a surface including a depression and a plurality of projected regions defined by the depression. The projected regions carry the columnar particles. Further, the present invention relates to a lithium secondary battery using the foregoing negative electrode. According to the present invention, it is possible to provide a high-capacity negative electrode excellent mainly in cycle characteristics for a lithium secondary battery, and a lithium secondary battery including the same.

    摘要翻译: 本发明的锂二次电池用负极包括在集电体上承载的集电体和负极活性物质层。 负极活性物质层包含多个柱状粒子。 集电器具有包括凹陷的表面和由凹陷限定的多个投影区域。 投影区域带有柱状颗粒。 此外,本发明涉及使用上述负极的锂二次电池。 根据本发明,可以提供主要在锂二次电池的循环特性和包括该锂二次电池的锂二次电池中优异的高容量负极。

    NONAQUEOUS SOLVENT FOR ELECTRICAL STORAGE DEVICE
    9.
    发明申请
    NONAQUEOUS SOLVENT FOR ELECTRICAL STORAGE DEVICE 审中-公开
    电气存储器件非溶剂型溶剂

    公开(公告)号:US20120130135A1

    公开(公告)日:2012-05-24

    申请号:US13296706

    申请日:2011-11-15

    IPC分类号: C07C22/00

    摘要: Provided is a nonaqueous solvent for an electrical storage device, including a fluorine-containing, cyclic, saturated hydrocarbon represented by the following general formula (1) and having a structure obtained by introducing one or two substituents R into a cyclopentane ring: in the general formula (1), R is represented by CnX2n+1, n represents an integer of 1 or more, at least one of the 2n+1 X's represents F, and the other X's each represent H.

    摘要翻译: 本发明提供一种蓄电装置的非水溶剂,其包含由以下通式(1)表示的含氟环状饱和烃,并具有通过将一个或两个取代基R引入环戊烷环而获得的结构:在一般情况下 式(1)中,R由CnX2n + 1表示,n表示1以上的整数,2n + 1 X中的至少一个表示F,另一个X表示H.

    Method and apparatus for pattern inspection
    10.
    发明授权
    Method and apparatus for pattern inspection 有权
    图案检查方法和装置

    公开(公告)号:US07566871B2

    公开(公告)日:2009-07-28

    申请号:US11698025

    申请日:2007-01-26

    摘要: Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image forming principles of the apparatus are different from those of conventional SEM type inspection apparatuses. In order to solve the above conventional problem, the present invention has made it possible for the user to examine such conditions as inspection speed, inspection sensitivity, etc. intuitively by displaying the relationship among the values of inspection speed S, inspection object digital signal image pixel size D, inspection object image size L, and image signal acquisition cycle P with use of a time delay integration method as a graph on an operation screen. The user can thus determine a set of values of a pixel size, an inspection image width, and a TDI sensor operation cycle easily with reference to the displayed graph.

    摘要翻译: 由于用于获得具有镜电子的检查对象图像的镜像电子成像型检查装置难以优化检查条件,因为该装置的图像形成原理与常规SEM型检查装置的图像形成原理不同。 为了解决上述常规问题,本发明使得用户可以通过显示检查速度S,检查对象数字信号图像的值之间的关系来直观地检查诸如检查速度,检查灵敏度等条件 像素尺寸D,检查对象图像尺寸L和图像信号采集周期P,使用时间延迟积分方法作为操作画面上的图形。 因此,用户可以参照所显示的图形容易地确定像素尺寸,检查图像宽度和TDI传感器操作循环的一组值。