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公开(公告)号：US08263943B2
公开(公告)日：2012-09-11
申请号：US13144620
申请日：2010-01-08
CPC分类号： H01J37/08 , H01J27/26 , H01J37/15 , H01J2237/0216 , H01J2237/0807 , H01J2237/28
摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.
摘要翻译： 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。
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公开(公告)号：US08563944B2
公开(公告)日：2013-10-22
申请号：US13595588
申请日：2012-08-27
CPC分类号： H01J37/08 , H01J27/26 , H01J37/15 , H01J2237/0216 , H01J2237/0807 , H01J2237/28
摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.
摘要翻译： 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。
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公开(公告)号：US20110266465A1
公开(公告)日：2011-11-03
申请号：US13144620
申请日：2010-01-08
IPC分类号： G01N23/00
CPC分类号： H01J37/08 , H01J27/26 , H01J37/15 , H01J2237/0216 , H01J2237/0807 , H01J2237/28
摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.
摘要翻译： 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。
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公开(公告)号：US20110147609A1
公开(公告)日：2011-06-23
申请号：US12995700
申请日：2009-03-30
IPC分类号： H01J3/04
CPC分类号： H01J27/26 , H01J27/022 , H01J37/023 , H01J37/067 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/061 , H01J2237/0807 , H01J2237/2803
摘要： An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
摘要翻译： 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。
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公开(公告)号：US08779380B2
公开(公告)日：2014-07-15
申请号：US12995700
申请日：2009-03-30
IPC分类号： H01J27/00
CPC分类号： H01J27/26 , H01J27/022 , H01J37/023 , H01J37/067 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/061 , H01J2237/0807 , H01J2237/2803
摘要： An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
摘要翻译： 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。
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6.发明授权Gas field ion source and method for using same, ion beam device, and emitter tip and method for manufacturing same 有权气体离子源及其使用方法，离子束装置和发射极尖端及其制造方法公开(公告)号：US08847173B2
公开(公告)日：2014-09-30
申请号：US13811392
申请日：2011-07-13
申请人： Yoshimi Kawanami , Shinichi Matsubara , Hironori Moritani , Noriaki Arai , Hiroyasu Shichi , Tomihiro Hashizume , Hiroyasu Kaga , Norihide Saho , Hiroyuki Muto , Yoichi Ose
发明人： Yoshimi Kawanami , Shinichi Matsubara , Hironori Moritani , Noriaki Arai , Hiroyasu Shichi , Tomihiro Hashizume , Hiroyasu Kaga , Norihide Saho , Hiroyuki Muto , Yoichi Ose
CPC分类号： H01J37/261 , B23K9/00 , H01J1/3044 , H01J37/08 , H01J37/26 , H01J2237/0807
摘要： To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
摘要翻译： 为了提供具有高角电流密度的气体场离子源，气体离子源被配置为使得至少构成气体离子源的发射极尖端的基体是单晶金属，使得 发射极尖端形成为在顶部具有单个原子的锥体形状或锥形形状，并且使得通过单个原子将氦气离子化的情况下的提取电压设定为10kV以上。
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7.发明申请GAS FIELD ION SOURCE AND METHOD FOR USING SAME, ION BEAM DEVICE, AND EMITTER TIP AND METHOD FOR MANUFACTURING SAME 有权气体场离子源及其使用方法，离子束装置和发射体提示及其制造方法公开(公告)号：US20130119252A1
公开(公告)日：2013-05-16
申请号：US13811392
申请日：2011-07-13
申请人： Yoshimi Kawanami , Shinichi Matsubara , Hironori Moritani , Noriaki Arai , Hiroyasu Shichi , Tomihiro Hashizume , Hiroyasu Kaga , Norihide Saho , Hiroyuki Muto , Yoichi Ose
发明人： Yoshimi Kawanami , Shinichi Matsubara , Hironori Moritani , Noriaki Arai , Hiroyasu Shichi , Tomihiro Hashizume , Hiroyasu Kaga , Norihide Saho , Hiroyuki Muto , Yoichi Ose
CPC分类号： H01J37/261 , B23K9/00 , H01J1/3044 , H01J37/08 , H01J37/26 , H01J2237/0807
摘要： To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
摘要翻译： 为了提供具有高角电流密度的气体场离子源，气体离子源被配置为使得至少构成气体离子源的发射极尖端的基体是单晶金属，使得 发射极尖端形成为在顶部具有单个原子的锥体形状或锥形形状，并且使得通过单个原子将氦气离子化的情况下的提取电压设定为10kV以上。
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公开(公告)号：US20120217391A1
公开(公告)日：2012-08-30
申请号：US13508040
申请日：2010-11-01
申请人： Hiroyasu Shichi , Shinichi Matsubara , Noriaki Arai , Tohru Ishitani , Yoichi Ose , Yoshimi Kawanami
发明人： Hiroyasu Shichi , Shinichi Matsubara , Noriaki Arai , Tohru Ishitani , Yoichi Ose , Yoshimi Kawanami
IPC分类号： H01J37/28
CPC分类号： H01J37/08 , H01J27/26 , H01J37/09 , H01J37/28 , H01J2237/062 , H01J2237/0807
摘要： The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a first deflector (35) which scans or aligns the ion beam that has passed through the first aperture; a second deflector (7) which deflects the ion beam that has passed through the first aperture; a second aperture (36) which limits the ion beam that has passed through the first aperture; an objective lens (8) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.
摘要翻译： 带电粒子束显微镜由气体离子源（1）构成; 聚焦透镜（5），其加速并聚焦已经从离子源放出的离子; 限制已经通过聚焦透镜的离子束的可移动的第一孔（6）; 第一偏转器（35），其扫描或对准已经穿过第一孔的离子束; 第二偏转器（7），其使已经穿过第一孔的离子束偏转; 限制已经通过第一孔的离子束的第二孔（36）; 物镜（8），其在样品上聚焦已经穿过第一孔的离子束; 以及用于测量与已经通过第二孔的离子束的电流基本成比例的信号的装置。
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公开(公告)号：US08455841B2
公开(公告)日：2013-06-04
申请号：US13381623
申请日：2010-06-04
申请人： Norihide Saho , Hiroyuki Tanaka , Noriaki Arai , Hiroyasu Shichi , Yoichi Ose
发明人： Norihide Saho , Hiroyuki Tanaka , Noriaki Arai , Hiroyasu Shichi , Yoichi Ose
IPC分类号： H01J37/26
CPC分类号： H01J37/08 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/061 , H01J2237/0807
摘要： Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth. The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.
摘要翻译： 提供大电流和高度稳定的气田电离离子源，以及具有大焦深的高分辨率离子显微镜。 本发明涉及一种具有气田电离离子源的离子显微镜，其中设置有用于冷却与离子显微镜主体无关的气田电离离子源的制冷机，以及用于循环的制冷剂循环回路冷却机构 气体离子源和冰箱之间的制冷剂。 因此，可以减小传播到气田电离离子源的冰箱的机械振动，并且实现离子源的亮度的提高和离子束聚焦性能的提高。
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公开(公告)号：US20120097863A1
公开(公告)日：2012-04-26
申请号：US13381623
申请日：2010-06-04
申请人： Norihide Saho , Hiroyuki Tanaka , Noriaki Arai , Hiroyasu Shichi , Yoichi Ose
发明人： Norihide Saho , Hiroyuki Tanaka , Noriaki Arai , Hiroyasu Shichi , Yoichi Ose
CPC分类号： H01J37/08 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/061 , H01J2237/0807
摘要： Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth.The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.
摘要翻译： 提供大电流和高度稳定的气田电离离子源，以及具有大焦深的高分辨率离子显微镜。 本发明涉及一种具有气田电离离子源的离子显微镜，其中设置有用于冷却与离子显微镜主体无关的气田电离离子源的制冷机，以及用于循环的制冷剂循环回路冷却机构 气体离子源和冰箱之间的制冷剂。 因此，可以减小传播到气田电离离子源的冰箱的机械振动，并且实现离子源的亮度的提高和离子束聚焦性能的提高。
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