利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

39 条记录 (耗时 0.044 秒)

    CHARGED PARTICLE MICROSCOPE
    3.
    发明申请
    CHARGED PARTICLE MICROSCOPE 审中-公开
    充电颗粒显微镜

    公开(公告)号：US20120217391A1

    公开(公告)日：2012-08-30

    申请号：US13508040

    申请日：2010-11-01

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Noriaki Arai ,  Tohru Ishitani ,  Yoichi Ose ,  Yoshimi Kawanami

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Noriaki Arai ,  Tohru Ishitani ,  Yoichi Ose ,  Yoshimi Kawanami

    IPC分类号： H01J37/28

    CPC分类号： H01J37/08 ,  H01J27/26 ,  H01J37/09 ,  H01J37/28 ,  H01J2237/062 ,  H01J2237/0807

    摘要： The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a first deflector (35) which scans or aligns the ion beam that has passed through the first aperture; a second deflector (7) which deflects the ion beam that has passed through the first aperture; a second aperture (36) which limits the ion beam that has passed through the first aperture; an objective lens (8) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.

    摘要翻译： 带电粒子束显微镜由气体离子源（1）构成; 聚焦透镜（5），其加速并聚焦已经从离子源放出的离子; 限制已经通过聚焦透镜的离子束的可移动的第一孔（6）; 第一偏转器（35），其扫描或对准已经穿过第一孔的离子束; 第二偏转器（7），其使已经穿过第一孔的离子束偏转; 限制已经通过第一孔的离子束的第二孔（36）; 物镜（8），其在样品上聚焦已经穿过第一孔的离子束; 以及用于测量与已经通过第二孔的离子束的电流基本成比例的信号的装置。

    Ion beam device
    5.
    发明授权
    Ion beam device 有权
    离子束装置

    公开(公告)号：US08779380B2

    公开(公告)日：2014-07-15

    申请号：US12995700

    申请日：2009-03-30

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

    IPC分类号： H01J27/00

    CPC分类号： H01J27/26 ,  H01J27/022 ,  H01J37/023 ,  H01J37/067 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/2803

    摘要： An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

    摘要翻译： 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离​​子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

    Ion beam device
    6.
    发明授权
    Ion beam device 有权
    离子束装置

    公开(公告)号：US08263943B2

    公开(公告)日：2012-09-11

    申请号：US13144620

    申请日：2010-01-08

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

    IPC分类号： H01J49/10 ,  H01J37/28

    CPC分类号： H01J37/08 ,  H01J27/26 ,  H01J37/15 ,  H01J2237/0216 ,  H01J2237/0807 ,  H01J2237/28

    摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

    摘要翻译： 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。

    ION BEAM DEVICE
    7.
    发明申请
    ION BEAM DEVICE 有权
    离子束装置

    公开(公告)号：US20110147609A1

    公开(公告)日：2011-06-23

    申请号：US12995700

    申请日：2009-03-30

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

    IPC分类号： H01J3/04

    CPC分类号： H01J27/26 ,  H01J27/022 ,  H01J37/023 ,  H01J37/067 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/2803

    摘要： An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

    摘要翻译： 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离​​子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

    Charged Particle Microscope and Ion Microscope
    8.
    发明申请
    Charged Particle Microscope and Ion Microscope 审中-公开
    带电粒子显微镜和离子显微镜

    公开(公告)号：US20130126731A1

    公开(公告)日：2013-05-23

    申请号：US13521588

    申请日：2011-02-04

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Yoichi Ose ,  Yoshimi Kawanami

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Yoichi Ose ,  Yoshimi Kawanami

    IPC分类号： H01J37/26

    CPC分类号： H01J37/261 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/0807

    摘要： In order to provide a safe and environmentally-friendly charged gas particle microscope that exhibits a superior ionized gas-utilization efficiency and economic efficiency, the gas field ion source of a charged particle microscope is equipped with a vacuum chamber in which are provided a vacuum chamber evacuation mechanism, an acicular emitter tip, an extraction electrode disposed facing the emitter tip, and a mechanism for supplying a gas to the vicinity of the emitter tip, and is configured so that the gas in the region around the tip of acicular ion emitter is ionized and extracted as an ion beam. Therein, the evacuation mechanism and the gas supply mechanism are connected, and a material for adhering the gas to be ionized is disposed between the evacuation mechanism and the gas supply mechanism.

    摘要翻译： 为了提供一种表现出优异的电离气体利用效率和经济效率的安全环保的带电气体微粒显微镜，带电微粒显微镜的气体离子源装备有真空室，真空室 抽吸机构，针状发射极尖端，面向发射极尖端的引出电极和用于向发射极尖端附近提供气体的机构，并且被构造成使得针状离子发射体的尖端周围的区域中的气体为 电离并提取为离子束。 其中，排气机构和气体供给机构连接，并且用于将待离子化的气体粘附的材料设置在排气机构和气体供给机构之间。

    Ion beam device
    9.
    发明授权
    Ion beam device 有权
    离子束装置

    公开(公告)号：US08563944B2

    公开(公告)日：2013-10-22

    申请号：US13595588

    申请日：2012-08-27

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

    IPC分类号： H01J49/10 ,  H01J37/28

    CPC分类号： H01J37/08 ,  H01J27/26 ,  H01J37/15 ,  H01J2237/0216 ,  H01J2237/0807 ,  H01J2237/28

    摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

    摘要翻译： 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。

    ION BEAM DEVICE
    10.
    发明申请
    ION BEAM DEVICE 有权
    离子束装置

    公开(公告)号：US20110266465A1

    公开(公告)日：2011-11-03

    申请号：US13144620

    申请日：2010-01-08

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Noriaki Arai ,  Tohru Ishitani

    IPC分类号： G01N23/00

    CPC分类号： H01J37/08 ,  H01J27/26 ,  H01J37/15 ,  H01J2237/0216 ,  H01J2237/0807 ,  H01J2237/28

    摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

    摘要翻译： 提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。 气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。 发射极基座和真空容器彼此磁性相互作用。