公开(公告)号：US06810687B2

公开(公告)日：2004-11-02

申请号：US10076034

申请日：2002-02-13

申请人： Hiroyuki Nishimura ,  Toru Yokota ,  Akira Fujinoki

发明人： Hiroyuki Nishimura ,  Toru Yokota ,  Akira Fujinoki

IPC分类号： C03C2100

CPC分类号： G03F7/70958 ,  C03B19/1453 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

摘要： In the light of the disadvantages of the prior art technology, an object of the present invention is to provide a method for producing a synthetic quartz glass member for excimer lasers, which comprises, while suppressing the generation of reductive defects which impairs the resistance against laser radiations, incorporating a sufficient amount of hydrogen molecules capable of achieving a high resistance against laser radiation into the quartz glass, yet uniformly incorporating the hydrogen molecules to realize a flat distribution in refractive indices attributed to the distribution in the density of hydrogen molecules. It is also an object of the present invention to provide a synthetic quartz glass member for excimer lasers obtained by the production method above, which yields high resistance against laser radiations and homogeneity. The above problems have been overcome by a method for producing a synthetic quartz glass member for excimer lasers, which, in a method for producing a synthetic quartz glass member for excimer laser optics comprising a step of incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body at a temperature of 600° C. or lower under an atmosphere in a pressure range of 1 atm or higher but lower than 150 atm and containing hydrogen, said method comprises varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of the heat treatment.

摘要翻译： 鉴于现有技术的缺点，本发明的一个目的是提供一种制造用于准分子激光器的合成石英玻璃构件的方法，该方法包括在抑制减少激光器抗性的还原性缺陷的产生的同时， 将足够量的能够实现激光辐射的高分子氢分子掺入到石英玻璃中，同时均匀地掺入氢分子以实现归因于氢分子密度分布的折射率的平坦分布。 本发明的另一个目的是提供一种通过上述制造方法获得的用于准分子激光器的合成石英玻璃构件，其产生高的抗激光辐射和均匀性。 上述问题已经通过用于制造用于准分子激光器的合成石英玻璃构件的方法得到克服，该方法在用于准分子激光光学器件的合成石英玻璃构件的制造方法中包括通过以下步骤将氢分子掺入合成石英玻璃体中： 在1atm以上但低于150atm的压力范围的气氛中在600℃以下的温度下对合成石英玻璃体进行热处理，并含有氢，所述方法包括改变含氢气体的压力 在热处理的至少一部分中连续地或逐步地。

公开(公告)号：US06689705B2

公开(公告)日：2004-02-10

申请号：US10048309

申请日：2002-01-29

申请人： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toru Yokota ,  Yasuyuki Yaginuma ,  Akira Sato ,  Tetsuji Ueda

发明人： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toru Yokota ,  Yasuyuki Yaginuma ,  Akira Sato ,  Tetsuji Ueda

IPC分类号： C03C306

CPC分类号： C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

摘要： An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5×1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2×10−5 or lower.

摘要翻译： 本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性 对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。 上述问题由OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 16分子/ cm 2的F2准分子激光的合成石英玻璃光学材料解决， 3>以下，最大和最小氟浓度在20mol ppm内的差异，以及最大和最小折射率之间的差异为2×10 -5或更低。

公开(公告)号：US06508084B1

公开(公告)日：2003-01-21

申请号：US09527655

申请日：2000-03-17

申请人： Toru Yokota ,  Hiroyuki Nishimura ,  Akira Fujinoki

发明人： Toru Yokota ,  Hiroyuki Nishimura ,  Akira Fujinoki

IPC分类号： C03B37018

CPC分类号： C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S65/90

摘要： A method for producing an optical quartz glass for use in excimer lasers, comprising a step of forming a porous silica preform by depositing silica in a soot-like form formed by flame hydrolysis of a high-purity volatile silicon compound, followed by a step of vitrifying said porous silica preform into transparent glass in an atmosphere containing water vapor and hydrogen, and a vertical type heating furnace for carrying out the production method therein.

摘要翻译： 一种用于准分子激光器的光学石英玻璃的制造方法，其特征在于，包括以高纯度挥发性硅化合物的火焰水解形成的烟灰状沉积二氧化硅，形成多孔二氧化硅预成型体的工序， 在含有水蒸气和氢气的气氛中将所述多孔二氧化硅预制件玻璃化成透明玻璃，以及在其中进行制造方法的立式加热炉。

公开(公告)号：US07312170B2

公开(公告)日：2007-12-25

申请号：US10548237

申请日：2004-03-03

申请人： Hiroyuki Nishimura ,  Akira Fujinoki

发明人： Hiroyuki Nishimura ,  Akira Fujinoki

IPC分类号： C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC分类号： C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

摘要翻译： 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US07007510B2

公开(公告)日：2006-03-07

申请号：US10731186

申请日：2003-12-09

申请人： Tetsuji Ueda ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Martin Trommer ,  Stefan Ochs

发明人： Tetsuji Ueda ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Martin Trommer ,  Stefan Ochs

IPC分类号： C03C23/00

CPC分类号： C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  Y10T428/131 ,  Y10T428/24612

摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.

摘要翻译： 本发明的目的是提供一种改进的坯料，使得可以获得高均匀性的光学构件，并提供用于热处理高度均匀的合成石英坯的容器和热处理方法。 在本发明的第一方面，提供了一种特殊设计的坯件，其显示出凹形外表面。 在本发明的第二方面，提供了一种用于热处理坯料的特殊设计容器，由此将中心处的发热度设定为高于周围环境的热量。

公开(公告)号：US06499315B1

公开(公告)日：2002-12-31

申请号：US09671202

申请日：2000-09-28

申请人： Hiroyuki Nishimura ,  Akira Fujinoki ,  Hisatoshi Otsuka

发明人： Hiroyuki Nishimura ,  Akira Fujinoki ,  Hisatoshi Otsuka

IPC分类号： C03B2000

CPC分类号： C03B19/1415 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/02 ,  C03C2201/21 ,  C03C2203/40 ,  Y02P40/57

摘要： The present invention relates to a synthetic quartz glass, which is a material for producing an optical member having an excellent excimer laser resistance, and a production method thereof with a good productivity. That is, the synthetic quartz glass produced by vitrifying glass fine particles obtained by flame hydrolysis of an organodisilazane compound directly on a substrate having a birefringence index of 5 nm/cm or less, a refractive index difference (&Dgr;n) of 2×10−6/cm or less, and an ArF saturated absorbance of 0.05/cm or less at a pulse energy density of 100 mJ/cm2/pulse. The production method thereof comprises the steps of introducing an organodisilazane compound represented by a general formula 1: (R1), SiNHSi(R2)3  (1) wherein R1 and R2 represent the same or a different alkyl group having 1 to 3 carbon atoms, into a flame comprising a combustion gas and a combustion-supporting gas to generate silica fine particles, and accumulating the silica fine particles on a rotating heat resistant substrate to be a molten glass.

摘要翻译： 本发明涉及一种合成石英玻璃，其是用于制造具有优异的受激准分子激光电阻的光学部件的材料及其生产率高的生产方法。 也就是说，通过玻璃化玻璃微粒制造的合成石英玻璃，其通过有机二硅氮烷化合物直接在双折射率为5nm / cm以下的折射率（DELTAn）为2×10 -6 / cm 或更小，在脉冲能量密度为100mJ / cm 2 /脉冲下的ArF饱和吸光度为0.05 / cm以下。 其制造方法包括将由通式1表示的有机二硅氮烷化合物引入包含燃烧气体和燃烧支持的火焰的步骤中，其中R1和R2表示相同或不同的具有1至3个碳原子的烷基 气体产生二氧化硅微粒，并将二氧化硅微粒聚集在旋转的耐热基材上成为熔融玻璃。

公开(公告)号：US08635886B2

公开(公告)日：2014-01-28

申请号：US13558698

申请日：2012-07-26

申请人： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

发明人： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

IPC分类号： C03B37/00 ,  C03B20/00

CPC分类号： C03B19/1438 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/40 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/085 ,  C03C4/12 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2203/44

摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

摘要翻译： 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

公开(公告)号：US20060183622A1

公开(公告)日：2006-08-17

申请号：US10548237

申请日：2004-03-03

申请人： Hiroyuki Nishimura ,  Akira Fujinoki

发明人： Hiroyuki Nishimura ,  Akira Fujinoki

IPC分类号： C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC分类号： C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

摘要翻译： 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US06761951B2

公开(公告)日：2004-07-13

申请号：US10315990

申请日：2002-12-11

申请人： Hisatoshi Otsuka ,  Kazuo Shirota ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Takayuki Shimakawa

发明人： Hisatoshi Otsuka ,  Kazuo Shirota ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Takayuki Shimakawa

IPC分类号： B32B300

CPC分类号： C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57 ,  Y10T428/21 ,  Y10T428/2913

摘要： A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1×10−6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.

摘要翻译： 通过沿着生长方向均匀化具有周期条纹的合成石英玻璃锭获得的具有特定尺寸的圆柱形，无氯合成石英玻璃坯料具有（a）在工作和离轴方向上的条纹等级，其满足美国A级 军事规格MIL-G-174B，（b）工作和离轴方向的平均羟基浓度分别为700〜1,000ppm，（c）工作和离轴方向的平均假想温度为850〜950℃ ，和（d）工作方向上最多为1×10 -6的633nm波长的光的折射率分布。 该空白对激光具有良好的透射率，当用激光照射时几乎不发生劣化，并且特别适用于ArF准分子激光相关应用。

公开(公告)号：US6031238A

公开(公告)日：2000-02-29

申请号：US29451

申请日：1998-02-26

申请人： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toshiki Mori

发明人： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toshiki Mori

IPC分类号： G02B13/14 ,  G03F7/20

CPC分类号： G03F7/701 ,  G02B13/14 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70958

摘要： A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.

摘要翻译： PCT No.PCT / EP97 / 03406 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月30日PCT公布。 出版物WO98 / 00761 日本1998年1月8日在集成电路制造中，集成电路图案投影在晶片上的已知投影对准器包括ArF准分子激光器和由合成石英玻璃制成的石英玻璃光学部件组成的光学系统。 为了提供一种投影对准器，其具有在长时间不劣化的光学性能，例如耐久性，光透射率等，并且光学系统可以以低成本整体构造，因此建议光学 系统包括其氢分子浓度在1×10 17和5×10 18分子/ cm 3之间的第一石英玻璃光学构件组和氢分子浓度在5×1018至5×1019分/ cm 3之间的第三石英玻璃光学构件组。