摘要:
A surface charge measuring distribution method includes the steps of irradiating a sample with a charged particle beam and charging a sample surface in a spot-like manner, irradiating the charged sample with the charged particle beam to measure a potential at a potential saddle point formed above the sample, selecting one of preset multiple structure models and a tentative space charge distribution associated with the selected structure model, calculating a space potential at the potential saddle point by electromagnetic field analysis using the selected structure model and tentative space charge distribution, comparing the calculated space potential and measured value to determine the tentative space charge distribution as a space charge distribution of the sample when an error between the space potential and the measured value is within a predetermined range, and calculating a surface charge distribution of the sample by electromagnetic field analysis based on the determined space charge distribution.
摘要:
A surface charge measuring distribution method includes the steps of irradiating a sample with a charged particle beam and charging a sample surface in a spot-like manner, irradiating the charged sample with the charged particle beam to measure a potential at a potential saddle point formed above the sample, selecting one of preset multiple structure models and a tentative space charge distribution associated with the selected structure model, calculating a space potential at the potential saddle point by electromagnetic field analysis using the selected structure model and tentative space charge distribution, comparing the calculated space potential and measured value to determine the tentative space charge distribution as a space charge distribution of the sample when an error between the space potential and the measured value is within a predetermined range, and calculating a surface charge distribution of the sample by electromagnetic field analysis based on the determined space charge distribution.
摘要:
An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.
摘要:
An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.
摘要:
A wafer inspection apparatus includes a first and second wafer transfer mechanisms, an alignment chamber, a second wafer transfer mechanism and a plurality of inspection chambers. The first wafer transfer mechanism is installed at a first transfer area to transfer wafers individually from a housing. The alignment chamber has an alignment mechanism configured to align the wafer at an inspection position for an electrical characteristics inspection. The second wafer transfer mechanism is configured to transfer the wafer through a wafer retaining support in a second transfer area formed along the first transfer area and an alignment area. The plurality of inspection chambers is arranged at an inspection area formed along the second transfer area and is configured to inspect electrical characteristics of the wafer transferred by the second wafer transfer mechanism through the wafer retaining support.
摘要:
Disclosed is an apparatus for driving a placing table that contributes to saving a space and reducing the weight of an inspecting apparatus. The apparatus for driving a placing table according to an exemplary embodiment of the present disclosure includes a horizontal driving mechanism that horizontally moves a placing table in an inspecting chamber, a base that supports horizontal driving mechanism, a placing table lifting mechanism (for example, air bearing) that lifts placing table from support, using compressed air in inspecting chamber, a connecting mechanism that connects horizontal driving mechanism with placing table, and a case that accommodates the horizontal driving mechanism and the base.
摘要:
A mounting device provided on a horizontally movable stage mechanism, includes a mounting table for mounting thereon a target object, a cylindrical elevation body, having a diameter smaller than a diameter of the mounting table, for supporting the mounting table, a plurality of elevation guide rails provided on an outer peripheral surface of the elevation body so as to be spaced from each other at substantially regular intervals in a circumferential direction, and a plurality of support members each having a vertical plate to which engaging bodies engaged with the elevation guide rails are fixed. Further, a plurality of reinforcing parts are vertically provided on the outer peripheral surface of the elevation body so as to be spaced from each other at substantially regular intervals in the circumferential direction.
摘要:
A burner replacing system has a rail mounted in a ring around the outer periphery of burners mounted radially at the middle of a gas turbine. A carriage turns around the burners via the rail; and supports a pull-out slide via a rotary shaft which turns the slide up and down in the direction of a center axis of the gas turbine. Another rotary shaft turns the slide right and left around a radial axis of the gas turbine. The slide moves in the axial direction of the burners. A hand for gripping the burner is supported by the pull-out slide via a centering slide which moves up and down in the radial direction of the burner. An alternate system has a pull-out slide which is supported by the carriage and moves forward and backward in the axial direction of the burner. A telescopic slide is supported by the pull-out slide and expands in the axial direction of the burner. The hand is provided at the edge of the telescopic slide to grip the burner.
摘要:
A probe apparatus includes a first stage, a second stage, a third stage and an image pickup. A Z position measuring unit measures a Z direction position of the mounting table and has a Z scale extending in the Z direction and a reading unit for reading the Z scale. A computation unit obtains a calculated contact position between the probes and the electrode pads of the substrate to be inspected based on images picked up by the image pickup with respect to a coordinate position on coordinates of a driving system which includes a Z direction position and X and Y direction positions measured by a measuring unit for measuring X and Y direction positions of the mounting table. A correcting unit corrects the Z direction position of the contact position based on the change amount thereof for a next contact operation.
摘要:
A mounting device includes a vertically movable mounting table for mounting thereon a target object and a rotational driving mechanism for rotating the mounting table within a predetermined angle. The mounting table is vertically raised and rotated by the rotational driving mechanism. The rotational driving mechanism includes a driving shaft extending in a tangential direction of the mounting table and a moving body moving in the tangential direction via the driving shaft. A first cam follower is attached in perpendicular to the moving body and a second cam follower is extending horizontally from an outer circumferential surface of the mounting table so as to be in contact with the first cam follower. Also, a resilient member connecting the mounting table and the moving body brings the first cam follower and the second cam follower into elastic contact with each other.