公开(公告)号：US07622205B2

公开(公告)日：2009-11-24

申请号：US11104274

申请日：2005-04-12

申请人： Hiroyuki Uwazumi ,  Youichi Tei ,  Kengo Kainuma ,  Kazuhito Higuchi ,  Akira Iso ,  Hajime Kurihara

发明人： Hiroyuki Uwazumi ,  Youichi Tei ,  Kengo Kainuma ,  Kazuhito Higuchi ,  Akira Iso ,  Hajime Kurihara

IPC分类号： G11B5/64 ,  G11B5/00 ,  G11B15/70

CPC分类号： G11B5/667 ,  G11B5/7315

摘要： A disk substrate for a perpendicular magnetic recording medium is, disclosed. The substrate exhibits sufficient productivity, serves the function of a soft magnetic backing layer of the perpendicular magnetic recording medium, and scarcely generates noise. A perpendicular magnetic recording medium using such a substrate also is disclosed. The disk substrate comprises at least a soft magnetic underlayer formed on a nonmagnetic base plate by means of an electroless plating method. The thermal expansion coefficient of the soft magnetic underlayer is larger than a thermal expansion coefficient of the nonmagnetic disk-shaped base plate. A saturation magnetostriction constant λs satisfies a relation λs≧−1×10−5.

摘要翻译： 公开了一种用于垂直磁记录介质的盘基片。 基板表现出足够的生产率，起到垂直磁记录介质的软磁背衬层的功能，并且几乎不产生噪声。 还公开了使用这种基板的垂直磁记录介质。 盘状基板通过无电镀法至少包含在非磁性基板上形成的软磁性底层。 软磁性底层的热膨胀系数大于非磁性盘状基板的热膨胀系数。 饱和磁致伸缩常数lambdas满足关系lambdas> = - 1×10-5。

公开(公告)号：US20050238929A1

公开(公告)日：2005-10-27

申请号：US11104274

申请日：2005-04-12

申请人： Hiroyuki Uwazumi ,  Youichi Tei ,  Kengo Kainuma ,  Kazuhito Higuchi ,  Akira Iso ,  Hajime Kurihara

发明人： Hiroyuki Uwazumi ,  Youichi Tei ,  Kengo Kainuma ,  Kazuhito Higuchi ,  Akira Iso ,  Hajime Kurihara

IPC分类号： G11B5/667 ,  C23C18/50 ,  G11B5/64 ,  G11B5/65 ,  G11B5/66 ,  G11B5/72 ,  G11B5/73 ,  G11B5/738

CPC分类号： G11B5/667 ,  G11B5/7315

摘要： A disk substrate for a perpendicular magnetic recording medium is, disclosed. The substrate exhibits sufficient productivity, serves the function of a soft magnetic backing layer of the perpendicular magnetic recording medium, and scarcely generates noise. A perpendicular magnetic recording medium using such a substrate also is disclosed. The disk substrate comprises at least a soft magnetic underlayer formed on a nonmagnetic base plate by means of an electroless plating method. The thermal expansion coefficient of the soft magnetic underlayer is larger than a thermal expansion coefficient of the nonmagnetic disk-shaped base plate. A saturation magnetostriction constant μs satisfies a relation λs≧−1×10−5.

摘要翻译： 公开了一种用于垂直磁记录介质的盘基片。 基板表现出足够的生产率，起到垂直磁记录介质的软磁背衬层的功能，并且几乎不产生噪声。 还公开了使用这种基板的垂直磁记录介质。 盘状基板通过无电镀法至少包含在非磁性基板上形成的软磁性底层。 软磁性底层的热膨胀系数大于非磁性盘状基板的热膨胀系数。 饱和磁致伸缩常数mus满足关系lambdas> = - 1×10 -5。

公开(公告)号：US08039045B2

公开(公告)日：2011-10-18

申请号：US11191170

申请日：2005-07-27

申请人： Youichi Tei ,  Akira Iso ,  Kazuhito Higuchi ,  Hajime Kurihara ,  Hiroyuki Uwazumi

发明人： Youichi Tei ,  Akira Iso ,  Kazuhito Higuchi ,  Hajime Kurihara ,  Hiroyuki Uwazumi

IPC分类号： B05D5/12 ,  B05D3/10 ,  B05D3/02 ,  C23C18/18 ,  C23C18/31 ,  C23C18/32 ,  C23C18/34 ,  C23C18/50

CPC分类号： C03C15/00 ,  C03C17/38 ,  C03C23/0075 ,  C23C18/1694 ,  C23C18/1893 ,  G11B5/8404

摘要： An object of the present invention is to provide a plating method on a glass base plate. The method allows forming a plating film on a base plate composed of a glass material with excellent adhesivity and homogeneity by means of an electroless plating method even to a thickness of 1 μm or more. Before forming a plating film by a step of electroless plating S6, a surface treatment process is conducted on a surface of the base plate composed of a glass material. The surface treatment process comprises at least a step of glass activation treatment S2 to increase quantity of silanol groups on the surface of the base plate at least by a factor of two using an aqueous solution of diluted acid, a step of silane coupling agent treatment S3, a step of palladium catalyst treatment S4, and a step of palladium bonding treatment S5.

摘要翻译： 本发明的目的是提供一种在玻璃基板上的电镀方法。 该方法允许通过化学镀方法在具有优异的粘合性和均匀性的玻璃材料的基板上形成镀膜，甚至至1μm以上的厚度。 在通过化学镀S6的步骤形成镀膜之前，在由玻璃材料构成的基板的表面上进行表面处理。 表面处理方法至少包括玻璃活化处理S2的步骤，以使用稀酸水溶液将基板表面上的硅烷醇基增加至少两倍，硅烷偶联剂处理步骤S3 ，钯催化剂处理步骤S4和钯结合处理步骤S5。

公开(公告)号：US20060024431A1

公开(公告)日：2006-02-02

申请号：US11191170

申请日：2005-07-27

申请人： Youichi Tei ,  Akira Iso ,  Kazuhito Higuchi ,  Hajime Kurihara ,  Hiroyuki Uwazumi

发明人： Youichi Tei ,  Akira Iso ,  Kazuhito Higuchi ,  Hajime Kurihara ,  Hiroyuki Uwazumi

IPC分类号： B05D5/12 ,  B05D3/00

CPC分类号： C03C15/00 ,  C03C17/38 ,  C03C23/0075 ,  C23C18/1694 ,  C23C18/1893 ,  G11B5/8404

摘要： An object of the present invention is to provide a plating method on a glass base plate. The method allows forming a plating film on a base plate composed of a glass material with excellent adhesivity and homogeneity by means of an electroless plating method even to a thickness of 1 μm or more. Before forming a plating film by a step of electroless plating S6, a surface treatment process is conducted on a surface of the base plate composed of a glass material. The surface treatment process comprises at least a step of glass activation treatment S2 to increase quantity of silanol groups on the surface of the base plate at least by a factor of two using an aqueous solution of diluted acid, a step of silane coupling agent treatment S3, a step of palladium catalyst treatment S4, and a step of palladium bonding treatment S5.

摘要翻译： 本发明的目的是提供一种在玻璃基板上的电镀方法。 该方法允许通过化学镀方法在具有优异的粘合性和均匀性的玻璃材料的基板上形成镀膜，甚至厚度为1um或更大。 在通过无电解电镀步骤S 6形成电镀膜之前，在由玻璃材料构成的基板的表面上进行表面处理工艺。 表面处理方法至少包括玻璃活化处理S 2的步骤，以使用稀酸水溶液至少增加2倍的基板表面的硅烷醇基团量，硅烷偶联剂处理步骤 S 3，钯催化剂处理工序S4，钯键合处理工序S 5。

公开(公告)号：US20060210837A1

公开(公告)日：2006-09-21

申请号：US11374669

申请日：2006-03-13

申请人： Hajime Kurihara ,  Youichi Tei ,  Akira Iso

发明人： Hajime Kurihara ,  Youichi Tei ,  Akira Iso

IPC分类号： G11B5/66 ,  G11B5/706

CPC分类号： G11B5/667 ,  C23C18/1651 ,  C23C18/1692 ,  C23C18/1893 ,  C23C18/50 ,  G11B5/7325 ,  G11B5/7379 ,  G11B5/8404

摘要： A method of plating on a glass base plate is disclosed. The method allows a plating film to be formed on a base plate composed of a glass material with excellent adhesivity and homogeneity by means of an electroless plating method, even to a thickness of 1 μm or more. Before forming the plating film by electroless plating, a series of surface treatments are conducted on the surface of the base plate composed of a glass material. The surface treatments comprises at least a glass activation treatment, a silane coupling agent treatment, a palladium catalyst treatment, a palladium bonding treatment, ab electroless plating to form a preliminary plating film having a thickness in the range of 0.02 μm to 0.5 μm, and an annealing at a temperature in the range of 200° C. to 350° C.

摘要翻译： 公开了一种在玻璃底板上镀覆的方法。 该方法允许通过无电镀法在具有优异的粘附性和均匀性的玻璃材料的基板上形成镀膜，甚至厚度为1μm或更大。 在通过无电镀形成电镀膜之前，在由玻璃材料构成的基板的表面上进行一系列表面处理。 表面处理包括至少玻璃活化处理，硅烷偶联剂处理，钯催化剂处理，钯结合处理，无电镀以形成厚度在0.02μm至0.5μm的范围内的预镀膜，以及 在200℃至350℃的温度下进行退火。

公开(公告)号：US20060228493A1

公开(公告)日：2006-10-12

申请号：US11374374

申请日：2006-03-13

申请人： Akira Iso ,  Youichi Tei ,  Hajime Kurihara

发明人： Akira Iso ,  Youichi Tei ,  Hajime Kurihara

IPC分类号： B05D1/18

CPC分类号： C03C23/002 ,  C03C15/00 ,  C03C17/38 ,  C03C2218/115 ,  C03C2218/31 ,  C23C18/1868 ,  C23C18/1893 ,  C23C18/31 ,  C23C18/50 ,  G11B5/8404 ,  G11B5/858

摘要： A plating method on a glass base plate is disclosed. The method allows an electroless plating film to be formed on a base plate composed of a glass material with excellent adhesivity through a process that removes alkaline and alkaline earth metals on the surface of the base plate. Also disclosed is a method of manufacturing a magnetic recording medium employing the method of plating on a glass base plate. Before forming a plating film in a step of electroless plating, a series of surface treatments are conducted on the surface of the base plate composed of a glass material. The series of surface treatments comprises at least an ultraviolet light irradiation, an etching treatment, an adhesion layer formation treatment, a catalyst layer formation treatment, and a catalyst activation treatment.

摘要翻译： 公开了一种玻璃基板上的电镀方法。 该方法允许通过去除基板表面上的碱土金属和碱土金属的方法，在由具有优异粘合性的玻璃材料构成的基板上形成化学镀膜。 还公开了使用在玻璃基板上电镀的方法制造磁记录介质的方法。 在化学镀的工序中形成镀膜之前，在由玻璃材料构成的基板的表面进行一系列的表面处理。 一系列表面处理至少包括紫外光照射，蚀刻处理，粘合层形成处理，催化剂层形成处理和催化剂活化处理。

公开(公告)号：US20080138524A1

公开(公告)日：2008-06-12

申请号：US11763789

申请日：2007-06-15

申请人： Tadaaki Oikawa ,  Hiroyuki Uwazumi ,  Kenichiro Soma ,  Hajime Kurihara

发明人： Tadaaki Oikawa ,  Hiroyuki Uwazumi ,  Kenichiro Soma ,  Hajime Kurihara

IPC分类号： B05D3/04

CPC分类号： G11B5/667 ,  G11B5/8404

摘要： A manufacturing method for a magnetic recording medium is disclosed. By using the method, the anisotropic magnetic field (Hk) of an underlayer is improved, spike noise generated in the soft magnetic underlayer is suppressed, and the signal-to-noise ratio (SNR) is improved without employing a special layer configuration and without the need for complicated and expensive processing. A soft magnetic underlayer is formed by laminating a soft magnetic lower underlayer, a non-magnetic metal layer, and a soft magnetic upper underlayer in succession on a non-magnetic substrate. After forming the non-magnetic metal layer, its surface is exposed to a gas containing between 2 and 100 at % oxygen. A perpendicular magnetic recording layer is formed on the soft magnetic underlayer.

摘要翻译： 公开了一种用于磁记录介质的制造方法。 通过使用该方法，改善了底层的各向异性磁场（Hk），抑制了在软磁性底层中产生的尖峰噪声，并且在不采用特殊层构造的情况下提高了信噪比（SNR），而没有 需要复杂而昂贵的处理。 在非磁性基板上依次层叠软磁性下层，非磁性金属层和软磁性上层，形成软磁性底层。 在形成非磁性金属层之后，其表面暴露于含有2至100at％氧气的气体。 在软磁性底层上形成垂直磁记录层。

公开(公告)号：US07265520B2

公开(公告)日：2007-09-04

申请号：US10343524

申请日：2001-08-10

申请人： Tsukasa Kosuda ,  Norimitsu Baba ,  Hajime Kurihara ,  Motomu Hayakawa

发明人： Tsukasa Kosuda ,  Norimitsu Baba ,  Hajime Kurihara ,  Motomu Hayakawa

IPC分类号： H01M10/46

CPC分类号： H02J7/0073 ,  G01R19/16542 ,  G01R31/3648 ,  G04C10/00 ,  G04G19/08 ,  H02J7/0093

摘要： An electronic watch in which the display on a liquid crystal display 236 is prohibited when the detected output voltage of a secondary battery 220 drops to a first predefined voltage. An initialization process is performed when the detected voltage of the secondary battery 220 drops to a second voltage lower than the first voltage, and the display on the liquid crystal display unit 236 is restarted when the detected voltage of the secondary battery 220 rises to a third voltage not lower than the first voltage after having reached the second voltage.

摘要翻译： 当检测到的二次电池220的输出电压下降到第一预定电压时，电子表被禁止在液晶显示器236上的显示。 当二次电池220的检测电压下降到低于第一电压的第二电压时，执行初始化处理，并且当二次电池220的检测电压上升到第三电平时液晶显示单元236上的显示重新开始 在达到第二电压之后不低于第一电压的电压。

公开(公告)号：US5451986A

公开(公告)日：1995-09-19

申请号：US97576

申请日：1993-07-26

申请人： Teruyuki Mizumoto ,  Hajime Kurihara

发明人： Teruyuki Mizumoto ,  Hajime Kurihara

IPC分类号： B41J31/14

CPC分类号： B82Y15/00 ,  B41J31/14

摘要： A thermal transfer type image formation device employs a new regeneration method for reconditioning ink sheets employed in the thermal inking process. The ink sheet has a transparent base layer, which also serves as a dielectric layer, an ink layer and a transparent conductive layer, functioning also as an electrode, on a side of the base layer opposite the ink layer. A fixing device is provided for the transfer of photoconductive powder ink to bare areas of the ink sheet to be rejuvenated. A bias voltage is impressed on the photoconductive powder ink, and the photoconductive powder ink which comes in contact with bare areas becomes conductive when exposed with light through the transparent conductive layer and ink adheres to the base layer due to an established electrostatic force between the ink and the conductive layer electrode on the light exposing side of the ink sheet. After the powder ink has been selectively supplied to the bare areas, the ink sheet is then regenerated by heating the sheet melting and thereafter hardening the powder ink.

摘要翻译： 热转印型图像形成装置采用新的再生方法来修复在上墨过程中使用的油墨片。 油墨片具有透明基底层，其也用作电介质层，油墨层和透明导电层，在基底层的与油墨层相对的一侧也起着电极的作用。 提供了一种固定装置，用于将光导粉末墨水转移到要恢复的油墨片的裸露区域。 在光电导粉末墨上施加偏置电压，并且当通过透明导电层暴露时，与裸露区域接触的光导电粉末墨水变得导电，并且由于墨水之间建立的静电力，墨水粘附到基底层上 以及在油墨纸的光曝光侧的导电层电极。 在将粉末墨水选择性地供应到裸露区域之后，然后通过加热片材熔化并随后使粉末墨水硬化来再生油墨片材。

公开(公告)号：US06198951B1

公开(公告)日：2001-03-06

申请号：US09297438

申请日：1999-04-30

申请人： Tsukasa Kosuda ,  Yutaka Kondo ,  Hajime Kurihara ,  Norimitsu Baba

发明人： Tsukasa Kosuda ,  Yutaka Kondo ,  Hajime Kurihara ,  Norimitsu Baba

IPC分类号： A61B500

CPC分类号： A61B5/681 ,  A61B5/02416 ,  A61B5/02427 ,  A61B5/02438 ,  A61B5/11 ,  A61B5/6826 ,  A61B5/6838 ,  A61B5/7257 ,  A61B2562/0219

摘要： When emitted light from LED 31 is incident on photodiodes 32 and 33 with luminance Pa and Pb, currents ia and ib are generated according to luminance Pa and Pb. When outside light is incident through the finger tissues on photodiodes 32 and 33 with luminance Pc, current ic is produced. The current i1 (=ia+ic) generated by photodiode 32, and the current i2 (=−ib−ic) generated by photodiode 33, are added at node X, and the current ic corresponding to outside light is thus cancelled. In addition, photodiodes 32 and 33 are disposed at different distances from LED 31. As a result, the current flowing to opamp 34 is current ia corresponding to luminance Pa because luminance Pb is extremely low. The opamp 34 then applies a current voltage conversion to generate pulse wave signal Vm.

摘要翻译： 当来自LED 31的发射光以亮度Pa和Pb入射到光电二极管32和33时，根据亮度Pa和Pb产生电流ia和ib。 当外部光通过具有辉度Pc的光电二极管32和33上的手指组织入射时，产生电流ic。 由光电二极管32产生的电流i1（= ia + ic）和由光电二极管33产生的电流i2（= -ib-ic）在节点X相加，因此与外部光对应的电流ic被取消。 此外，光电二极管32和33设置在与LED 31不同的距离处。结果，流过运算放大器34的电流是对应于亮度Pa的电流ia，因为亮度Pb极低。 运算放大器34然后施加电流电压转换以产生脉波信号Vm。