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公开(公告)号：US20220258476A1
公开(公告)日：2022-08-18
申请号：US17669396
申请日：2022-02-11
Applicant: Hiroyuki YAMASHITA
Inventor： Hiroyuki YAMASHITA
IPC: B41J2/165
Abstract: A liquid discharge device includes a liquid discharge unit that discharges a liquid and a cleaner. The liquid discharge unit has a first end, a second end, and a third end extending in a direction intersecting the first end and the second end. The cleaner moves relative to the liquid discharge unit in a movement direction from the first end toward the second end while contacting the liquid discharge unit with a contact force and a contact pressure. The contact force of the cleaner contacting one of the first end and the second end is smaller than the contact force of the cleaner contacting a portion of the liquid discharge unit other than the first end and the second end.
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2.发明申请公开(公告)号：US20200207087A1
公开(公告)日：2020-07-02
申请号：US16714843
申请日：2019-12-16
Applicant: Shinya TANAKA , Hiroyuki YAMASHITA
Inventor： Shinya TANAKA , Hiroyuki YAMASHITA
Abstract: A liquid discharge apparatus includes a head including a nozzle plate having a plurality of nozzles lined in a row and configured to discharge a liquid, a conveyor configured to convey the liquid application target, and a liquid receptacle configured to receive the liquid discharged from the head. The conveyor defines a conveyance passage of a liquid application target to which the head applies the liquid. The liquid receptacle has an opening through which the liquid discharged from the head passes. A longitudinal direction of the opening is along a movement direction of the liquid application target. A width of the opening is greater than a width of the liquid application target in a direction orthogonal to the movement direction.
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公开(公告)号：US20100208251A1
公开(公告)日：2010-08-19
申请号：US12771842
申请日：2010-04-30
Applicant: Hiroyuki YAMASHITA , Yukihisa MOHARA , Eiji IMAI
Inventor： Hiroyuki YAMASHITA , Yukihisa MOHARA , Eiji IMAI
IPC: G01N21/88
CPC classification number: H01L21/67288 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N21/95607 , G01N2021/95615
Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage,a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.
Abstract translation: 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。
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公开(公告)号：US20100312455A1
公开(公告)日：2010-12-09
申请号：US12774481
申请日：2010-05-05
Applicant: Hiroyuki YAMASHITA , Masatoshi SETO , Yusuke KAWAI
Inventor： Hiroyuki YAMASHITA , Masatoshi SETO , Yusuke KAWAI
CPC classification number: F02D41/3035 , F02D13/0207 , F02D13/0265 , F02D41/402 , Y02T10/128 , Y02T10/18 , Y02T10/44
Abstract: When it is determined that an engine operating condition is in a high-engine load HCCI range (A2) where an engine load is higher than a specified load X1 within a HCCI range A where a compression self combustion is performed, an after-TDC injection F2s is executed at a point T1 when an internal pressure of a combustion chamber drops below a specified pressure Y after the top dead center of an exhaust stroke during a minus valve overlap period NVO during which intake and exhaust valves are both closed. Then, a main injection F2m as a main injection is executed. Accordingly, any improper detonation or deterioration of NOx emission which may be caused by the compression self-ignition combustion in the range where the engine load is relatively high can be prevented.
Abstract translation: 当确定发动机工作状态处于发动机负荷高于执行压缩自燃的HCCI范围A内的指定负载X1的高发动机负荷HCCI范围（A2）时，TDC后的注入 当在排气门关闭的负阀重叠期间NVO期间，当燃烧室的内部压力下降到排气行程的上止点之后的指定压力Y以下时，在点T1执行F2。 然后，执行作为主喷射的主喷射F2m。 因此，可以防止在发动机负荷相对较高的范围内由压缩自点火燃烧引起的任何不适当的爆炸或NOx排放的恶化。
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公开(公告)号：US20240165955A1
公开(公告)日：2024-05-23
申请号：US18515278
申请日：2023-11-21
Applicant: Teppei KIKUCHI , Hiroyuki YAMASHITA , Yasunobu TAKAGI , Nanami TAKANO , Kaoru SATOH
Inventor： Teppei KIKUCHI , Hiroyuki YAMASHITA , Yasunobu TAKAGI , Nanami TAKANO , Kaoru SATOH
IPC: B41J2/165
CPC classification number: B41J2/16523 , B41J2002/16514 , B41P2235/27
Abstract: A liquid discharge apparatus includes: a liquid discharge head having a discharge face having a nozzle from which a liquid is discharged to a medium; a carriage, to which the liquid discharge head is mountable, and reciprocally movable in a main-scanning direction; a guide supporting the carriage to guide the carriage to move in the main-scanning direction; a cap to contact and seal the discharge face of the liquid discharge head; a suction device connected to the cap; and a cap cleaner, supported and guided by the guide to move in the main-scanning direction, to drop a cleaning liquid to the cap.
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Patent Agency Ranking
公开(公告)号：US20220098776A1
公开(公告)日：2022-03-31
申请号：US17485505
申请日：2021-09-27
Applicant: Hiroyuki YAMASHITA , Shinya TANAKA , Yusuke KOMINE , Taito OMURA , Yuuki GOTOH , Kaoru SATOH
Inventor： Hiroyuki YAMASHITA , Shinya TANAKA , Yusuke KOMINE , Taito OMURA , Yuuki GOTOH , Kaoru SATOH
Abstract: An embroidery device includes a needle including a hole through which a thread has been passed, a dyeing unit configured to dye the thread in different colors, an embroidery unit configured to move the needle to perform a sewing process on a medium with the thread dyed in the different colors by the dyeing unit, and a remover configured to remove the linear member in a vicinity of the needle.
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公开(公告)号：US20110285989A1
公开(公告)日：2011-11-24
申请号：US13197762
申请日：2011-08-03
Applicant: Hiroyuki YAMASHITA , Yukihisa MOHARA , Eiji IMAI
Inventor： Hiroyuki YAMASHITA , Yukihisa MOHARA , Eiji IMAI
IPC: G01N21/88
CPC classification number: H01L21/67288 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N21/95607 , G01N2021/95615
Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.
Abstract translation: 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。
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8.发明申请公开(公告)号：US20100195095A1
公开(公告)日：2010-08-05
申请号：US12758363
申请日：2010-04-12
Applicant: Hiroyuki YAMASHITA , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
Inventor： Hiroyuki YAMASHITA , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
IPC: G01N21/00
CPC classification number: G01N21/95607 , G01N21/94 , G01N2021/8825
Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
Abstract translation: 一种异物检查装置，其特征在于，包括：将检查光照射到待检查物品的检查区域的照射单元; 强度检测单元，用于通过向检查光照射检测从检查区域产生的反射光或散射光的强度; 位置检测单元，用于检测检查区域内的反射光或散射光的位置; 以及决定单元，用于判定在所述检查区域内是否存在异物; 异物检查装置包括：能够在其上显示其中在检查区域的整个区域上指示了阈值的阈值图像的显示单元和由阈值图像转换的检测灵敏度图像。
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公开(公告)号：US20090298098A1
公开(公告)日：2009-12-03
申请号：US12480983
申请日：2009-06-09
Applicant: Masao KAWAKITA , Kyoko HIRAMATSU , Keiichi TAKAHASHI , Naotaka HAMASAKI , Koji YAMAGUCHI , Tsunehisa KAKU , Koichiro MUTA , Munechika ENJOJI , Seiji NAITO , Jun HAYASHI , Shoshu MITSUYAMA , Hiroyuki YAMASHITA , Toru INOUE , Masato KATO
Inventor： Masao KAWAKITA , Kyoko HIRAMATSU , Keiichi TAKAHASHI , Naotaka HAMASAKI , Koji YAMAGUCHI , Tsunehisa KAKU , Koichiro MUTA , Munechika ENJOJI , Seiji NAITO , Jun HAYASHI , Shoshu MITSUYAMA , Hiroyuki YAMASHITA , Toru INOUE , Masato KATO
IPC: G01N33/574
CPC classification number: G01N33/574 , C07K16/30
Abstract: A tumor marker comprising diacetylspermine, and a method of evaluating the state of a tumor, comprising reacting an antibody to diacetylspermine with a biological sample to thereby detect diacetylspermine and evaluating the state of the tumor using the obtained detection results as an indicator.
Abstract translation: 包含二乙酰精胺的肿瘤标志物和评价肿瘤状态的方法，包括使抗体与二乙酰精胺与生物样品反应，从而检测二乙酰精胺，并使用获得的检测结果作为指标来评价肿瘤的状态。
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公开(公告)号：US20080239319A1
公开(公告)日：2008-10-02
申请号：US12057168
申请日：2008-03-27
Applicant: Hiroyuki YAMASHITA , Yukihisa MOHARA , Eiji Imai
Inventor： Hiroyuki YAMASHITA , Yukihisa MOHARA , Eiji Imai
CPC classification number: H01L21/67288 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N21/95607 , G01N2021/95615
Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.
Abstract translation: 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。
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