公开(公告)号：US20010030294A1

公开(公告)日：2001-10-18

申请号：US09883184

申请日：2001-06-19

Applicant: Hitachi, Ltd.

Inventor： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

IPC: G21K007/00 ,  G01N023/00 ,  G21G005/00 ,  A61N005/00

CPC classification number: H01J37/28 ,  G01N23/20 ,  G01N23/2251 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/04 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/04756 ,  H01J2237/20221 ,  H01J2237/2444 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/31766

Abstract: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

Abstract translation: 通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度 作为半导体晶片。 本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

公开(公告)号：US20030127595A1

公开(公告)日：2003-07-10

申请号：US10346138

申请日：2003-01-17

Applicant: Hitachi, Ltd.

Inventor： Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

IPC: H01J037/28 ,  G01N023/00 ,  G21K007/00

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope (STEM) offering substantially the same ease of operation as that of a scanning electron microscope (SEM) and providing substantially the same degree of resolution as that of a transmission electron microscope (TEM). The STEM of the invention is constituted based on the constitution of the SEM. The STEM comprises: an electron source for generating a primary electron beam; an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination; an electron deflecting system for scanning the specimen with the primary electron beam emitted thereto; a scattered electron detector for detecting scattered electrons transmitted through the specimen; a projection lens system for projecting the scattered electrons onto a detection surface of the scattered electron detector; an image displaying device for displaying a scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector; and a detection angle changing device for variably establishing a range of scattering angle of the scattered electrons detected by the scattered electron detector. This structure enhances a contrast of a desired portion of the specimen under observation for a scanning transmitted image by selective establishment of detection angle ranges for the scattered electron detector.

Abstract translation: 扫描透射电子显微镜（STEM）提供与扫描电子显微镜（SEM）基本上相同的操作容易性并且提供与透射电子显微镜（TEM）基本相同的分辨率。 本发明的STEM基于SEM的结构构成。 STEM包括：用于产生一次电子束的电子源; 电子照明透镜系统，用于将来自电子源的一次电子束会聚到用于照明的样本上; 电子偏转系统，用于用发射的一次电子束扫描样品; 用于检测通过样本传播的散射电子的散射电子检测器; 用于将散射电子投射到散射电子检测器的检测表面上的投影透镜系统; 图像显示装置，用于使用来自散射电子检测器的检测信号显示样本的扫描透射电子显微镜图像; 以及用于可变地建立由散射电子检测器检测的散射电子的散射角的范围的检测角度改变装置。 该结构通过选择性地建立散射电子检测器的检测角度范围来增强扫描透射图像的观察样本的期望部分的对比度。

公开(公告)号：US20020024021A1

公开(公告)日：2002-02-28

申请号：US09982965

申请日：2001-10-22

Applicant: Hitachi, Ltd.

Inventor： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Atsuko Takafuji ,  Hiroshi Toyama ,  Katsuya Sugiyama

IPC: G21G005/00 ,  A61N005/00

CPC classification number: H01J37/28 ,  G01N23/04 ,  H01J2237/2817

Abstract: An object of the present invention is to provide an inspection method using an electron beam and an inspection apparatus therefor, which are capable of enhancing the resolution, improving the inspection speed and reliability, and realizing miniaturization the apparatus. To achieve the above object, according to the present invention, there is provided an inspection method using an electron beam, including the steps of; applying a voltage on a sample via a sample stage; converging an electron beam on the sample; scanning the sample with the converged electron beam and simultaneously, continuously moving the sample stage; detecting charged particles generated from the sample; and detecting a defect on the sample on the basis of the detected charged particles; wherein a distance between the sample and the shield frame is determined on the basis of a critical discharge between the sample stage and the shield frame; coils of at least hexapoles for correcting the shape of an electron beam are provided; the electron beam is deflected for blanking during movement of the sample with the crossover of the electron beam taken as a fulcrum of blanking; or the magnitude of the voltage applied to the sample may be determined depending on the kind of sample.

Abstract translation: 本发明的目的是提供一种使用电子束的检查方法及其检查装置，其能够提高分辨率，提高检查速度和可靠性，并实现设备的小型化。 为了实现上述目的，根据本发明，提供一种使用电子束的检查方法，包括以下步骤： 通过样品台对样品施加电压; 将电子束会聚在样品上; 用聚光电子束扫描样品，同时连续移动样品台; 检测从样品产生的带电粒子; 并且基于检测到的带电粒子检测样品上的缺陷; 其中基于所述样品台和所述屏蔽框架之间的临界放电来确定所述样品和所述屏蔽框架之间的距离; 提供了用于校正电子束形状的至少六极的线圈; 电子束在作为消隐支点的电子束交叉的样品移动过程中偏转为消隐; 或者施加到样品的电压的大小可以根据样品的种类来确定。

公开(公告)号：US20030006373A1

公开(公告)日：2003-01-09

申请号：US10183157

申请日：2002-06-28

Applicant: Hitachi. Ltd.

Inventor： Masanari Koguchi ,  Kuniyasu Nakamura ,  Kaoru Umemura ,  Yoshifumi Taniguchi ,  Mikio Ichihashi

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/2955 ,  H01J2237/2802

Abstract: Disclosed is an observation apparatus and method using an electron beam, capable of measuring information regarding a crystal structure in a specimen (such as information regarding stress and strain in the specimen) with high sensitivity and high resolution from an electron beam diffraction image obtained by irradiating the specimen with an electron beam. An observation method according to the invention includes: a step of mounting a specimen on a specimen stage; an enlarged image acquiring step of irradiating a predetermined area in the specimen with an electron beam while scanning the electron beam, and acquiring an enlarged image of a specimen internal structure in the predetermined area in the specimen by using the electron beam passed through the specimen; a diffraction image acquiring step of irradiating a specific portion included in the predetermined area in the specimen with the electron beam and acquiring a diffraction image including information of a crystal structure in the specimen in the specific portion in the specimen, formed by the electron beam diffracted in the specimen; a crystal structure information extracting step of extracting information of the crystal structure in the specimen from the diffracted image acquired in the diffraction image acquiring step; and a superimposing and displaying step of displaying the information of the crystal structure in the specimen extracted in the crystal structure information extracting step so as to be superimposed on the enlarged image acquired in the enlarged image acquiring step. The observation method according to the invention can obtain information of the crystal structure in a specimen with high sensitivity and high resolution.

Abstract translation: 公开了一种使用电子束的观察装置和方法，其能够从通过照射获得的电子束衍射图像以高灵敏度和高分辨率测量样品中的晶体结构的信息（诸如样品中的应力和应变的信息） 具有电子束的样品。 根据本发明的观察方法包括：将试样安装在试样台上的步骤; 放大图像获取步骤，在扫描电子束的同时用电子束照射样本中的预定区域，并且通过使用通过样本的电子束获取样本中的预定区域中的样本内部结构的放大图像; 衍射图像获取步骤，用电子束照射样本中的预定区域中的特定部分，并获取包含由电子束衍射形成的样本中的样本中的样本中的晶体结构信息的衍射图像 在标本中 晶体结构信息提取步骤，从衍射图像获取步骤中获取的衍射图像提取样本中的晶体结构的信息; 以及叠加显示步骤，用于在晶体结构信息提取步骤中提取的样本中显示晶体结构的信息，以便叠加在放大图像获取步骤中获取的放大图像上。 根据本发明的观察方法可以获得具有高灵敏度和高分辨率的样品中的晶体结构的信息。