公开(公告)号：US20170018394A1

公开(公告)日：2017-01-19

申请号：US15123828

申请日：2015-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunari SOHDA ,  Takeyoshi OHASHI ,  Takafumi MIWA ,  Noritsugu TAKAHASHI ,  Hajime KAWANO

IPC: H01J37/05 ,  H01J37/29 ,  H01J37/145 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/145 ,  H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24514

Abstract: A scanning electron microscope according to the present invention includes: an electron source that produces an electron beam; a trajectory dispersion unit that disperses the trajectory of an electron beam of electrons with a different energy value; a selection slit plate having a selection slit that selects the energy range of the dispersed electron beam; and a transmittance monitoring unit that monitors the transmittance of an electron beam, which is being transmitted through the selection slit. Accordingly, there can be provided a scanning electron microscope equipped with an energy filter that implements a stable reduction in energy distribution.

Abstract translation: 根据本发明的扫描电子显微镜包括：产生电子束的电子源; 轨迹分散单元，其分散具有不同能量值的电子束的轨迹; 选择狭缝板，其具有选择所述分散电子束的能量范围的选择狭缝; 以及透射率监视单元，其监视通过选择狭缝传输的电子束的透射率。 因此，可以提供一种装有能量过滤器的扫描电子显微镜，能够实现能量分布的稳定降低。

公开(公告)号：US20200006032A1

公开(公告)日：2020-01-02

申请号：US16337791

申请日：2016-11-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takafumi MIWA ,  Seiichiro KANNO ,  Go MIYA

IPC: H01J37/09 ,  H01J37/20 ,  H01J37/28 ,  H01J37/02

Abstract: A charged particle beam device capable of removing a foreign matter adhered to an electric field-correcting electrode arranged in an outer peripheral portion of a measurement sample is provided. The invention is directed to a charged particle beam device including a sample stage provided with the measurement sample and an electric field-correcting electrode correcting an electric field in the vicinity of the outer peripheral portion of the measurement sample and in which the measurement sample is measured by being irradiated with a charged particle beam, wherein a foreign-matter removal control unit controls a power source connected to the electric field-correcting electrode such that an absolute value of a voltage to be applied to the electric field-correcting electrode is equal to or more than an absolute value of a voltage to be applied to the electric field-correcting electrode when the measurement sample is measured.

公开(公告)号：US20160013010A1

公开(公告)日：2016-01-14

申请号：US14796113

申请日：2015-07-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Seiichiro KANNO ,  Yasushi EBIZUKA ,  Go MIYA ,  Takafumi MIWA

IPC: H01J37/02 ,  H01J37/21 ,  H01J37/24 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.

Abstract translation: 在通过接触端子向样品施加延迟电压并执行样品表面的测量或检查的带电粒子束装置中，通过表面测量改变施加到接触端子的延迟电压时样品的电位变化 电位计，获得样品的电位变化的时间常数，并且基于时间常数确定带电粒子束的测量或检查的执行是否继续或停止，或者样品与样品之间的导通确保过程 接线端子被执行。