公开(公告)号：US20150031213A1

公开(公告)日：2015-01-29

申请号：US14514587

申请日：2014-10-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Go MIYA ,  Masaru IZAWA ,  Takumi TANDOU

IPC: H01L21/67 ,  H01L21/3065 ,  H01J37/32

CPC classification number: H01L21/67069 ,  H01J37/32724 ,  H01J37/32825 ,  H01J2237/2001 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67017 ,  H01L21/67109

Abstract: A plasma processing method is provided for a plasma processing apparatus which includes a plurality of upstream-side expansion valves and a plurality of downstream-side expansion valves connected to respective refrigerant inlets and respective refrigerant outlets to adjust a flow rate or a pressure of a refrigerant flowing into the respective refrigerant inlets and a flow rate or a pressure of a refrigerant flowing out from the respective refrigerant outlets. The method includes adjusting openings of the upstream-side expansion valves and openings of the downstream-side expansion valves so that no change in flow rate of the refrigerant occurs in a plurality of refrigerant channels between the plurality of upstream-side expansion valves and the plurality of downstream-side expansion valves via the plurality of refrigerant channels in a refrigeration cycle allowing the refrigerant to flow therein.

Abstract translation: 提供了一种等离子体处理装置，其包括多个上游侧膨胀阀和连接到各个制冷剂入口的各个下游侧膨胀阀和各个制冷剂出口，以调节制冷剂的流量或压力 流入相应的制冷剂入口以及从各个制冷剂出口流出的制冷剂的流量或压力。 该方法包括调节上游侧膨胀阀的开口和下游侧膨胀阀的开口，使得在多个上游侧膨胀阀和多个上游侧膨胀阀之间的多个制冷剂通道中不会发生制冷剂的流量变化 的下游侧膨胀阀通过允许制冷剂在其中流动的制冷循环中的多个制冷剂通道。

公开(公告)号：US20150262857A1

公开(公告)日：2015-09-17

申请号：US14626116

申请日：2015-02-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasushi EBIZUKA ,  Seiichiro KANNO ,  Masaya YASUKOCHI ,  Masakazu TAKAHASHI ,  Naoya ISHIGAKI ,  Go MIYA

IPC: H01L21/683 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01L21/6833 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/2007 ,  H01J2237/28

Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.

Abstract translation: 提出了一种静电卡盘机构和带电粒子束装置，其包括作为吸附样品的一侧的平面的第一平面，在第一平面和样品之间产生吸附力的电压为第一电极 以及第二电极，其布置在与所述样品相对分离的位置朝向所述第一平面，并且通过所述第二电极垂直于所述第一平面并接触所述样品的边缘的虚拟线通过，其中所述第一平面形成为 第一平面的平面方向的尺寸小于样品的尺寸。

公开(公告)号：US20140004706A1

公开(公告)日：2014-01-02

申请号：US13928645

申请日：2013-06-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Go MIYA ,  Masaru IZAWA ,  Takumi TANDOU

IPC: H01L21/3065 ,  H01L21/67

CPC classification number: H01L21/67069 ,  H01J37/32724 ,  H01J37/32825 ,  H01J2237/2001 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67017 ,  H01L21/67109

Abstract: Provided is a plasma processing apparatus which includes a plurality of upstream-side expansion valves and a plurality of downstream-side expansion valves connected to respective refrigerant inlets and respective refrigerant outlets to adjust a flow rate or a pressure of a refrigerant flowing into the respective refrigerant inlets and a flow rate or a pressure of a refrigerant flowing out from the respective refrigerant outlets. Openings of the upstream-side expansion valves and openings of the downstream-side expansion valves are adjusted so that no change in flow rate of the refrigerant occurs in a plurality of refrigerant channels between the plurality of upstream-side expansion valves and the plurality of downstream-side expansion valves via the plurality of refrigerant channels in a refrigeration cycle allowing the refrigerant to flow therein.

Abstract translation: 提供了一种等离子体处理装置，其包括多个上游侧膨胀阀和连接到各个制冷剂入口和各个制冷剂出口的多个下游侧膨胀阀，以调节流入各个制冷剂的制冷剂的流量或压力 入口和从各个制冷剂出口流出的制冷剂的流量或压力。 调节上游侧膨胀阀的开口和下游侧膨胀阀的开口，使得在多个上游侧膨胀阀与多个下游侧膨胀阀之间的多个制冷剂流路中不会发生制冷剂的流量变化 通过允许制冷剂在其中流动的制冷循环中的多个制冷剂通道的侧面膨胀阀。

公开(公告)号：US20200006032A1

公开(公告)日：2020-01-02

申请号：US16337791

申请日：2016-11-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takafumi MIWA ,  Seiichiro KANNO ,  Go MIYA

IPC: H01J37/09 ,  H01J37/20 ,  H01J37/28 ,  H01J37/02

Abstract: A charged particle beam device capable of removing a foreign matter adhered to an electric field-correcting electrode arranged in an outer peripheral portion of a measurement sample is provided. The invention is directed to a charged particle beam device including a sample stage provided with the measurement sample and an electric field-correcting electrode correcting an electric field in the vicinity of the outer peripheral portion of the measurement sample and in which the measurement sample is measured by being irradiated with a charged particle beam, wherein a foreign-matter removal control unit controls a power source connected to the electric field-correcting electrode such that an absolute value of a voltage to be applied to the electric field-correcting electrode is equal to or more than an absolute value of a voltage to be applied to the electric field-correcting electrode when the measurement sample is measured.

公开(公告)号：US20160013010A1

公开(公告)日：2016-01-14

申请号：US14796113

申请日：2015-07-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Seiichiro KANNO ,  Yasushi EBIZUKA ,  Go MIYA ,  Takafumi MIWA

IPC: H01J37/02 ,  H01J37/21 ,  H01J37/24 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.

Abstract translation: 在通过接触端子向样品施加延迟电压并执行样品表面的测量或检查的带电粒子束装置中，通过表面测量改变施加到接触端子的延迟电压时样品的电位变化 电位计，获得样品的电位变化的时间常数，并且基于时间常数确定带电粒子束的测量或检查的执行是否继续或停止，或者样品与样品之间的导通确保过程 接线端子被执行。