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公开(公告)号：US07682574B2
公开(公告)日：2010-03-23
申请号：US10991740
申请日：2004-11-18
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert Vermeulen
IPC分类号： B01J19/00
CPC分类号： F23G5/50 , B01D2258/0216 , F23G7/065 , F23K5/005 , F23N5/08 , F23N5/242 , F23N2027/02 , F23N2027/04 , F23N2029/02 , F23N2031/08 , F23N2031/18 , Y02C20/30 , Y02T50/677
摘要： The present invention relates to a thermal reactor apparatus used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention relates to improved monitoring and control features for the thermal reactor apparatus, including a flame sensing device, an intrinsically safe flammable gas sensing device, and a sequential mode of operation having built-in safety redundancy. The improved monitoring and control features ensure the safe and efficient abatement of waste effluent within the thermal reactor apparatus.
摘要翻译： 本发明涉及一种用于处理工业废水的热反应器装置，例如在半导体和液晶显示器制造工艺中产生的废液。 具体地，本发明涉及用于热反应器装置的改进的监测和控制特征，包括火焰感测装置，本质安全的可燃气体感测装置和具有内置安全冗余的顺序操作模式。 改进的监测和控制特征确保在热反应器装置内安全有效地减少废物流出物。
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2.发明申请公开(公告)号：US20090098492A1
公开(公告)日：2009-04-16
申请号：US12257888
申请日：2008-10-24
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
CPC分类号： F23G5/50 , B01D2258/0216 , F23G7/065 , F23K5/005 , F23N5/08 , F23N5/242 , F23N2027/02 , F23N2027/04 , F23N2029/02 , F23N2031/08 , F23N2031/18
摘要： A flame sensor apparatus for use with a flame heated thermal abatement reactor is provided, including a flame sensor adapted to sense a flame within the thermal abatement reactor; and a shutter adapted to selectively block the transmission of radiation from the flame to the flame sensor.
摘要翻译： 提供了一种与火焰加热的热消除反应器一起使用的火焰传感器装置，其包括适于感测热消除反应器内的火焰的火焰传感器; 以及适于选择性地阻挡从火焰到火焰传感器的辐射传输的快门。
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3.发明授权公开(公告)号：US08668868B2
公开(公告)日：2014-03-11
申请号：US12258395
申请日：2008-10-25
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
CPC分类号： B01D53/346 , B01D53/38 , B01D53/77 , B01D2251/102 , B01D2251/11 , B01D2258/0216 , C23C16/4412
摘要： A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.
摘要翻译： 提供了一种从电子设备制造过程中消除流出物的方法，包括减轻热消除工具中的流出物以形成减少的流出物; 确定减排的污水是否含有一种或多种感兴趣的化学物质; 以及基于所述确定改变所述热消除工具的一个或多个操作参数。 提供了许多其他实施例。
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公开(公告)号：US08095240B2
公开(公告)日：2012-01-10
申请号：US12257888
申请日：2008-10-24
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
CPC分类号： F23G5/50 , B01D2258/0216 , F23G7/065 , F23K5/005 , F23N5/08 , F23N5/242 , F23N2027/02 , F23N2027/04 , F23N2029/02 , F23N2031/08 , F23N2031/18
摘要： A flame sensor apparatus for use with a flame heated thermal abatement reactor is provided, including a flame sensor adapted to sense a flame within the thermal abatement reactor; and a shutter adapted to selectively block the transmission of radiation from the flame to the flame sensor.
摘要翻译： 提供了一种与火焰加热的热消除反应器一起使用的火焰传感器装置，其包括适于感测热消除反应器内的火焰的火焰传感器; 以及适于选择性地阻挡从火焰到火焰传感器的辐射传输的快门。
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5.发明申请公开(公告)号：US20090110622A1
公开(公告)日：2009-04-30
申请号：US12258395
申请日：2008-10-25
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Youssef A. Loldj , Robbert M. Vermeulen
IPC分类号： B01D53/68
CPC分类号： B01D53/346 , B01D53/38 , B01D53/77 , B01D2251/102 , B01D2251/11 , B01D2258/0216 , C23C16/4412
摘要： A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.
摘要翻译： 提供了一种从电子设备制造过程中消除流出物的方法，包括减轻热消除工具中的流出物以形成减少的流出物; 确定减排的污水是否含有一种或多种感兴趣的化学物质; 以及基于所述确定改变所述热消除工具的一个或多个操作参数。 提供了许多其他实施例。
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6.发明授权公开(公告)号：US07736599B2
公开(公告)日：2010-06-15
申请号：US10987921
申请日：2004-11-12
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Leonard B. Todd , Robbert Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Leonard B. Todd , Robbert Vermeulen
CPC分类号： F23M5/085 , F23D2900/00016 , F23G7/065 , F23J9/00 , F23M2900/05002 , F23M2900/05004
摘要： The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.
摘要翻译： 本发明涉及用于气态污染物的受控燃烧和分解的系统和方法，同时减少不需要的反应产物从处理系统内的沉积。 该系统包括具有堆叠的网状陶瓷环的新型热反应室设计，通过该陶瓷环可以使流体（例如气体）被引导以沿着热反应室的内壁形成边界层，从而减少其上积累的颗粒物质。 这些系统还包括从中心先导射流引入流体以改变热反应室内部的空气动力学。
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7.发明授权公开(公告)号：US07985379B2
公开(公告)日：2011-07-26
申请号：US11838435
申请日：2007-08-14
申请人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Leonard B. Todd , Robbert Vermeulen
发明人： Ho-Man Rodney Chiu , Daniel O. Clark , Shaun W. Crawford , Jay J. Jung , Leonard B. Todd , Robbert Vermeulen
IPC分类号： B01D50/00
CPC分类号： F23M5/085 , F23D2900/00016 , F23G7/065 , F23J9/00 , F23M2900/05002 , F23M2900/05004
摘要： The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.
摘要翻译： 本发明涉及用于气态污染物的受控燃烧和分解的系统和方法，同时减少不需要的反应产物从处理系统内的沉积。 该系统包括具有堆叠的网状陶瓷环的新型热反应室设计，通过该陶瓷环可以使流体（例如气体）被引导以沿着热反应室的内壁形成边界层，从而减少其上积累的颗粒物质。 这些系统还包括从中心先导射流引入流体以改变热反应室内部的空气动力学。
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8.发明授权Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber 失效沟槽和防溅罩，用于在从单个晶片清洁室传输过程中保护晶片公开(公告)号：US06807972B2
公开(公告)日：2004-10-26
申请号：US10113495
申请日：2002-03-29
IPC分类号： B08B302
CPC分类号： H01L21/67051 , B08B3/02 , B08B17/00 , Y10S134/902
摘要： A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.
摘要翻译： 单晶片清洗室，其包括可旋转支架，其可在晶片清洁过程中将晶片放置在捕捉杯的上端下方，位于晶片转移狭缝上方的沟槽; 捕捉杯可以与沟槽匹配以产生间隙，并且捕捉杯的上端位于等于或高于沟槽的高度。
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公开(公告)号：US20130312993A1
公开(公告)日：2013-11-28
申请号：US13481794
申请日：2012-05-26
申请人： Ho-Man Rodney Chiu
发明人： Ho-Man Rodney Chiu
IPC分类号： H05K9/00
CPC分类号： H01B11/10
摘要： A cable structure includes a conductor, a shielding layer wrapping the conductor, a knit layer surrounding the shielding layer, an absorbing layer enclosing the knit layer and made of efficient absorbing materials, and an insulating layer bounding round the absorbing layer. In use, the shielding layer and the knit layer shield electromagnetic waves produced by the conductor from diffusing outward and further shield outside electromagnetic waves from diffusing inward. The absorbing layer is capable of absorbing the electromagnetic waves which fail to be shielded by the shielding layer and the knit layer.
摘要翻译： 电缆结构包括导体，缠绕导体的屏蔽层，围绕屏蔽层的针织层，包围编织层并由高效吸收材料制成的吸收层以及围绕吸收层的绝缘层。 在使用中，屏蔽层和编织层屏蔽由导体产生的电磁波向外扩散，并进一步屏蔽外部电磁波向内扩散。 吸收层能够吸收不被屏蔽层和针织层屏蔽的电磁波。
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