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    INTEGRATED DEPOSITION OF THIN FILM LAYERS IN CADMIUM TELLURIDE BASED PHOTOVOLTAIC MODULE MANUFACTURE
    5.
    发明申请
    INTEGRATED DEPOSITION OF THIN FILM LAYERS IN CADMIUM TELLURIDE BASED PHOTOVOLTAIC MODULE MANUFACTURE 审中-公开
    基于碲化镉的光伏组件制造薄膜层的集成沉积

    公开(公告)号：US20120164784A1

    公开(公告)日：2012-06-28

    申请号：US12977139

    申请日：2010-12-23

    申请人： Scott Daniel Feldman-Peabody ,  Russell Weldon Black ,  Robert Dwayne Gossman ,  Brian Robert Murphy ,  Mark Jeffrey Pavol

    发明人： Scott Daniel Feldman-Peabody ,  Russell Weldon Black ,  Robert Dwayne Gossman ,  Brian Robert Murphy ,  Mark Jeffrey Pavol

    IPC分类号： H01L31/18 ,  C23C14/34

    CPC分类号： H01L31/073 ,  H01J37/32899 ,  H01J37/3402 ,  H01L21/02562 ,  H01L21/02631 ,  Y02E10/543 ,  Y02P70/521

    摘要： Apparatus and processes for thin film deposition of semiconducting layers in the formation of cadmium telluride thin film photovoltaic device are provided. The apparatus includes a series of integrally connected chambers, such as a load vacuum chamber connected to a load vacuum pump; a sputtering deposition chamber; a vacuum buffer chamber; and, a vapor deposition chamber. A conveyor system is operably disposed within the apparatus and configured for transporting substrates in a serial arrangement into and through the load vacuum chamber, the sputtering deposition chamber, the vacuum buffer chamber, and the vapor deposition chamber at a controlled speed. The sputtering deposition chamber; the vacuum buffer chamber; and the vapor deposition chamber are integrally connected such that the substrates being transported through the apparatus are kept at a system pressure less than about 760 Torr.

    摘要翻译： 提供了在形成碲化镉薄膜光伏器件中半导体层的薄膜沉积的装置和工艺。 该装置包括一系列整体连接的室，例如连接到负载真空泵的负载真空室; 溅射沉积室; 真空缓冲室; 和蒸镀室。 传送系统可操作地设置在设备内，并且被配置用于以受控的速度将串行装置中的基板输送到并通过负载真空室，溅射沉积室，真空缓冲室和气相沉积室。 溅射沉积室; 真空缓冲室; 并且蒸镀室一体地连接，使得通过设备输送的基板保持在小于约760托的系统压力。

    TEMPORARY ARC INDUCEMENT OF GLASS SUBSTRATE DURING DIFFUSIVE TRANSPORT DEPOSITION
    6.
    发明申请
    TEMPORARY ARC INDUCEMENT OF GLASS SUBSTRATE DURING DIFFUSIVE TRANSPORT DEPOSITION 审中-公开
    透明沉积期间玻璃基板的瞬时电弧诱导

    公开(公告)号：US20130084668A1

    公开(公告)日：2013-04-04

    申请号：US13249892

    申请日：2011-09-30

    申请人： Fred Harper Seymour ,  Jeffrey Todd Knapp ,  Scott Daniel Feldman-Peabody ,  Robert Dwayne Gossman ,  Mark Jeffrey Pavol

    发明人： Fred Harper Seymour ,  Jeffrey Todd Knapp ,  Scott Daniel Feldman-Peabody ,  Robert Dwayne Gossman ,  Mark Jeffrey Pavol

    IPC分类号： H01L31/18 ,  C23C16/458

    CPC分类号： C23C16/45565 ,  C23C16/54 ,  H01L21/02562 ,  H01L21/02631

    摘要： Apparatus for vapor deposition of a sublimated source material as a thin film on a photovoltaic module substrate is generally provided. The apparatus can include a deposition head; a distribution plate disposed below said distribution manifold and above an upper surface of a substrate transported through said apparatus and defining a pattern of passages therethrough; and, a carrying mechanism configured to transport the substrate in a machine direction under the distribution plate such that an upper surface of the substrate defines an arc in a cross-direction that is substantially perpendicular to the machine direction. Processes are also generally provided for vapor deposition of a sublimated source material to form thin film on a photovoltaic module substrate.

    摘要翻译： 通常提供用于将升华的源材料作为薄膜气相沉积在光伏模块基板上的装置。 该装置可包括沉积头; 分配板，其布置在所述分配歧管下方，并且在通过所述装置传送的衬底的上表面上方，并且限定通过其的通道图案; 以及承载机构，其构造成在所述分配板下沿机器方向输送所述基板，使得所述基板的上表面在大致垂直于所述机器方向的横向方向上形成电弧。 通常也提供了用于气相沉积升华的源材料以在光伏模块衬底上形成薄膜的工艺。