摘要:
A method for manufacturing a semiconductor may include providing a substrate having first and second regions defined therein, forming an interlayer dielectric layer including first and second trenches formed in the first and second regions, respectively, and conformally forming a gate dielectric layer along a top surface of the interlayer dielectric layer, side and bottom surfaces of the first trench and side, and bottom surfaces of the second trench. An etch stop dielectric layer may be formed on the gate dielectric layer, a first metal layer may be formed to fill the first and second trenches, and the first metal layer in the first region may be removed using the etch stop dielectric layer as an etch stopper.
摘要:
A method for manufacturing a semiconductor may include providing a substrate having first and second regions defined therein, forming an interlayer dielectric layer including first and second trenches formed in the first and second regions, respectively, and conformally forming a gate dielectric layer along a top surface of the interlayer dielectric layer, side and bottom surfaces of the first trench and side, and bottom surfaces of the second trench. An etch stop dielectric layer may be formed on the gate dielectric layer, a first metal layer may be formed to fill the first and second trenches, and the first metal layer in the first region may be removed using the etch stop dielectric layer as an etch stopper.
摘要:
A semiconductor device includes a substrate and first and second gate electrodes on the substrate. The first gate electrode includes a first gate insulation film having a bottom portion on the substrate and sidewall portions extending from the bottom portion and away from the substrate defining a first trench having a first width and a first functional film filling the first trench. The second gate electrode includes a second gate insulation film having a bottom portion on the substrate and sidewall portions extending from the bottom portion defining a second trench having a second width different from the first width, a second functional film conforming to the second gate insulation film in the second trench and defining a third trench, and a metal region in the third trench. The first width may be less than the second width.
摘要:
An array substrate for an in-plane switching liquid crystal display device includes a substrate, a gate line and a data line on the substrate and crossing each other to define a pixel region, a thin film transistor adjacent to a crossing of the gate line and the data line, a common electrode and a pixel electrode in the pixel region and spaced apart from each other, and a conductive pattern between the common and pixel electrodes.
摘要:
A digital broadcasting transmitter including a Reed-Solomon (RS) encoder to encode signaling information, and a randomizer to randomize a stream including the signaling information encoded by the RS encoder. The signaling information is used by a receiver to demodulate and/or equalize the stream.
摘要:
In a thin film depositing apparatus, a first reaction gas, a second reaction gas, and a non-volatile gas are supplied to a reaction chamber in order to form a protective layer, in which an organic layer and an inorganic layer are alternately stacked, on a process substrate. The first reaction gas is supplied to the reaction chamber only while the inorganic layer is formed on the process substrate, and the second reaction gas and the non-volatile gas are supplied to the reaction chamber through while the inorganic and organic layers are formed on the process substrate. Thus, the discontinuous surfaces may be prevented from being formed between the organic layer and the inorganic layer, thereby preventing the peeling of the organic and inorganic layers and increasing light transmittance.
摘要:
An array substrate for an in-plane switching liquid crystal display device includes a substrate, a gate line and a data line on the substrate and crossing each other to define a pixel region, a thin film transistor adjacent to a crossing of the gate line and the data line, a common electrode and a pixel electrode in the pixel region and spaced apart from each other, and a conductive pattern between the common and pixel electrodes.