STRESS SENSOR AND ITS MANUFACTURING METHOD
    1.
    发明申请
    STRESS SENSOR AND ITS MANUFACTURING METHOD 有权
    应力传感器及其制造方法

    公开(公告)号:US20120011938A1

    公开(公告)日:2012-01-19

    申请号:US13259211

    申请日:2010-04-22

    Applicant: Hubert Grange

    Inventor: Hubert Grange

    CPC classification number: G01B7/18

    Abstract: A device for measuring deformation including:a) at least one strain gauge (3), producing a signal following a deformation, where the said strain gauge is positioned on a face of a flexible support (32) favouring elongation of the strain gauge (3), and where the face opposite the strain gauge of the flexible support, which is intended to be brought into contact with, or glued to, a test body the deformation of which it is desired to measure,b) at least one first substrate, including at least signal processing means and/or signal transmission means,c) securing means (4, 5, 6) to assemble the strain gauge and the first substrate mechanically, where these means include a layer of material having elastic properties, called the elastic layer, positioned between the gauge and the first substrate, and where this elastic layer prevents the deformation of the gauge from being transmitted, or allows it to be transmitted as little as possible, to the first substrate (2, 20).

    Abstract translation: 一种用于测量变形的装置,包括:a)至少一个应变计(3),产生变形后的信号,其中所述应变计定位在有利于应变仪(3)的伸长的柔性支撑件(32)的表面上 ),并且其中与柔性支撑件的应变计相对的面,其旨在与测试体接触或粘合到其所需要测量的变形,b)至少一个第一基板, 包括至少信号处理装置和/或信号传输装置,c)固定装置(4,5,6)以机械方式组装应变计和第一基板,其中这些装置包括具有弹性特性的材料层,称为弹性 层,位于量规和第一基板之间,并且其中该弹性层防止计量器的变形被传输,或允许其尽可能少地传输到第一基板(2,20)。

    Method for separating a useful layer and component obtained by said method
    3.
    发明申请
    Method for separating a useful layer and component obtained by said method 失效
    用于分离由所述方法获得的有用层和组分的方法

    公开(公告)号:US20060144816A1

    公开(公告)日:2006-07-06

    申请号:US10562931

    申请日:2004-07-01

    CPC classification number: B81B3/001 B81C2201/115

    Abstract: A useful layer (1) is initially attached by a sacrificial layer (2) to a layer (3) forming a substrate. Before etching of the sacrificial layer (2), at least a part of the surface (4, 5) of at least one of the layers in contact with the sacrificial layer (2) is doped. After etching of the sacrificial layer (2), the surface (4, 5) is superficially etched so as to increase the roughness of its doped part. After doping, a mask (9) is deposited on a part of the useful layer (1) so as to delineate a doped zone and a non-doped zone of the surface (4, 5), one of the zones forming a stop after the superficial etching phase.

    Abstract translation: 有用层(1)最初由牺牲层(2)附着到形成衬底的层(3)上。 在蚀刻牺牲层(2)之前,掺杂与牺牲层(2)接触的至少一层的表面(4,5)的至少一部分。 在蚀刻牺牲层(2)之后,表面(4,5)被表面蚀刻以增加其掺杂部分的粗糙度。 在掺杂之后,在有用层(1)的一部分上沉积掩模(9),以便描绘表面(4,5)的掺杂区和非掺杂区,其中一个区在 表面蚀刻阶段。

    Method for producing a suspended element in a micro-machined structure
    4.
    发明授权
    Method for producing a suspended element in a micro-machined structure 失效
    用于在微加工结构中制造悬浮元件的方法

    公开(公告)号:US06365056B1

    公开(公告)日:2002-04-02

    申请号:US09331255

    申请日:1999-07-27

    CPC classification number: G01L9/0042

    Abstract: A process for making at least one suspended element uses an etching technique for micro-machining a structure comprising a substrate covered in sequence by a first layer called a stop layer made of a first material, and a second layer made of a second material in which the suspended element is formed. The process uses a dry etching technique using a gas with sufficient selectivity to enable etching of the second layer without etching the stop layer, under conditions defined to enable anisotropic etching of the second material, the etching being carried out according to a first phase to delimit the suspended element as far as the level of the stop layer and being continued in a second phase during which the suspended element is released by etching of the surface layer of the suspended element delimited in the first phase and which is adjacent to the stop layer.

    Abstract translation: 用于制造至少一个悬浮元件的方法使用蚀刻技术来微观加工包括由被称为第一材料制成的阻挡层的第一层依次覆盖的衬底的结构,以及由第二材料制成的第二层,其中 形成悬挂元件。 该方法使用干蚀刻技术,使用具有足够选择性的气体,以便能够在限定为能够进行第二材料的各向异性蚀刻的条件下蚀刻第二层而不蚀刻停止层,根据第一阶段进行蚀刻 该悬浮元件至止动层的水平并且在第二阶段中继续,在第二阶段期间,通过蚀刻在第一相中界定并且与停止层相邻的悬挂元件的表面层来释放悬浮元件。

    Apparatus for electrolytic clear display on a dull base
    5.
    发明授权
    Apparatus for electrolytic clear display on a dull base 失效
    用于在无光泽的基座上电解清晰显示的装置

    公开(公告)号:US4431989A

    公开(公告)日:1984-02-14

    申请号:US279057

    申请日:1981-06-30

    CPC classification number: G02F1/1533

    Abstract: Electrolytic device for light display on a dark background comprising a light source which illuminates a cell formed by two insulating walls between which is an electrolyte. One wall has an electrode comprising a plurality of segments for display and the other wall has a counter-electrode. The display is obtained by electrochemical deposition of dark coating material on the electrode.

    Abstract translation: 用于在深色背景上进行光显示的电解装置,包括照亮由两个绝缘壁形成的电池的光源,其间是电解质。 一个壁具有包括多个用于显示的段的电极,另一个壁具有对电极。 通过在电极上电化学沉积暗涂层材料获得显示。

    Stress sensor and its manufacturing method
    6.
    发明授权
    Stress sensor and its manufacturing method 有权
    应力传感器及其制造方法

    公开(公告)号:US08726738B2

    公开(公告)日:2014-05-20

    申请号:US13259211

    申请日:2010-04-22

    Applicant: Hubert Grange

    Inventor: Hubert Grange

    CPC classification number: G01B7/18

    Abstract: A device for measuring deformation including: a) at least one strain gauge, producing a signal following a deformation, positioned on a face of a flexible support favoring elongation of the strain gauge, the face opposite the strain gauge of the flexible support, which is configured to be brought into contact with, or glued to, a test body with the deformation desired to be measured; b) at least one first substrate, including at least signal processor and/or signal transmission device; c) a securing mechanism to assemble the strain gauge and the first substrate mechanically, including an elastic layer of material having elastic properties positioned between the gauge and the first substrate, the elastic layer preventing deformation of the gauge from being transmitted, or be transmitted as little as possible, to the first substrate.

    Abstract translation: 一种用于测量变形的装置,包括:a)至少一个应变计,产生变形后的信号,位于柔性支撑件的面上,有利于应变计的伸长,与柔性支撑件的应变计相对的面, 被配置为与具有期望测量的变形的测试体接触或胶合; b)至少一个第一衬底,至少包括信号处理器和/或信号传输装置; c)固定机构,用于机械地组装应变计和第一基板,包括具有位于量规和第一基板之间的具有弹性的材料的弹性层,弹性层防止压力表的变形被传递,或作为 尽可能少,到第一个底物。

    Method for separating a useful layer and component obtained by said method
    8.
    发明授权
    Method for separating a useful layer and component obtained by said method 失效
    用于分离由所述方法获得的有用层和组分的方法

    公开(公告)号:US07569152B2

    公开(公告)日:2009-08-04

    申请号:US10562931

    申请日:2004-07-01

    CPC classification number: B81B3/001 B81C2201/115

    Abstract: A useful layer (1) is initially attached by a sacrificial layer (2) to a layer (3) forming a substrate. Before etching of the sacrificial layer (2), at least a part of the surface (4, 5) of at least one of the layers in contact with the sacrificial layer (2) is doped. After etching of the sacrificial layer (2), the surface (4, 5) is superficially etched so as to increase the roughness of its doped part. After doping, a mask (9) is deposited on a part of the useful layer (1) so as to delineate a doped zone and a non-doped zone of the surface (4, 5), one of the zones forming a stop after the superficial etching phase.

    Abstract translation: 有用层(1)最初由牺牲层(2)附着到形成衬底的层(3)上。 在蚀刻牺牲层(2)之前,掺杂与牺牲层(2)接触的至少一层的表面(4,5)的至少一部分。 在蚀刻牺牲层(2)之后,表面(4,5)被表面蚀刻以增加其掺杂部分的粗糙度。 在掺杂之后,在有用层(1)的一部分上沉积掩模(9),以便描绘表面(4,5)的掺杂区和非掺杂区,其中一个区在 表面蚀刻阶段。

    Micro-mechanical device comprising suspended element which is connected to a support by means of a pier and production method thereof
    9.
    发明申请
    Micro-mechanical device comprising suspended element which is connected to a support by means of a pier and production method thereof 失效
    微机械装置,其包括通过码头连接到支撑件的悬挂元件及其制造方法

    公开(公告)号:US20060283272A1

    公开(公告)日:2006-12-21

    申请号:US10567865

    申请日:2004-08-24

    Abstract: A cavity is etched in a substrate and opens out onto the surface of the substrate facing the suspended element (1). The cavity has at least one broader zone having a cross-section which is greater than the cross-section of the cavity at said surface. A base (4) of the pillar (2), of complementary shape to the cavity, is buried in the cavity. The base (4) of the pillar (2) can form a dovetail assembly with the cavity of the substrate. This assembly is obtained by deposition, on a surface of the substrate, of a sacrificial layer and etching, in the sacrificial layer, of a hole passing through the sacrificial layer and reaching the surface of the substrate. The substrate is then etched, in the extension of the hole, so as to form the cavity of the substrate. Then a material designed to form the pillar (2) is deposited in the cavity and on the walls of the hole.

    Abstract translation: 在衬底中蚀刻空腔,并向面向悬浮元件(1)的衬底表面开口。 空腔具有至少一个较宽的区域,该区域的横截面大于所述表面处空腔的横截面。 柱体(2)的与空腔互补形状的基座(4)被埋在空腔中。 支柱(2)的基部(4)可以形成具有基底的空腔的燕尾组件。 该组件通过在牺牲层上沉积在衬底的表面上并在牺牲层中蚀刻穿过牺牲层并到达衬底表面的孔而获得。 然后在孔的延伸部中蚀刻衬底,以形成衬底的空腔。 然后将设计成形成柱(2)的材料沉积在空腔中和孔的壁上。

    Strain gauge on a flexible support and transducer equipped with said
gauge
    10.
    发明授权
    Strain gauge on a flexible support and transducer equipped with said gauge 失效
    应变计在一个灵活的支架和传感器上配备了所有量规

    公开(公告)号:US5508676A

    公开(公告)日:1996-04-16

    申请号:US204360

    申请日:1994-03-11

    CPC classification number: G01L1/2287

    Abstract: Strain gage disposed on a flexible support and probe fitted with the gage. A gage with its creep being adapted according to the test body and the application required, without having to change the mask for etching the strain-sensitive thin film. A strain gage fitted to one of the surfaces of a test body capable of deformation under the action of a quantity to be measured. The gage comprises a strain-sensitive thin film (22) etched in the form of a resistance and fitted to a flexible support (20), the film (22) comprising at least two underlying films (24, 26) having different creep values.

    Abstract translation: PCT No.PCT / FR93 / 00721 Sec。 371日期:1994年3月11日 102(e)1994年3月11日PCT 1993年7月15日PCT公布。 出版物WO94 / 02815 日期1994年3月2日。压力计放置在配有量规的柔性支架和探头上。 其蠕变根据测试体和所需的应用而适应,而不必改变用于蚀刻应变敏感薄膜的掩模。 应变计安装在测试体的一个表面上,能够在待测量的作用下变形。 量具包括以电阻形式蚀刻并装配到柔性支撑件(20)上的应变敏感薄膜(22),所述薄膜(22)包括具有不同蠕变值的至少两个下面的薄膜(24,26)。

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