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    Moving beam with respect to diffractive optics in order to reduce interference patterns
    1.
    发明申请
    Moving beam with respect to diffractive optics in order to reduce interference patterns 有权
    相对于衍射光学器件移动光束，以减少干涉图案

    公开(公告)号：US20070242253A1

    公开(公告)日：2007-10-18

    申请号：US11403194

    申请日：2006-04-13

    申请人： Huibert Visser ,  Johannes Baselmans ,  Pieter De Jager ,  Henri Vink

    发明人： Huibert Visser ,  Johannes Baselmans ,  Pieter De Jager ,  Henri Vink

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70058

    摘要： A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at valying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.

    摘要翻译： 系统和方法用于从至少部分相干光束形成非相干光束，从而基本上消除了干涉或散斑图案。 旋转光学元件引导部分相干光束从角分布变化元件反射以形成非相干光束。 通过旋转光学元件的旋转，部分相干光束可以以角度或位置指向角度分布变化元件。 角度可以随着时间的变化而变化。

    Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device
    5.
    发明申请
    Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device 有权
    使用造影装置的燃烧部分的平版印刷设备和装置制造方法

    公开(公告)号：US20060227069A1

    公开(公告)日：2006-10-12

    申请号：US11101627

    申请日：2005-04-08

    申请人： Johannes Baselmans ,  Huibert Visser ,  Henri Johannes Vink

    发明人： Johannes Baselmans ,  Huibert Visser ,  Henri Johannes Vink

    IPC分类号： G09G3/00

    CPC分类号： G03F7/70291 ,  G03F7/70308

    摘要： A system and method utilize a lithographic apparatus comprising an illumination system, an array of individually controllable elements, and a projection system. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the beam. At least one group of elements in the array of individually controllable elements being tilted to at least a same tilt direction with a same tilt sign. For example, the tilting can form one or more blazing portions (e.g., blazing super-pixel portions) in the array of individually controllable elements. The projection system projects the modulated beam onto a target portion of a substrate. The projection system includes an aperture that filters out undesired diffraction orders of the modulated beam.

    摘要翻译： 一种系统和方法利用包括照明系统，独立可控元件阵列和投影系统的光刻设备。 照明系统调节辐射束。 独立可控元件的阵列调制光束。 独立可控元件阵列中的至少一组元件以相同的倾斜标志倾斜至至少相同的倾斜方向。 例如，倾斜可以在独立可控元件的阵列中形成一个或多个燃烧部分（例如，燃烧的超像素部分）。 投影系统将调制束投影到基板的目标部分上。 投影系统包括滤光器，其滤除调制光束的不期望的衍射级。

    Lithographic apparatus and device manufacturing method utilizing an microlens array at a image plane
    6.
    发明申请
    Lithographic apparatus and device manufacturing method utilizing an microlens array at a image plane 有权
    在平面上利用微透镜阵列的平版印刷设备和器件制造方法

    公开(公告)号：US20060132751A1

    公开(公告)日：2006-06-22

    申请号：US11013938

    申请日：2004-12-17

    申请人： Johannes Baselmans ,  Huibert Visser

    发明人： Johannes Baselmans ,  Huibert Visser

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70291 ,  G03F7/70275

    摘要： A lithographic apparatus includes a radiation system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the radiation system. The projection system projects the patterned beam onto a target portion of a substrate. The projection system comprising a pupil positioned at a pupil plane of the projection system and an array of lenses positioned at an image plane of the projection system. The patterning device is conjugate to the array of lenses and the pupil is conjugate to the substrate.

    摘要翻译： 光刻设备包括辐射系统，图案形成装置和投影系统。 图案形成装置构图来自辐射系统的辐射束。 投影系统将图案化的光束投影到基板的目标部分上。 投影系统包括位于投影系统的光瞳平面处的光瞳和位于投影系统的像平面处的透镜阵列。 图案形成装置与透镜阵列共轭，瞳孔与基底共轭。

    System and method to correct for field curvature of multi lens array
    7.
    发明申请
    System and method to correct for field curvature of multi lens array 有权
    用于校正多透镜阵列的场曲率的系统和方法

    公开(公告)号：US20070075278A1

    公开(公告)日：2007-04-05

    申请号：US11243180

    申请日：2005-10-05

    申请人： Laurentius Jorritsma ,  Johannes Baselmans

    发明人： Laurentius Jorritsma ,  Johannes Baselmans

    IPC分类号： G01N21/86

    CPC分类号： G02B27/0025 ,  G02B3/0006 ,  G03F7/2008 ,  G03F7/70275 ,  G03F7/70308

    摘要： Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface, shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, this can be used when an array of focusing elements is used in a projection system of a lithography system.

    摘要翻译： 通过使用非平面校正表面来减少聚焦元件阵列的焦平面误差，该非平面校正表面被成形为使得聚焦元件的焦点比如果校正表面是平面的那样更靠近单个平面。 例如，当在光刻系统的投影系统中使用聚焦元件的阵列时，可以使用这一点。

    Lithographic apparatus and device manufacturing method
    8.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070030470A1

    公开(公告)日：2007-02-08

    申请号：US11546394

    申请日：2006-10-12

    申请人： Patricius Tinnemans ,  Johannes Baselmans ,  Laurentius Jorritsma

    发明人： Patricius Tinnemans ,  Johannes Baselmans ,  Laurentius Jorritsma

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70558 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70466 ,  G03F7/70475

    摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

    摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投射到衬底上作为辐射子束阵列和被配置成调制辐射子束的单独可控元件的阵列。 该装置还包括数据路径，其包括至少一个数据操作装置，该至少一个数据操作装置被布置成至少部分地将定义所请求的模式的数据转换为适于控制独立可控元件的阵列的控制信号，以在基板上形成基本上所请求的图案。 数据处理装置被配置为通过将点扩展函数矩阵的伪反转形式应用于表示所请求的图案的列向量来执行转换。 点扩散函数矩阵包括在给定时间通过辐射子束之一在衬底上暴露于每个点的点扩散函数的形状和相对位置的信息。

    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
    10.
    发明申请
    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation 有权
    无掩模光刻的方法和系统实时图案光栅化和使用计算耦合镜实现最佳特征表征

    公开(公告)号：US20070268547A1

    公开(公告)日：2007-11-22

    申请号：US11790222

    申请日：2007-04-24

    申请人： Azat Latypov ,  Kars Troost ,  Johannes Baselmans

    发明人： Azat Latypov ,  Kars Troost ,  Johannes Baselmans

    IPC分类号： G02B26/00 ,  G02F1/00

    CPC分类号： G03F7/70291

    摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

    摘要翻译： 公开了一种用于确定空间光调制器（SLM）的特定像素调制状态以在衬底上打印所需图案的方法和系统。 所述方法包括：在所述期望图案的物平面中选择至少一个超像素，所述超像素由至少两个像素形成。 所需图案的至少一个边缘穿过超像素内的边界，所述至少一个边缘由相对于超像素的特定斜率和位置参数限定。 该方法还包括（i）形成内插表以列出预先计算的像素调制状态，以及（ii）根据内插表确定每个像素的特定像素调制状态。 还公开了一种用于提供空间光调制器（SLM）的方法和系统。 SLM包括被构造成形成超像素组的多个反射镜。 每个超像素（i）包括来自多个反射镜的两个或更多个反射镜，并且（ii）被配置为仅切换一个像素的光。 两个或更多个反射镜中的每一个可以被单独地致动。