Layout structure of MOS transistors and methods of disposing MOS transistors on an active region
    1.
    发明申请
    Layout structure of MOS transistors and methods of disposing MOS transistors on an active region 失效
    MOS晶体管的布局结构和在有源区上设置MOS晶体管的方法

    公开(公告)号:US20070020858A1

    公开(公告)日:2007-01-25

    申请号:US11485341

    申请日:2006-07-13

    IPC分类号: H01L21/8234

    摘要: In a layout structure of a plurality of metal oxide semiconductor (MOS) transistors, the layout structure may include a first group of MOS transistors having first drain regions and first source regions that are individually allocated to a group active region that is isolated from all sides by a trench isolation, and a second group of MOS transistors having second drain regions and second source regions allocated to the group active region. The second group is disposed between the first group and an edge of the group active region. One or both of the first drain regions and first source regions are not in contact with an edge of the trench isolation in a length direction of a finger-type gate electrode.

    摘要翻译: 在多个金属氧化物半导体(MOS)晶体管的布局结构中,布局结构可以包括具有第一漏极区域的第一组MOS晶体管和分别分配给与所有侧面隔离的组有源区域的第一源极区域 通过沟槽隔离,以及第二组MOS晶体管,其具有分配给组有源区的第二漏极区和第二源极区。 第二组布置在第一组与组有源区的边缘之间。 第一漏极区域和第一源极区域中的一个或两个不与指状栅电极的长度方向上的沟槽隔离边缘接触。

    Layout structure of MOS transistors on an active region
    2.
    发明授权
    Layout structure of MOS transistors on an active region 失效
    有源区MOS晶体管的布局结构

    公开(公告)号:US07525173B2

    公开(公告)日:2009-04-28

    申请号:US11485341

    申请日:2006-07-13

    IPC分类号: H01L29/78

    摘要: In a layout structure of a plurality of metal oxide semiconductor (MOS) transistors, the layout structure may include a first group of MOS transistors having first drain regions and first source regions that are individually allocated to a group active region that is isolated from all sides by a trench isolation, and a second group of MOS transistors having second drain regions and second source regions allocated to the group active region. The second group is disposed between the first group and an edge of the group active region. One or both of the first drain regions and first source regions are not in contact with an edge of the trench isolation in a length direction of a finger-type gate electrode.

    摘要翻译: 在多个金属氧化物半导体(MOS)晶体管的布局结构中,布局结构可以包括具有第一漏极区域的第一组MOS晶体管和分别分配给与所有侧面隔离的组有源区域的第一源极区域 通过沟槽隔离,以及第二组MOS晶体管,其具有分配给组有源区的第二漏极区和第二源极区。 第二组布置在第一组与组有源区的边缘之间。 第一漏极区域和第一源极区域中的一个或两个不与指状栅电极的长度方向上的沟槽隔离边缘接触。

    Stacked memory cell for use in high-density CMOS SRAM
    3.
    发明申请
    Stacked memory cell for use in high-density CMOS SRAM 有权
    用于高密度CMOS SRAM的堆叠存储单元

    公开(公告)号:US20070147107A1

    公开(公告)日:2007-06-28

    申请号:US11588223

    申请日:2006-10-27

    IPC分类号: G11C11/00

    CPC分类号: G11C11/412

    摘要: A stacked memory cell for use in a high-density static random access memory is provided that includes first and second pull-down transistors formed in a first layer, a pass transistor connected between a gate of the second pull-down transistor and a bit line and formed in the first layer and a first and second pull-up transistors formed in a second layer located above the first layer and connected with the first and second pull-down transistors respectively to form an inverter latch. With the construction of a stacked memory cell having a lone pass transistor, cell size is reduced compared to a conventional six-transistor cell, and driving performance of the pass transistor can be improved.

    摘要翻译: 提供了一种用于高密度静态随机存取存储器的堆叠存储单元,其包括形成在第一层中的第一和第二下拉晶体管,连接在第二下拉晶体管的栅极和位线之间的通过晶体管 并形成在第一层中,以及形成在位于第一层上方的第二层并分别与第一和第二下拉晶体管连接以形成反相器锁存器的第一和第二上拉晶体管。 通过构造具有单通道晶体管的堆叠存储单元,与传统的六晶体管单元相比,单元尺寸减小,并且可以提高传输晶体管的驱动性能。

    Stacked memory cell for use in high-density CMOS SRAM
    4.
    发明授权
    Stacked memory cell for use in high-density CMOS SRAM 有权
    用于高密度CMOS SRAM的堆叠存储单元

    公开(公告)号:US07924604B2

    公开(公告)日:2011-04-12

    申请号:US11588223

    申请日:2006-10-27

    IPC分类号: G11C11/00

    CPC分类号: G11C11/412

    摘要: A stacked memory cell for use in a high-density static random access memory is provided that includes first and second pull-down transistors formed in a first layer, a pass transistor connected between a gate of the second pull-down transistor and a bit line and formed in the first layer and a first and second pull-up transistors formed in a second layer located above the first layer and connected with the first and second pull-down transistors respectively to form an inverter latch. With the construction of a stacked memory cell having a lone pass transistor, cell size is reduced compared to a conventional six-transistor cell, and driving performance of the pass transistor can be improved.

    摘要翻译: 提供了一种用于高密度静态随机存取存储器的堆叠存储单元,其包括形成在第一层中的第一和第二下拉晶体管,连接在第二下拉晶体管的栅极和位线之间的通过晶体管 并形成在第一层中,以及形成在位于第一层上方的第二层并分别与第一和第二下拉晶体管连接以形成反相器锁存器的第一和第二上拉晶体管。 通过构造具有单通道晶体管的堆叠存储单元,与传统的六晶体管单元相比,单元尺寸减小,并且可以提高传输晶体管的驱动性能。

    Sub-word line driver circuit and semiconductor memory device having the same
    6.
    发明授权
    Sub-word line driver circuit and semiconductor memory device having the same 有权
    子字线驱动电路和半导体存储器件

    公开(公告)号:US08279703B2

    公开(公告)日:2012-10-02

    申请号:US12839454

    申请日:2010-07-20

    IPC分类号: G11C8/00 H01L29/76 H01L21/70

    CPC分类号: G11C8/08

    摘要: A sub-word line driver includes a substrate, a plurality of gate lines and at least one gate tab. The substrate includes a plurality of isolation areas and a plurality of active areas, where the two active areas are separated by each isolation area, and the isolation areas and the active areas are extended in a first direction and are arranged in a second direction perpendicular to the first direction. The plurality of gate lines are formed on the substrate, where the gate lines are extended in a second direction and are arranged in the first direction. The at least one gate tab is formed on the substrate, where the at least one gate tab is extended in the first direction to cover the isolation area. Incorrect operation of the sub-word line driver may be prevented, and a power consumption of the sub-word line driver may be reduced.

    摘要翻译: 子字线驱动器包括衬底,多个栅极线和至少一个栅极突起。 衬底包括多个隔离区域和多个有效区域,其中两个有源区域由每个隔离区域分开,并且隔离区域和有源区域在第一方向上延伸并且沿垂直于 第一个方向。 多个栅极线形成在基板上,其中栅极线沿第二方向延伸并且沿第一方向布置。 所述至少一个栅极突片形成在所述基板上,其中所述至少一个栅极突片在所述第一方向上延伸以覆盖所述隔离区域。 可以防止子字线驱动器的不正确的操作,并且可以减少子字线驱动器的功耗。

    Semiconductor memory device and layout method thereof
    7.
    发明授权
    Semiconductor memory device and layout method thereof 有权
    半导体存储器件及其布局方法

    公开(公告)号:US07808852B2

    公开(公告)日:2010-10-05

    申请号:US12230570

    申请日:2008-09-02

    IPC分类号: G11C7/00

    CPC分类号: G11C7/12 G11C7/18

    摘要: Example embodiments relate to a semiconductor memory device, for example, a semiconductor memory device including an efficient layout circuit and method thereof. The method may include sharing a first active area between a first precharger and a second precharger and sharing a second active area between a third precharger and a fourth precharger. The semiconductor memory device may include a level shifter configured to receive a first precharge control signal and boost a logic high level of the first precharge control signal to an external power supply voltage level to output a boosted first precharge control signal. The semiconductor memory device may further include first, second, third and fourth prechargers. The first and third prechargers may be configured to precharge data signals transmitted to a first and second pair of local input/output data lines to the first precharge voltage in response to the boosted first precharge control signal during a data read operation.

    摘要翻译: 示例性实施例涉及半导体存储器件,例如包括有效布局电路的半导体存储器件及其方法。 该方法可以包括在第一预充电器和第二预充电器之间共享第一有效区域并且在第三预充电器和第四预充电器之间共享第二有效区域。 半导体存储器件可以包括电平移位器,其被配置为接收第一预充电控制信号并将第一预充电控制信号的逻辑高电平升高到外部电源电压电平以输出升压的第一预充电控制信号。 半导体存储器件还可以包括第一,第二,第三和第四预充电器。 第一和第三预充电器可以被配置为在数据读取操作期间响应于升压的第一预充电控制信号而将传输到第一和第二对本地输入/输出数据线的数据信号预充电到第一预充电电压。

    Line layout structure of semiconductor memory devices
    8.
    发明授权
    Line layout structure of semiconductor memory devices 有权
    半导体存储器件的线路布局结构

    公开(公告)号:US07405956B2

    公开(公告)日:2008-07-29

    申请号:US11227563

    申请日:2005-09-15

    IPC分类号: G11C5/06

    CPC分类号: G11C5/063 H01L27/1104

    摘要: A line layout structure of semiconductor memory device comprises first metal wire lines forming a bit line coupled to a memory cell, second metal wire lines disposed substantially orthogonal to the first metal wire lines and over the first metal wire lines, the second metal wire lines forming a section word line electrically coupled to the memory cell, and third metal wire lines disposed substantially parallel to the second metal wire lines and over the second metal wire lines, the third metal wire lines forming a first power line or signal line.

    摘要翻译: 半导体存储器件的线路布局结构包括形成耦合到存储单元的位线的第一金属线线,与第一金属线线基本上正交并且与第一金属线线基本上正交的第二金属线线,第二金属线线形成 电耦合到所述存储单元的部分字线以及基本上平行于所述第二金属线线设置并且在所述第二金属线路上的第三金属线线,所述第三金属线线形成第一电力线或信号线。

    Dual port SRAM memory
    9.
    发明授权
    Dual port SRAM memory 有权
    双端口SRAM存储器

    公开(公告)号:US07057963B2

    公开(公告)日:2006-06-06

    申请号:US10926441

    申请日:2004-08-25

    申请人: Hyang-Ja Yang

    发明人: Hyang-Ja Yang

    IPC分类号: G11C8/00

    CPC分类号: G11C8/16

    摘要: The layout structure of a dual port SRAM (Static Random Access Memory) includes a read bit line adjacently positioned to a complementary read bit line, and a write bit line positioned adjacent to a complementary write bit line, to provide a shield between the read and write lines for preventing cross-talk caused during read and write operations.

    摘要翻译: 双端口SRAM(静态随机存取存储器)的布局结构包括相邻于互补读位线的读位线和位于互补写位线附近的写位线,以提供读和写位线之间的屏蔽 写入线,用于防止在读写操作期间引起的串扰。

    Dual port SRAM memory
    10.
    发明申请
    Dual port SRAM memory 有权
    双端口SRAM存储器

    公开(公告)号:US20050047256A1

    公开(公告)日:2005-03-03

    申请号:US10926441

    申请日:2004-08-25

    申请人: Hyang-Ja Yang

    发明人: Hyang-Ja Yang

    CPC分类号: G11C8/16

    摘要: The layout structure of a dual port SRAM (Static Random Access Memory) includes a read bit line adjacently positioned to a complementary read bit line, and a write bit line positioned adjacent to a complementary write bit line, to provide a shield between the read and write lines for preventing cross-talk caused during read and write operations.

    摘要翻译: 双端口SRAM(静态随机存取存储器)的布局结构包括相邻于互补读位线的读位线和位于互补写位线附近的写位线,以提供读和写位线之间的屏蔽 写入线,用于防止在读写操作期间引起的串扰。