METHODS FOR MAKING FLOW CELLS
    2.
    发明申请

    公开(公告)号:US20240375075A1

    公开(公告)日:2024-11-14

    申请号:US18658753

    申请日:2024-05-08

    Applicant: ILLUMINA, INC.

    Abstract: In an example of a method of making a flow cell, a functional material is deposited over a resin layer including depressions separated by interstitial regions. The resin layer includes an ultraviolet (UV) light blocking additive. The depressions overlie a first portion of the resin layer having a first thickness, and the interstitial regions overlie a second portion of the resin layer having a second thickness that is greater than the first thickness. The functional material is susceptible to interaction with the resin layer when exposed to UV light. A predetermined UV light dosage is directed through the resin layer, whereby the functional material within the depressions is exposed to the UV light and attaches to the resin layer within the depressions. The functional material overlying the interstitial regions is blocked from being exposed to the UV light by the second resin portion.

    PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS

    公开(公告)号:US20250010291A1

    公开(公告)日:2025-01-09

    申请号:US18753229

    申请日:2024-06-25

    Applicant: Illumina, Inc.

    Abstract: Embodiments of the present disclosure relate to patterned substrates with functionalized surface such as flow cells, as well as methods of fabricating the patterned substrate. In particular, patterned substrates of the present disclosure may be prepared using two or more imprint resin layers, one of which acts as a photomask for the photoresist during substrate patterning, without the need of any metallic photomask. Embodiments of the patterned substrate may be used for simultaneous paired-end sequencing methods.

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