公开(公告)号：US20220088834A1

公开(公告)日：2022-03-24

申请号：US17541089

申请日：2021-12-02

Applicant: Illumina, Inc. ,  Illumina Cambridge Limited

Inventor： Alexandre Richez ,  Andrew A. Brown ,  Julia Morrison ,  Wayne N. George ,  Timothy J. Merkel ,  Audrey Rose Zak

IPC: B29C33/38 ,  C09D133/26 ,  B29C59/02 ,  G03F7/00 ,  B29C33/40

Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

公开(公告)号：US10955332B2

公开(公告)日：2021-03-23

申请号：US15848450

申请日：2017-12-20

Applicant: ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED

Inventor： James Tsay ,  Anmiv Prabhu ,  David Heiner ,  Edwin Li ,  Alexandre Richez ,  John M. Beierle ,  Kevan Samiee ,  Kristina Munoz ,  Leonid Malevanchik ,  Ludovic Vincent ,  Naiqian Zhan ,  Peyton Shieh ,  Robert Yang ,  Samantha Schmitt ,  Sang Park ,  Scott Bailey ,  Sean M. Ramirez ,  Sunmin Ahn ,  Valerie Uzzell ,  Wei Wei ,  Yuxiang Huang ,  Tyler Jamison Dill

IPC: G01N15/14 ,  C12Q1/6874 ,  B01L3/00 ,  C09D133/24 ,  C09D133/26 ,  B01J19/00 ,  G01N15/10

Abstract: A flow cell package includes first and second surface-modified patterned wafers and a spacer layer. The first surface-modified patterned wafer includes first depressions separated by first interstitial regions, a first functionalized molecule bound to a first silane or silane derivative in at least some of the first depressions, and a first primer grafted to the first functionalized molecule in the at least some of the first depressions. The second surface-modified patterned wafer includes second depressions separated by second interstitial regions, a second functionalized molecule bound to a second silane or silane derivative in at least some of the second depressions, and a second primer grafted to the second functionalized molecule in the at least some of the second depressions. The spacer layer bonds at least some first interstitial regions to at least some second interstitial regions, and at least partially defines respective fluidic chambers of the flow cell package.

公开(公告)号：US20210010080A1

公开(公告)日：2021-01-14

申请号：US17033237

申请日：2020-09-25

Applicant: Illumina, Inc.

Inventor： Andrew A. Brown ,  Wayne N. George ,  Alexandre Richez ,  M. Shane Bowen

IPC: C12Q1/6874 ,  G03F7/00 ,  G03F7/16

Abstract: Substrates comprising dual functional polymer layered surfaces and the preparation thereof by using UV nano-imprinting processes are disclosed. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.

公开(公告)号：US20180179575A1

公开(公告)日：2018-06-28

申请号：US15848640

申请日：2017-12-20

Applicant: ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED

Inventor： Wayne N. George ,  Alexandre Richez ,  M. Shane Bowen ,  Andrew A. Brown ,  Dajun M. Yuan ,  Audrey Rose Zak ,  Sean M. Ramirez ,  Raymond Campos

IPC: C12Q1/68 ,  C09D183/06 ,  C09D133/26

Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.

公开(公告)号：US20250114980A1

公开(公告)日：2025-04-10

申请号：US18964377

申请日：2024-11-30

Applicant: ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED

Inventor： Alexandre Richez ,  Andrew A. Brown ,  Julia Morrison ,  Wayne N. George ,  Timothy J. Merkel ,  Audrey Rose Zak

IPC: B29C33/38 ,  B29C33/40 ,  B29C59/02 ,  B29L31/00 ,  B81C1/00 ,  C09D4/00 ,  C09D133/26 ,  G03F7/00

Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

公开(公告)号：US12157252B2

公开(公告)日：2024-12-03

申请号：US17541089

申请日：2021-12-02

Applicant: Illumina, Inc. ,  Illumina Cambridge Limited

Inventor： Alexandre Richez ,  Andrew A. Brown ,  Julia Morrison ,  Wayne N. George ,  Timothy J. Merkel ,  Audrey Rose Zak

IPC: B29C33/38 ,  B29C33/40 ,  B29C59/02 ,  B29L31/00 ,  B81C1/00 ,  C09D4/00 ,  C09D133/26 ,  G03F7/00

Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

公开(公告)号：US20180327832A1

公开(公告)日：2018-11-15

申请号：US15969562

申请日：2018-05-02

Applicant: ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED ,  ILLUMINA SINGAPORE PTE. LTD.

Inventor： Sean M. Ramirez ,  Brian D. Mather ,  Edwin Li ,  Sojeong Moon ,  Innsu Daniel Kim ,  Alexandre Richez ,  Ludovic Vincent ,  Xavier von Hatten ,  Hai Quang Tran ,  Maxwell Zimmerley ,  Julia Morrison ,  Gianluca Andrea Artioli ,  Krystal Sly ,  Hayden Black ,  Lewis J. Kraft ,  Hong Xie ,  Wei Wei ,  Ryan Sanford

IPC: C12Q1/6874 ,  C12Q1/6806

CPC classification number: C12Q1/6874 ,  C12Q1/6806

Abstract: An example of a method includes providing a substrate with an exposed surface comprising a first chemical group, wherein the providing optionally comprises modifying the exposed surface of the substrate to incorporate the first chemical group; reacting the first chemical group with a first reactive group of a functionalized polymer molecule to form a functionalized polymer coating layer covalently bound to the exposed surface of the substrate; grafting a primer to the functionalized polymer coating layer by reacting the primer with a second reactive group of the functionalized polymer coating layer; and forming a water-soluble protective coating on the primer and the functionalized polymer coating layer. Examples of flow cells incorporating examples of the water-soluble protective coating are also disclosed herein.

公开(公告)号：US20250027152A1

公开(公告)日：2025-01-23

申请号：US18905923

申请日：2024-10-03

Applicant: Illumina, Inc.

Inventor： Andrew A. Brown ,  Wayne N. George ,  Alexandre Richez ,  M. Shane Bowen

IPC: C12Q1/6874 ,  B01L3/00 ,  G01N21/64 ,  G03F7/00 ,  G03F7/16

Abstract: Substrates comprising dual functional polymer layered surfaces and the preparation thereof by using UV nano-imprinting processes are disclosed. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.

公开(公告)号：US20250002985A1

公开(公告)日：2025-01-02

申请号：US18756653

申请日：2024-06-27

Applicant: Illumina, Inc.

Inventor： Gianluca Artioli ,  Xavier von Hatten ,  Alexandre Richez ,  Wayne George ,  Andrew Brown ,  Istvan Kocsis ,  Adam White

IPC: C12Q1/6844 ,  C12Q1/6806 ,  C12Q1/6834

Abstract: In some examples, a method of capturing a polynucleotide on a particle that includes a capture primer includes transporting the particle to a first aperture between a first fluidic compartment and a second fluidic compartment. The particle may be located in the first fluidic compartment, and the polynucleotide may be at least partially located in the second fluidic compartment. The method may include transporting the polynucleotide from the second fluidic compartment to the first fluidic compartment through the first aperture. The method may include hybridizing the polynucleotide to the capture primer.

公开(公告)号：US20240375075A1

公开(公告)日：2024-11-14

申请号：US18658753

申请日：2024-05-08

Applicant: ILLUMINA, INC.

Inventor： Francesca Patel-Burrows ,  Alexandre Richez ,  Alexandra Szemjonov

IPC: B01J19/00

Abstract: In an example of a method of making a flow cell, a functional material is deposited over a resin layer including depressions separated by interstitial regions. The resin layer includes an ultraviolet (UV) light blocking additive. The depressions overlie a first portion of the resin layer having a first thickness, and the interstitial regions overlie a second portion of the resin layer having a second thickness that is greater than the first thickness. The functional material is susceptible to interaction with the resin layer when exposed to UV light. A predetermined UV light dosage is directed through the resin layer, whereby the functional material within the depressions is exposed to the UV light and attaches to the resin layer within the depressions. The functional material overlying the interstitial regions is blocked from being exposed to the UV light by the second resin portion.