公开(公告)号：US11932714B2

公开(公告)日：2024-03-19

申请号：US17871363

申请日：2022-07-22

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yen-Yi Chu ,  Yun-Ching Lee ,  Li-Chun Liang ,  Wei-Ta Yang ,  Hsiang-Chin Juan

IPC: C08F232/08 ,  C08F232/04 ,  C08F236/14

CPC classification number: C08F232/08 ,  C08F232/04 ,  C08F236/14 ,  C08F2800/10 ,  C08F2810/20

Abstract: A copolymer, a film composition and a composite material employing the same are provided. The copolymer is a copolymerization product of a composition, wherein the composition includes a monomer (a), a monomer (b) and a monomer (c). The monomer (a) is a compound having a structure represented by Formula (I), the monomer (b) is a compound having a structure represented by Formula (II), and the monomer (c) is a compound having a structure represented by Formula (III)




wherein R1, R2, R3, R4, R5 and R6 are as defined in specification.

公开(公告)号：US20180171068A1

公开(公告)日：2018-06-21

申请号：US15851309

申请日：2017-12-21

Applicant: Industrial Technology Research Institute

Inventor： Wei-Ta Yang ,  Yen-Yi Chu ,  Ming-Tsung Hong ,  Li-Chun Liang ,  Yun-Ching Lee ,  Meng-Song Yin ,  Hsi-Yi Chin

IPC: C08G61/08 ,  C08L45/00 ,  C08L87/00

CPC classification number: C08G61/08 ,  C08G2261/1412 ,  C08G2261/1414 ,  C08G2261/1426 ,  C08G2261/418 ,  C08L45/00 ,  C08L57/06 ,  C08L87/00

Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n≥0; m≥1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.

公开(公告)号：US10179833B2

公开(公告)日：2019-01-15

申请号：US15395599

申请日：2016-12-30

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Ming-Tsung Hong ,  Yun-Ching Lee ,  Wei-Ta Yang ,  Meng-Song Yin

IPC: C03C25/30 ,  C03C25/32 ,  C08G61/08 ,  C08G61/12 ,  C08L25/10 ,  C08L65/00 ,  C08L45/00 ,  C08L47/00 ,  H05K1/03 ,  C08J5/24 ,  C08F36/20 ,  C08F32/08 ,  C08F232/08 ,  C08G61/02 ,  C09D171/12 ,  H05K1/09 ,  C08J5/04 ,  C09D125/10 ,  H05K1/02

Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.

公开(公告)号：US09236169B2

公开(公告)日：2016-01-12

申请号：US13891017

申请日：2013-05-09

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Ming-Tsung Hong ,  Yun-Ching Lee ,  Li-Chun Liang ,  Wei-Ta Yang

IPC: H01B13/30 ,  H05K1/02 ,  H05K1/03 ,  H05K3/28

CPC classification number: H01B13/30 ,  H05K1/0218 ,  H05K1/0393 ,  H05K3/281 ,  Y10T428/249958 ,  Y10T428/249982 ,  Y10T428/249985

Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.

Abstract translation: 提供一种电磁波屏蔽结构，包括：基板; 以及形成在所述基板上的多孔复合膜，其中所述多孔复合膜包括从多个金属纳米粒子熔合的连续相网络，涂覆在所述连续相网的表面上的第一树脂组合物和作为空隙空间的多个孔 在连续相网中涂覆有第一种树脂组合物。