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公开(公告)号：US20240069442A1
公开(公告)日：2024-02-29
申请号：US18503696
申请日：2023-11-07
IPC分类号： G03F7/26 , C07C309/06 , C07C309/19 , C07C309/30 , C07C309/39 , C07C311/48 , C07D285/16 , C07F7/22 , C07F9/92 , C07F9/94 , G03F7/004
CPC分类号： G03F7/26 , C07C309/06 , C07C309/19 , C07C309/30 , C07C309/39 , C07C311/48 , C07D285/16 , C07F7/2208 , C07F9/92 , C07F9/94 , G03F7/0045 , C07C381/12 , C07C2602/42
摘要： The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×107·cm2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.
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公开(公告)号：US20240321402A1
公开(公告)日：2024-09-26
申请号：US18188526
申请日：2023-03-23
摘要： A method for predicting a reactant of a chemical reaction which results in a reaction product, such that a boundary condition is satisfied, is disclosed. The method comprises receiving records of molecule descriptions and related characteristic property values, generating training data for a machine-learning (ML) system for predicting a predefined characteristic property value of reaction products related to a reactant, and combining, for received records of the molecule descriptions, sub-structures of molecules described by the molecule descriptions using chemical rules to generate candidate reactants. Furthermore, the method comprises predicting, using the ML system, a predefined characteristic property value related to candidate reactants, whereby the candidate reactants are separately used as input for the trained machine-learning system, where the machine-learning system has been trained using the training data, and filtering out all candidate reactants for which a condition related to the predicted predefined characteristic property value is not met.
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公开(公告)号：US20220308448A1
公开(公告)日：2022-09-29
申请号：US17215363
申请日：2021-03-29
IPC分类号： G03F7/004 , G03F7/20 , C07C381/12 , C07C309/29
摘要： In an approach to improve the field of photoacid generators (PAGs) through a new photoacid generator, in particular to a photoacid generator comprising a new polycyclic aromatic photoacid generator compound anion, and a photoresist composition, comprising said photoacid generator. Embodiments the present invention relate to a method of generating an acid using said photoresist composition and a method of forming a patterned materials feature on a substrate.
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4.发明公开公开(公告)号：US20230229077A1
公开(公告)日：2023-07-20
申请号：US17648495
申请日：2022-01-20
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , C07F5/02 , C07C381/12
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0382 , C07F5/027 , C07C381/12
摘要： A photoacid generator (PAG) anion, a photoresist composition, and a method are disclosed. The PAG anion includes a moiety, selected from an alkyl group, a monocyclic aromatic group, and a bicyclic aromatic group, that includes a carbon atom with a negative elementary charge. The PAG anion also includes an electron acceptor atom, selected from boron(III), aluminum(III), and phosphorus(V), which is covalently bonded to the carbon atom. The PAG anion also has at least one electron-withdrawing R group. The photoresist composition has a PAG that includes the PAG anion and a cation selected from triphenylsulfonium, diphenyliodonium, phenylthiolanium, and derivatives thereof. The method includes forming a layer of the photoresist composition over a material surface on a substrate, irradiating the layer to form a pattern of radiation-exposed regions, selectively removing portions of the irradiated layer to form exposed portions of the material surface, and etching or ion implanting the exposed portions.
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公开(公告)号：US20220122662A1
公开(公告)日：2022-04-21
申请号：US17074763
申请日：2020-10-20
IPC分类号： G11C13/00
摘要： A device includes at least one tunable resistive element. Each tunable resistive element comprises a first terminal, a second terminal, and a dielectric layer arranged between the first and second terminals. The device is configured to apply at least one electrical set pulse to the resistive elements to form a conductive filament comprising a plurality of oxygen vacancies in the dielectric layer. The device is configured to apply at least one electrical reset pulse to displace a subset of the oxygen vacancies of the conductive filament. The at least one electrical reset pulse comprises a first part, which is adapted to increase the temperature of the conductive filament and increase the mobility of the oxygen vacancies of the conductive filament, and a second part, which is configured to displace the subset of the oxygen vacancies of the conductive filament.
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公开(公告)号：US20240321412A1
公开(公告)日：2024-09-26
申请号：US18124638
申请日：2023-03-22
发明人： Nikolaos Livathinos , Maksym Lysak , Ahmed Samy Nassar , Peter Willem Jan Staar , Valery Weber , Gerhard Ingmar Meijer
IPC分类号： G16C20/80 , G06F40/103 , G06F40/143 , G06F40/186
CPC分类号： G16C20/80 , G06F40/103 , G06F40/143 , G06F40/186
摘要： The invention is notably directed to a computer-implemented method to generate a synthetic data set. The synthetic data set comprises a plurality of chemical documents and each of the plurality of chemical documents comprises a respective set of chemical objects. The method comprises a step of receiving configuration data, the configuration data comprising a set of configuration parameters for the data set. The method further comprises performing, in an iterative manner, for each of the plurality of chemical documents the steps of generating, by a structure generation module, a respective document structure for each of the respective chemical documents in accordance with the configuration data, generating, by a content generation module, the respective set of chemical objects for the respective chemical document and arranging the respective set of chemical objects on the respective chemical document.
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公开(公告)号：US11846886B2
公开(公告)日：2023-12-19
申请号：US17101148
申请日：2020-11-23
IPC分类号： G03F7/26 , G03F7/004 , C07F7/22 , C07F9/92 , C07F9/94 , C07C309/19 , C07C309/30 , C07D285/16 , C07C311/48 , C07C309/39 , C07C309/06 , C07C381/12 , G03F7/20
CPC分类号： G03F7/26 , C07C309/06 , C07C309/19 , C07C309/30 , C07C309/39 , C07C311/48 , C07D285/16 , C07F7/2208 , C07F9/92 , C07F9/94 , G03F7/0045 , C07C381/12 , C07C2602/42 , G03F7/2004
摘要： The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×107·cm2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.
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公开(公告)号：US20220317572A1
公开(公告)日：2022-10-06
申请号：US17220412
申请日：2021-04-01
摘要： Organometallic photoresists suitable for use in deep ultraviolet (DUV) or extreme ultraviolet (EUV) lithography are provided. The organometallic photoresists contain an organometallic molecule having least a metal element M selected from the group consisting of Bi, Sb, and mixtures thereof, and having an oxidation state of 3+, and at least one polymerizable group R. A method of forming a patterned materials feature on a substrate utilizing the organometallic photoresist compositions is also provided.
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公开(公告)号：US20220163886A1
公开(公告)日：2022-05-26
申请号：US17101148
申请日：2020-11-23
IPC分类号： G03F7/004 , C07F7/22 , C07F9/92 , C07F9/94 , C07C309/19 , C07C309/30 , C07C309/06 , C07C381/12 , C07D285/16 , C07C311/48 , C07C309/39
摘要： The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×107·cm2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.
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公开(公告)号：US11315634B1
公开(公告)日：2022-04-26
申请号：US17074763
申请日：2020-10-20
IPC分类号： G11C13/00
摘要： A device includes at least one tunable resistive element. Each tunable resistive element comprises a first terminal, a second terminal, and a dielectric layer arranged between the first and second terminals. The device is configured to apply at least one electrical set pulse to the resistive elements to form a conductive filament comprising a plurality of oxygen vacancies in the dielectric layer. The device is configured to apply at least one electrical reset pulse to displace a subset of the oxygen vacancies of the conductive filament. The at least one electrical reset pulse comprises a first part, which is adapted to increase the temperature of the conductive filament and increase the mobility of the oxygen vacancies of the conductive filament, and a second part, which is configured to displace the subset of the oxygen vacancies of the conductive filament.
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