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公开(公告)号：US11054320B2
公开(公告)日：2021-07-06
申请号：US16675727
申请日：2019-11-06
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Arthur W. Ellis , Richard A. Haight , James B. Hannon , Rudolf M. Tromp
Abstract: A force detector and method for using the same include a lens and a cantilever below the lens. A laser above the lens is configured to emit a beam of light that reflects from a surface of the lens and the cantilever. A processor is configured to determine a force between the lens and the cantilever based on interference between the light reflected from the surface and the light reflected from the cantilever.
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公开(公告)号：US10755170B2
公开(公告)日：2020-08-25
申请号：US15446264
申请日：2017-03-01
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Tayfun Gokmen , Rudolf M. Tromp
Abstract: A technique relates a resistive processing unit (RPU) array. A set of conductive column wires are configured to form cross-points at intersections between the set of conductive row wires and a set of conductive column wires. Two-terminal RPUs are hysteretic such that the two-terminal RPUs each have a conductance state defined by hysteresis, where a two-terminal RPU of the two-terminal RPUs is located at each of the cross-points.
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公开(公告)号：US20200072687A1
公开(公告)日：2020-03-05
申请号：US16675727
申请日：2019-11-06
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Arthur W. Ellis , Richard A. Haight , James B. Hannon , Rudolf M. Tromp
Abstract: A force detector and method for using the same include a lens and a cantilever below the lens. A laser above the lens is configured to emit a beam of light that reflects from a surface of the lens and the cantilever. A processor is configured to determine a force between the lens and the cantilever based on interference between the light reflected from the surface and the light reflected from the cantilever.
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公开(公告)号：US10101224B2
公开(公告)日：2018-10-16
申请号：US15445019
申请日：2017-02-28
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Arthur W. Ellis , Richard A. Haight , James B. Hannon , Rudolf M. Tromp
Abstract: A force detector and method for using the same includes a lens. A cantilever is below the movable lens. A laser above the movable lens emits a beam of light through the movable lens, such that light reflects from the lens and the cantilever. A camera is configured to capture images produced by the light reflected from the lens and the light reflected from the cantilever. A processor is configured to determine a force between the movable lens and the cantilever based on a change in phase of the interference rings.
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公开(公告)号：US10283315B2
公开(公告)日：2019-05-07
申请号：US15596850
申请日：2017-05-16
Applicant: International Business Machines Corporation
Inventor： Rudolf M. Tromp
IPC: H01J37/153 , H01J37/29 , H01J37/145 , H01J37/147
Abstract: An electron microscope system and a method of measuring an aberration of the electron microscope system are disclosed. An aperture filters an electron beam at a diffraction plane of the electron microscope to pass through electrons having a selected energy and momentum. A displacement of an image of the passed electrons is measured at a detector in an image plane of the electron microscope. An aberration coefficient of the electron microscope is determined from the measured displacement and at least one of the energy and momentum of the passed electrons. The measured aberration can be used to alter a parameter of the electron microscope or an optical element of the electron microscope to thereby control the overall aberration of the electron microscope.
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Patent Agency Ranking
公开(公告)号：US20180253642A1
公开(公告)日：2018-09-06
申请号：US15446264
申请日：2017-03-01
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Tayfun Gokmen , Rudolf M. Tromp
Abstract: A technique relates a resistive processing unit (RPU) array. A set of conductive column wires are configured to form cross-points at intersections between the set of conductive row wires and a set of conductive column wires. Two-terminal RPUs are hysteretic such that the two-terminal RPUs each have a conductance state defined by hysteresis, where a two-terminal RPU of the two-terminal RPUs is located at each of the cross-points.
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公开(公告)号：US20170292825A1
公开(公告)日：2017-10-12
申请号：US15480735
申请日：2017-04-06
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Richard A. Haight , James B. Hannon , Rudolf M. Tromp
CPC classification number: G01B9/02 , G01B11/026 , G01B11/0608 , G01B11/14 , G03F7/70775
Abstract: Methods and systems for measuring a distance include measuring a first interference pattern between a lens and a target surface using a light source at a first wavelength. A second interference pattern is measured between the lens and the target surface using a light source at a second wavelength, different from the first wavelength. An absolute measurement of a distance between the lens and the target surface is determined based on the first interference pattern and the second interference pattern.
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8.发明授权Scanning transmission electron microscope having multiple beams and post-detection image correction 有权具有多个光束的扫描透射电子显微镜和后检测图像校正公开(公告)号：US09552961B2
公开(公告)日：2017-01-24
申请号：US14683679
申请日：2015-04-10
Applicant: International Business Machines Corporation
Inventor： Rudolf M. Tromp
CPC classification number: H01J37/263 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/2446 , H01J2237/2802 , H01J2237/2809 , H01J2237/2826
Abstract: Embodiments are directed to an information processing system for generating a corrected image of a sample. The system includes a detector, a memory communicatively coupled to the detector, and a post-detection image processor communicatively coupled to the memory and the detector. The detector is configured to detect data of a plurality of moving particles, wherein the data of the plurality of moving particles correspond to an uncorrected image of the sample, and wherein the uncorrected image includes defocus, astigmatism and spherical aberration. The post-detection image processor is configured to generate a corrected image of the sample based at least in part on processing the detected data of the plurality of moving particles.
Abstract translation: 实施例涉及用于产生样本的校正图像的信息处理系统。 该系统包括检测器，通信地耦合到检测器的存储器，以及通信地耦合到存储器和检测器的后检测图像处理器。 检测器被配置为检测多个移动粒子的数据，其中多个移动粒子的数据对应于样本的未校正图像，并且其中未校正的图像包括散焦，散光和球面像差。 后检测图像处理器被配置为至少部分地基于处理多个移动粒子的检测数据来生成样本的校正图像。
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公开(公告)号：US20190206655A1
公开(公告)日：2019-07-04
申请号：US16294017
申请日：2019-03-06
Applicant: International Business Machines Corporation
Inventor： Rudolf M. Tromp
IPC: H01J37/153 , H01J37/145 , H01J37/147 , H01J37/29
Abstract: An electron microscope system and a method of measuring an aberration of the electron microscope system are disclosed. A method of controlling an aberration of an electron microscope includes obtaining a dispersed energy distribution for electrons at a diffraction plane of the electron microscope and placing an aperture at a selected location of the dispersed energy distribution in the diffraction plane. The method measures displacement of an image of the aperture in an image plane of the electron microscope for the selected location of the aperture. The method determines an aberration coefficient of the electron microscope from the measured displacement and the selected location of the aperture and alters a parameter of an element of the electron microscope to control the aberration of the electron microscope based at least in part on the determined aberration coefficient.
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公开(公告)号：US10330458B2
公开(公告)日：2019-06-25
申请号：US16110626
申请日：2018-08-23
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Richard A. Haight , James B. Hannon , Rudolf M. Tromp
Abstract: Systems for measuring a distance include a lens positioned a distance above a target surface. A camera is configured to measure a first interference pattern between the lens and the target surface using a light source at a first wavelength and to measure a second interference pattern between the lens and the target surface using a light source at a second wavelength. A processor is configured to determine an absolute measurement of the distance between the lens and the target surface based on the first interference pattern and the second interference pattern.
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