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1.发明申请公开(公告)号：US20070122901A1
公开(公告)日：2007-05-31
申请号：US10574687
申请日：2004-10-15
申请人： Ikuo Morita , Makoto Nakamura , Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi , Masaaki Kurihara
发明人： Ikuo Morita , Makoto Nakamura , Hideyuki Miyake , Hideshi Hattori , Hironori Kobayashi , Masaaki Kurihara
IPC分类号： C12N5/06
CPC分类号： C12N5/0068 , A61L27/38 , C12N2533/00
摘要： The present invention relates to a method for culturing cells, which comprises the steps of: causing cells to adhere to the surface of a cell array substrate having a cell adhesiveness variation pattern that comprises regions having good cell adhesiveness and regions having inhibited cell adhesiveness patterned on a substrate; transferring the adhered cells to a cell culture substrate in such patterned state; and culturing the transferred cells.
摘要翻译： 本发明涉及一种培养细胞的方法，包括以下步骤：使细胞粘附到具有细胞粘附性变化图案的细胞阵列基板的表面，所述细胞粘附变化图案包含具有良好细胞粘附性的区域和图案化的细胞粘附性抑制区域 底物; 以这样的图案化状态将粘附的细胞转移到细胞培养基质; 并培养转移的细胞。
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公开(公告)号：US07575854B2
公开(公告)日：2009-08-18
申请号：US11828489
申请日：2007-07-26
CPC分类号： G02B3/0018 , G03F7/0005 , G03F7/2022
摘要： A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is different from a gravity center position. To attain the object, the present invention provides a method for manufacturing a microlens comprising processes of: a basic shape forming-exposure process for performing exposure by using a microlens basic shape-forming mask to a photosensitive resin layer formed on a substrate; and a deforming-exposure process for performing exposure, with a unit cell-exposure profile different from that of the exposure performed in the basic shape forming-exposure process, to the photosensitive resin layer by using a microlens-shape-adjusting mask, wherein a microlens, having a maximum thickness position different from a gravity center position is formed.
摘要翻译： 本发明的主要目的在于提供一种能够容易地形成平滑形状的微透镜的微透镜的制造方法，其中最大厚度位置与重心位置不同。 为了达到上述目的，本发明提供一种微透镜的制造方法，其特征在于，包括以下工序的工序：将形成在基板上的感光性树脂层使用微透镜基体形成用掩模进行曝光的基本形状曝光工序; 以及通过使用微透镜形状调节掩模将感光性树脂层的单位细胞曝光图案与基本形状形成曝光处理中的曝光图形不同的曝光进行变形曝光的工序，其中， 形成具有与重心位置不同的最大厚度位置的微透镜。
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3.发明授权Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber 失效制造用于加工光纤的相位掩模和具有使用用于加工光纤的相位掩模制造的布拉格衍射光栅的光纤的方法公开(公告)号：US06795614B2
公开(公告)日：2004-09-21
申请号：US10019847
申请日：2001-10-25
IPC分类号： G02B634
CPC分类号： G02B6/02138 , G02B6/02085 , G02B6/124 , G02B2006/12107 , G03F1/34 , G03F7/001 , G03F7/70325 , G03F7/7035 , G03F7/70383 , G03F7/70475
摘要： The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders. In making a mask having a plurality of juxtaposed patterns (P1 to P5) having a linearly or nonlinearly increasing or decreasing pitch and a uniform groove-strip width ratio, multiple exposure is carried out to minimize difference between the pitch at the joint between patterns having different pitch data and the pitch in each individual pattern.
摘要翻译： 本发明涉及一种制造光纤处理相位掩模的方法，其具有最小化的连接误差，其可能降低通过使用相位掩模制造的光纤衍射光栅的谱线形状和群延迟特性。 本发明提供一种制造光纤加工相位掩模的方法，该光纤加工相位掩模具有设置在透明基板的一个表面上的光栅形状的槽和条带的重复图案，从而将由重复图案产生的衍射光施加到光纤 通过不同阶数的衍射光的干涉条纹在光纤中制造衍射光栅。 在具有多个具有线性或非线性增加或减小间距的均匀图案（P1至P5）的掩模和均匀的槽带宽度比时，进行多次曝光以最小化在具有 不同的音调数据和每个单独模式的音调。
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4.发明授权
公开(公告)号：US5569573A
公开(公告)日：1996-10-29
申请号：US349158
申请日：1994-12-02
申请人： Gensho Takahashi , Masaaki Kurihara
发明人： Gensho Takahashi , Masaaki Kurihara
CPC分类号： B41C1/1041 , Y10S430/165
摘要： The present invention relates to a thermosensitive lithographic printing original plate comprising a substrate, a hydrophilic layer containing a hydrophilic binder polymer, and a microcapsuled oleophilic material which forms an image area by heating; the hydrophilic binder polymer having a three-dimensional cross-link and a functional group which chemically combines with the oleophilic material in the microcapsule when the microcapsule is decomposed, and the microcapsuled oleophilic material having a functional group which chemically combines with the hydrophilic binder polymer when the microcapsule is decomposed.The thermosensitive lithographic printing original plate of the present invention is excellent in printing durability and storage property and provides prints having clear images because the plate does not collect scumming. Further, development is not required in the platemaking process so that there are no problems with waste treatment and the like. Consequently, the original plate can be practically applied not only to a light printing such as a printing in offices but also to a rotary press of newspaper, form printing and the like.
摘要翻译： 本发明涉及一种热敏平版印刷原版，其包括基材，含有亲水性粘合剂聚合物的亲水层和通过加热形成图像区域的微胶囊亲油性材料; 具有三维交联的亲水性粘合剂聚合物和当微胶囊分解时与微胶囊中的亲油性物质化学结合的官能团，以及具有与亲水性粘合剂聚合物化学结合的官能团的微胶囊亲油性材料， 微胶囊分解。 本发明的热敏平版印刷原版具有优异的印刷耐久性和储存性，并提供具有清晰图像的印刷品，因为印版不会收集浮渣。 此外，在制版过程中不需要开发，因此不存在废物处理等问题。 因此，原版可以实际上不仅适用于办公室中的印刷等轻型印刷，还可以用于报纸，印刷等的旋转印刷机。
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公开(公告)号：US20070080375A1
公开(公告)日：2007-04-12
申请号：US11527032
申请日：2006-09-26
申请人： Masaaki Kurihara , Makoto Abe , Katsutoshi Suzuki
发明人： Masaaki Kurihara , Makoto Abe , Katsutoshi Suzuki
IPC分类号： H01L27/148
CPC分类号： H01L27/14627 , H01L27/14685
摘要： A main object of the present invention is to provide a solid-state image sensor capable of efficiently collecting a light beam when the central position of the light receiving element and the central position of the micro lens do not coincide with each other in the plan view owing to a plural pixel sharing structure. To achieve the object, the present invention provides a solid-state image sensor comprising at least: a light receiving element for receiving a subject light to convert into a light signal; a micro lens for improving the light collecting rate to the light receiving element; and a signal readout circuit for reading a light signal generated from the light receiving element, such that the central position of the light receiving element and the central position of the micro lens do not coincide with each other in the plan view for having a plural pixel sharing structure with the single signal readout circuit shared by a plurality of the light receiving elements, wherein the micro lens having the maximum film thickness position different from the central position is provided such that the focus position of the micro lens with respect to a parallel ray is on the light receiving element.
摘要翻译： 本发明的主要目的是提供一种在平面图中当光接收元件的中心位置和微透镜的中心位置不一致时能够有效地收集光束的固态图像传感器 由于多个像素共享结构。 为了实现该目的，本发明提供一种固态图像传感器，至少包括：用于接收被摄体光以转换为光信号的光接收元件; 用于提高对光接收元件的光收集率的微透镜; 以及用于读取从光接收元件产生的光信号的信号读出电路，使得在具有多个像素的平面图中，光接收元件的中心位置和微透镜的中心位置彼此不一致 具有由多个光接收元件共享的单信号读出电路的共享结构，其中具有与中心位置不同的最大膜厚度位置的微透镜设置成使得微透镜相对于平行光线的聚焦位置 在光接收元件上。
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6.发明授权Phase mask for forming diffraction grating, and optical fiber and optical waveguide having diffraction grating duplicated using the phase mask 有权用于形成衍射光栅的相位掩模，以及具有使用相位掩模复制的衍射光栅的光纤和光波导公开(公告)号：US06876792B2
公开(公告)日：2005-04-05
申请号：US10421634
申请日：2003-04-21
CPC分类号： G02B5/1857 , G02B6/02085 , G02B6/02138 , G03F1/34
摘要： The present invention relates to a precision phase mask for forming diffraction grating in optical fiber and optical waveguide, to provide them with nonlinear chirped grating for dispersion compensation use and having low fluctuation or crosstalk in the group delay characteristics. The diffraction grating is formed by means of interference fringe between diffracted lights of different orders, in which the cycle of the diffraction grating 20 increases nonlinearly, wherein plurality of diffraction gratings G1, G2, G3 . . . having different cycles are assembled on a plane in increasing order of the cycle with the directions of the diffraction gratings directed to the same direction, and assembled in such a manner that, where the cycle of grating changes nonlinearly and discontinuously, the regions having larger rate of change of the cycle contain proportionally more discontinuous phases per unit length.
摘要翻译： 本发明涉及用于在光纤和光波导中形成衍射光栅的精密相位掩模，为它们提供用于色散补偿使用的非线性啁啾光栅，并且在群延迟特性中具有低波动或串扰。 衍射光栅通过不同阶衍射光之间的干涉条纹形成，其中衍射光栅20的周期非线性地增加，其中多个衍射光栅G1，G2，G3。 。 。 具有不同周期的循环以循环的递增顺序组装在平面上，其中衍射光栅的方向指向相同的方向，并以这样的方式组装，使得在光栅的周期非线性和不连续地变化的情况下，具有较大速率的区域 周期的变化包含每单位长度成比例地更多的不连续相。
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7.发明授权公开(公告)号：US06214495B1
公开(公告)日：2001-04-10
申请号：US09254086
申请日：1999-04-13
申请人： Toshikazu Segawa , Masaaki Kurihara
发明人： Toshikazu Segawa , Masaaki Kurihara
IPC分类号： G03F900
CPC分类号： G03F1/34 , G02B6/02138 , G03F7/001
摘要： The invention relates to an optical fiber-processing phase mask which enables a phase mask with a groove pitch varying in a position-dependent manner to be easily obtained by electron beam writing, and its fabrication method. In the optical fiber-processing phase mask comprising on one surface of a transparent substrate a repetitive pattern of grooves (26) and strips (27) located in a grating form, so that an optical fiber is irradiated with diffracted light according to the repetitive pattern to make a diffraction grating in said optical fiber by an interference fringe of diffracted light of different orders, a plurality of patterns (A1 to A3) having a linearly or nonlinearly increasing or decreasing pitch are juxtaposed, with a constant width ratio between the grooves (26) and the strips (27). The phase mask is fabricated by carrying out writing while the groove-and-strip patterns with a different pitch are juxtaposed.
摘要翻译： 本发明涉及一种能够通过电子束写入容易地获得具有以位置相关方式变化的槽间距的相位掩模及其制造方法的光纤加工相位掩模。 在光纤加工相位掩模中，在透明基板的一个表面上形成重复图案的凹槽（26）和位于光栅形状的条带（27），使得根据重复图案向衍射光照射光纤 为了通过不同阶数的衍射光的干涉条纹在所述光纤中形成衍射光栅，将具有线性或非线性增加或减小间距的多个图案（A1至A3）并置，并且凹槽之间具有恒定的宽度比（ 26）和条带（27）。 通过执行写入来制造相位掩模，而具有不同间距的凹槽和带状图案并置。
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8.发明授权Production method of a phase shift photomask having a phase shift layer comprising SOG 失效具有包括SOG的相移层的相移光掩模的制造方法
公开(公告)号：US5882825A
公开(公告)日：1999-03-16
申请号：US695024
申请日：1996-08-09
申请人： Masaaki Kurihara
发明人： Masaaki Kurihara
CPC分类号： G03F1/30
摘要： The present invention is directed to a method of producing a phase shift photomask having a shifter pattern comprising SOG having a transmittance high-enough to be usable with ultraviolet radaition such as KrF (of 248 nm wavelength) used for transfer onto wafers by forming an acid generator-containing SOG directly into plate to form an SOG shifter pattern. This production method at least comprises steps of coating an acid generator-containing SOG on a photomask substrate, selectively irradiating the thus coated SOG layer with ionizing radiation, and developing the SOG layer with a suitable solvent to form a shifter pattern comprising said SOG, and further includes a step of irradiating the overall surface of the thus formed SOG shifter pattern with ultraviolet radiation and/or heating the thus formed SOG shifter pattern at a high temperature to decompose a photosensitive group absorbing ultraviolet radiation, thereby making the SOG layer transparent to ultraviolet radiation used to transfer said SOG layer onto a wafer.
摘要翻译： 本发明涉及一种具有移相光掩模的方法，该移相光掩模具有包含SOG的移动器图案，其具有足够高的透射率，可用于紫外线辐射，例如KrF（波长248nm）用于通过形成酸而转移到晶片上 发生器SOG直接进入板形成SOG移位器模式。 该制造方法至少包括在光掩模基板上涂布含酸产生剂的SOG的步骤，用电离辐射选择性地照射如此涂覆的SOG层，并用合适的溶剂显影SOG层以形成包含所述SOG的移动器图案，以及 进一步包括用紫外线照射这样形成的SOG移位器图案的整个表面和/或在高温下加热由此形成的SOG移位器图案以分解吸收紫外线辐射的感光体的步骤，从而使SOG层对紫外线透明 用于将所述SOG层转移到晶片上的辐射。
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公开(公告)号：US07884397B2
公开(公告)日：2011-02-08
申请号：US11527032
申请日：2006-09-26
申请人： Masaaki Kurihara , Makoto Abe , Katsutoshi Suzuki
发明人： Masaaki Kurihara , Makoto Abe , Katsutoshi Suzuki
IPC分类号： H01L27/148
CPC分类号： H01L27/14627 , H01L27/14685
摘要： A main object of the present invention is to provide a solid-state image sensor capable of efficiently collecting a light beam when the central position of the light receiving element and the central position of the micro lens do not coincide with each other in the plan view owing to a plural pixel sharing structure. To achieve the object, the present invention provides a solid-state image sensor comprising at least: a light receiving element for receiving a subject light to convert into a light signal; a micro lens for improving the light collecting rate to the light receiving element; and a signal readout circuit for reading a light signal generated from the light receiving element, such that the central position of the light receiving element and the central position of the micro lens do not coincide with each other in the plan view for having a plural pixel sharing structure with the single signal readout circuit shared by a plurality of the light receiving elements, wherein the micro lens having the maximum film thickness position different from the central position is provided such that the focus position of the micro lens with respect to a parallel ray is on the light receiving element.
摘要翻译： 本发明的主要目的是提供一种当平面图中的光接收元件的中心位置和微透镜的中心位置不一致时能够有效地收集光束的固态图像传感器 由于多个像素共享结构。 为了实现该目的，本发明提供一种固态图像传感器，至少包括：用于接收被摄体光以转换为光信号的光接收元件; 用于提高对光接收元件的光收集率的微透镜; 以及用于读取从光接收元件产生的光信号的信号读出电路，使得在具有多个像素的平面图中，光接收元件的中心位置和微透镜的中心位置彼此不一致 具有由多个光接收元件共享的单信号读出电路的共享结构，其中具有与中心位置不同的最大膜厚度位置的微透镜设置成使得微透镜相对于平行光线的聚焦位置 在光接收元件上。
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10.发明授权Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a Bragg grating, and dispersion compensating device using the optical fiber 有权用于制造光纤加工的相位掩模，光纤加工相位掩模，具有布拉格光栅的光纤以及使用光纤的色散补偿装置的方法公开(公告)号：US07153613B2
公开(公告)日：2006-12-26
申请号：US10234452
申请日：2002-09-03
IPC分类号： G01F9/00
摘要： The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves.
摘要翻译： 本发明涉及一种制造光纤加工相位掩模的方法，该掩模在掩模上的间距变化和缝合误差方面减少，并且提供了一种制造啁啾型光纤加工相位掩模的方法，其中 设置在石英衬底的一个表面中的光栅形式的槽被配置为光纤处理光栅图案。 在曝光步骤中，使用通过布置和编译重复的凹槽和带状图案的多个数据而获得的数据，同时重复的间距被调制，并且在相位掩模空白上提供电子束抗蚀剂，使得写入 在所述相位掩模坯料上的整个写入区域上沿与所述光栅形式的凹槽在垂直方向上连续进行。
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