中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

12 records (took 0.011 seconds)

    Organic light emitting diode display device having metal enclosing wall
    4.
    发明授权
    Organic light emitting diode display device having metal enclosing wall 有权
    具有金属封闭壁的有机发光二极管显示装置

    公开(公告)号：US09246128B2

    公开(公告)日：2016-01-26

    申请号：US14165617

    申请日：2014-01-28

    Applicant: Innolux Corporation

    Inventor： Chi-Che Tsai ,  Po-Ching Lin ,  Wei-Yen Wu ,  Hui-Chen Hsu

    IPC: H01L29/08 ,  H01L35/24 ,  H01L51/00 ,  H01L51/52

    CPC classification number: H01L51/5259 ,  H01L51/5246

    Abstract: An organic light emitting diode display device and a manufacturing method thereof are provided. The organic light emitting diode display device includes a first flexible substrate, a second flexible substrate, a first barrier layer, a second barrier layer, an organic light emitting diode element, and a metal enclosing wall. The first barrier layer is disposed on the first flexible substrate, and the second barrier layer is disposed on the second flexible substrate. The organic light emitting diode element is disposed between the first barrier layer and the second barrier layer. The metal enclosing wall connects the first flexible substrate to the second flexible substrate and surrounds the organic light emitting diode element.

    Abstract translation: 提供一种有机发光二极管显示装置及其制造方法。 有机发光二极管显示装置包括第一柔性基板，第二柔性基板，第一阻挡层，第二阻挡层，有机发光二极管元件和金属封闭壁。 第一阻挡层设置在第一柔性基板上，第二阻挡层设置在第二柔性基板上。 有机发光二极管元件设置在第一阻挡层和第二阻挡层之间。 金属封闭壁将第一柔性基板连接到第二柔性基板并且围绕有机发光二极管元件。

    High-frequency electronic device and manufacturing method thereof
    5.
    发明授权
    High-frequency electronic device and manufacturing method thereof 有权

    公开(公告)号：US10709012B2

    公开(公告)日：2020-07-07

    申请号：US15858004

    申请日：2017-12-29

    Applicant: Innolux Corporation

    Inventor： Yan-Syun Wang ,  Chi-Che Tsai ,  Wei-Yen Wu ,  I-Yin Li

    IPC: H05K1/02 ,  H05K3/10 ,  H01P3/08 ,  H05K3/22

    Abstract: A high-frequency electronic device including a dielectric substrate, a first patterned metal layer and a second patterned metal layer is provided. The dielectric substrate has a first region and a second region. The first patterned metal layer is disposed on a first side of the dielectric substrate and corresponds to the first region, wherein the first region and the second region have different etching rates with respect to an etching solution. The second patterned metal layer is disposed on the first side or a second side opposite to the first side of the dielectric substrate.

    Display device
    7.
    发明授权
    Display device 有权

    公开(公告)号：US09768414B2

    公开(公告)日：2017-09-19

    申请号：US15079263

    申请日：2016-03-24

    Applicant: Innolux Corporation

    Inventor： Chi-Che Tsai ,  Po-Ching Lin ,  Wei-Yen Wu ,  Hui-Chen Hsu

    IPC: H01L51/52 ,  H01L27/32

    CPC classification number: H01L51/5253 ,  H01L27/3244 ,  H01L51/5243 ,  H01L51/5246 ,  H01L2251/301

    Abstract: A display device is provided. The display device includes a first substrate, a first barrier layer disposed on the first substrate, a second substrate, a second barrier layer disposed on the second substrate, an display medium disposed between the first barrier layer and the second barrier layer, and a metal enclosing wall connecting the first substrate to the second substrate and surrounding the display medium. The metal enclosing wall includes a first metal layer having a first opening and connected to the first substrate, a second metal layer connected to the second substrate, and a third metal layer formed between the first metal layer and the second metal layer.

    Etching solution and manufacturing method of display
    8.
    发明授权
    Etching solution and manufacturing method of display 有权

    公开(公告)号：US10125316B2

    公开(公告)日：2018-11-13

    申请号：US15813290

    申请日：2017-11-15

    Applicant: Innolux Corporation

    Inventor： Po-Yun Hsu ,  Chi-Che Tsai ,  Ker-Yih Kao

    IPC: C09K13/06 ,  H01L21/3213 ,  C23F1/26 ,  C23F1/18

    Abstract: An etching solution and a manufacturing method of a display are provided. The etching solution includes hydrogen peroxide (H2O2), succinic acid, malonic acid, acetic acid, sulfuric acid, 1-amino-2-propanol, 5-amino-1H-tetrazole, N,N,N′N′-tetrakis(2-hydroxypropyl) ethylenediamine (EDTP) and glycine homogenously mixed in deionized water. Hydrogen peroxide is in an amount of 5-10 wt % of the etching solution, succinic acid is in an amount of 0.5-10 wt % of the etching solution, malonic acid is in an amount of 0.5-10 wt % of the etching solution, acetic acid is in an amount of 1-10 wt % of the etching solution, sulfuric acid is in an amount of 0.5-5 wt % of the etching solution, 1-amino-2-propanol is in an amount of 1-20 wt % of the etching solution, 5-amino-1H-tetrazole is in an amount of 0.01-0.5 wt % of the etching solution, EDTP is in an amount of 1-15 wt % of the etching solution, and glycine is in an amount of 1-5 wt % of the etching solution.

    ETCHING SOLUTION AND MANUFACTURING METHOD OF DISPLAY
    9.
    发明申请
    ETCHING SOLUTION AND MANUFACTURING METHOD OF DISPLAY 审中-公开

    公开(公告)号：US20180171227A1

    公开(公告)日：2018-06-21

    申请号：US15813290

    申请日：2017-11-15

    Applicant: Innolux Corporation

    Inventor： Po-Yun Hsu ,  Chi-Che Tsai ,  Ker-Yih Kao

    IPC: C09K13/06 ,  C23F1/18 ,  C23F1/26 ,  H01L21/3213

    CPC classification number: C09K13/06 ,  C23F1/18 ,  C23F1/26 ,  H01L21/32134

    Abstract: An etching solution and a manufacturing method of a display are provided. The etching solution includes hydrogen peroxide (H2O2), succinic acid, malonic acid, acetic acid, sulfuric acid, 1-amino-2-propanol, 5-amino-1H-tetrazole, N,N,N′N′-tetrakis(2-hydroxypropyl) ethylenediamine (EDTP) and glycine homogenously mixed in deionized water. Hydrogen peroxide is in an amount of 5-10 wt % of the etching solution, succinic acid is in an amount of 0.5-10 wt % of the etching solution, malonic acid is in an amount of 0.5-10 wt % of the etching solution, acetic acid is in an amount of 1-10 wt % of the etching solution, sulfuric acid is in an amount of 0.5-5 wt % of the etching solution, 1-amino-2-propanol is in an amount of 1-20 wt % of the etching solution, 5-amino-1H-tetrazole is in an amount of 0.01-0.5 wt % of the etching solution, EDTP is in an amount of 1-15 wt % of the etching solution, and glycine is in an amount of 1-5 wt % of the etching solution.

    Display Device
    10.
    发明申请
    Display Device 有权
    显示设备

    公开(公告)号：US20160204380A1

    公开(公告)日：2016-07-14

    申请号：US15079263

    申请日：2016-03-24

    Applicant: Innolux Corporation

    Inventor： Chi-Che Tsai ,  Po-Ching Lin ,  Wei-Yen Wu ,  Hui-Chen Hsu

    IPC: H01L51/52 ,  H01L27/32

    CPC classification number: H01L51/5253 ,  H01L27/3244 ,  H01L51/5243 ,  H01L51/5246 ,  H01L2251/301

    Abstract: A display device is provided. The display device includes a first substrate, a first barrier layer disposed on the first substrate, a second substrate, a second barrier layer disposed on the second substrate, an display medium disposed between the first barrier layer and the second barrier layer, and a metal enclosing wall connecting the first substrate to the second substrate and surrounding the display medium. The metal enclosing wall includes a first metal layer having a first opening and connected to the first substrate, a second metal layer connected to the second substrate, and a third metal layer formed between the first metal layer and the second metal layer.

    Abstract translation: 提供显示装置。 显示装置包括第一基板，设置在第一基板上的第一阻挡层，第二基板，设置在第二基板上的第二阻挡层，设置在第一阻挡层和第二阻挡层之间的显示介质，以及金属 将第一基板连接到第二基板并围绕显示介质的封闭壁。 金属封闭壁包括具有第一开口并连接到第一基板的第一金属层，连接到第二基板的第二金属层和形成在第一金属层和第二金属层之间的第三金属层。

Patent Agency Ranking