Electrostatic Control of Magnetic Devices
    2.
    发明申请
    Electrostatic Control of Magnetic Devices 有权
    磁性器件静电控制

    公开(公告)号:US20140145278A1

    公开(公告)日:2014-05-29

    申请号:US13688592

    申请日:2012-11-29

    IPC分类号: H01L43/02

    摘要: A magnetic device includes a first electrode portion, a free layer portion arranged on the first electrode portion, the free layer portion including a magnetic insulating material, a reference layer portion contacting the free layer portion, the reference layer portion including a magnetic metallic layer, and a second electrode portion arranged on the reference layer portion.

    摘要翻译: 磁性装置包括第一电极部分,布置在第一电极部分上的自由层部分,自由层部分包括磁性绝缘材料,与自由层部分接触的参考层部分,包括磁性金属层的参考层部分, 以及布置在参考层部分上的第二电极部分。

    Electrostatic control of magnetic devices
    6.
    发明授权
    Electrostatic control of magnetic devices 有权
    磁性装置的静电控制

    公开(公告)号:US08836058B2

    公开(公告)日:2014-09-16

    申请号:US13688592

    申请日:2012-11-29

    IPC分类号: H01L29/82 H01L43/02

    摘要: A magnetic device includes a first electrode portion, a free layer portion arranged on the first electrode portion, the free layer portion including a magnetic insulating material, a reference layer portion contacting the free layer portion, the reference layer portion including a magnetic metallic layer, and a second electrode portion arranged on the reference layer portion.

    摘要翻译: 磁性装置包括第一电极部分,布置在第一电极部分上的自由层部分,自由层部分包括磁性绝缘材料,与自由层部分接触的参考层部分,包括磁性金属层的参考层部分, 以及布置在参考层部分上的第二电极部分。

    THIN FILM DEPOSITION AND LOGIC DEVICE
    8.
    发明申请
    THIN FILM DEPOSITION AND LOGIC DEVICE 审中-公开
    薄膜沉积和逻辑器件

    公开(公告)号:US20140151770A1

    公开(公告)日:2014-06-05

    申请号:US13689857

    申请日:2012-11-30

    IPC分类号: H01L29/82 H01L43/12

    摘要: A method for depositing a material on a graphene layer includes arranging a graphene layer having an exposed substantially planar surface proximate to a magnetron assembly that is operative to emit a plasma plume substantially along a first line, wherein the exposed planar surface of the graphene layer is arranged at an angle that is non-orthogonal to the first line where the first line intersects the exposed planar surface; and emitting the plasma plume from the magnetron assembly such that a layer of deposition material is disposed on the graphene layer without appreciably damaging the graphene layer.

    摘要翻译: 用于在石墨烯层上沉积材料的方法包括布置石墨烯层,所述石墨烯层具有接近于磁控管组件的暴露的基本上平坦的表面,所述磁控管组件可操作地基本上沿着第一线发射等离子体羽流,其中所述石墨烯层的暴露的平坦表面是 以与第一线与暴露的平坦表面相交的第一线非正交的角度布置; 并且从磁控管组件发射等离子体羽流,使得沉积材料层设置在石墨烯层上,而不会明显损坏石墨烯层。