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    Laser thermal processing chuck with a thermal compensating heater module
    1.
    发明申请
    Laser thermal processing chuck with a thermal compensating heater module 有权
    激光热处理卡盘配有热​​补偿加热器模块

    公开(公告)号：US20070004232A1

    公开(公告)日：2007-01-04

    申请号：US11002043

    申请日：2004-12-01

    申请人： Iqbal Shareef ,  Igor Landau ,  David Markle ,  Somit Talwar ,  Michael Thompson ,  Ivelin Angelov ,  Senquan Zhou

    发明人： Iqbal Shareef ,  Igor Landau ,  David Markle ,  Somit Talwar ,  Michael Thompson ,  Ivelin Angelov ,  Senquan Zhou

    IPC分类号： C23C16/00

    CPC分类号： H01L21/67109 ,  B23K26/10 ,  B23K26/702 ,  B23K26/703 ,  H01L2924/0002 ,  H01L2924/00

    摘要： Chuck methods and apparatus for supporting a semiconductor substrate and maintaining it at a substantially constant background temperature even when subject to a spatially and temporally varying thermal load. Chuck includes a thermal compensating heater module having a sealed chamber containing heater elements, a wick, and an alkali metal liquid/vapor. The chamber employs heat pipe principles to equalize temperature differences in the module. The spatially varying thermal load is quickly made uniform by thermal conductivity of the heater module. Heatsinking a constant amount of heat from the bottom of the heater module accommodates large temporal variations in the thermal heat load. Constant heat loss is preferably made to be at least as large as the maximum variation in the input heat load, less heat lost through radiation and convection, thus requiring a heat input through electrical heating elements. This allows for temperature control of the chuck, and hence the substrate.

    摘要翻译： 用于支撑半导体衬底并将其保持在基本上恒定的背景温度的Chuck方法和装置，即使在经受空间和时间变化的热负载时。 卡盘包括一个热补偿加热器模块，其具有包含加热元件，芯和碱金属液体/蒸气的密封腔。 该室采用热管原理来均衡模块中的温差。 空间变化的热负荷通过加热器模块的热导率快速地均匀。 从加热器模块的底部散热恒定的热量可以适应热负荷的大的时间变化。 恒定的热损失优选地至少与输入热负荷的最大变化一样大，通过辐射和对流损失的热量较少，因此需要通过电加热元件的热​​输入。 这允许卡盘的温度控制，从而允许基板的温度控制。

    Heated chuck for laser thermal processing
    2.
    发明申请
    Heated chuck for laser thermal processing 有权
    加热卡盘用于激光热处理

    公开(公告)号：US20060113290A1

    公开(公告)日：2006-06-01

    申请号：US11001954

    申请日：2004-12-01

    申请人： Iqbal Shareef ,  Igor Landau ,  David Markle ,  Somit Talwar ,  Michael Thompson ,  Ivelin Angelov ,  Senquan Zhou

    发明人： Iqbal Shareef ,  Igor Landau ,  David Markle ,  Somit Talwar ,  Michael Thompson ,  Ivelin Angelov ,  Senquan Zhou

    IPC分类号： B23K26/00 ,  B23K26/02

    CPC分类号： B23K26/703

    摘要： A chuck for supporting a wafer and maintaining a constant background temperature across the wafer during laser thermal processing (LTP) is disclosed. The chuck includes a heat sink and a thermal mass in the form of a heater module. The heater module is in thermal communication with the heat sink, but is physically separated therefrom by a thermal insulator layer. The thermal insulator maintains a substantially constant power loss at least equal to the maximum power delivered by the laser, less that lost by radiation and convection. A top plate is arranged atop the heater module, supports the wafer to be processed, and provides a contamination barrier. The heater module is coupled to a power supply that is adapted to provide varying amounts of power to the heater module to maintain the heater module at the constant background temperature even when the wafer experiences a spatially and temporally varying heat load from an LTP laser beam. Thus, heat from the laser is transferred from the wafer to the heat sink via the heater module and the insulator layer. In the absence of any laser heating, heat is also transferred from the heater module to the wafer as needed to maintain the constant background temperature.

    摘要翻译： 公开了一种用于在激光热处理（LTP）期间支撑晶片并在晶片上保持恒定的背景温度的卡盘。 卡盘包括散热器和加热器模块形式的热质量。 加热器模块与散热器热连通，但是通过绝热层在物理上与其分离。 热绝缘体保持至少等于由激光器传递的最大功率的基本恒定的功率损耗，而不是由辐射和对流损失。 顶板布置在加热器模块的顶部，支撑要处理的晶片，并提供污染屏障。 加热器模块耦合到电源，其适于向加热器模块提供变化量的功率，以将加热器模块保持在恒定的背景温度，即使当晶片经历来自LTP激光束的空间上和时间上变化的热负载时。 因此，来自激光器的热量通过加热器模块和绝缘体层从晶片传递到散热器。 在没有激光加热的情况下，根据需要也从加热器模块转移到晶片以保持恒定的背景温度。

    Laser thermal annealing of lightly doped silicon substrates
    3.
    发明申请
    Laser thermal annealing of lightly doped silicon substrates 有权
    轻掺杂硅衬底的激光热退火

    公开(公告)号：US20050067384A1

    公开(公告)日：2005-03-31

    申请号：US10674106

    申请日：2003-09-29

    申请人： Somit Talwar ,  Michael Thompson ,  Boris Grek ,  David Markle

    发明人： Somit Talwar ,  Michael Thompson ,  Boris Grek ,  David Markle

    IPC分类号： B23K26/06 ,  B23K26/42 ,  H01L21/20 ,  H01L21/268 ,  B23K26/00 ,  H01L21/336 ,  H01L21/477 ,  H01L21/26

    CPC分类号： H01L21/268 ,  B23K26/0604 ,  B23K26/0608 ,  B23K26/60 ,  H01L21/2026

    摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.

    摘要翻译： 使用在室温基本上不吸收衬底的退火辐射束来进行衬底的激光热退火（LTA）的设备和方法。 该方法利用了在一些衬底（例如未掺杂的硅衬底）中吸收长波长辐射（1微米或更大）的吸收是温度的强函数的事实。 该方法包括将衬底加热到​​长波长退火辐射的吸收显着的临界温度，然后用退火辐射照射衬底以产生能够退火衬底的温度。

    Laser thermal annealing of lightly doped silicon substrates
    6.
    发明申请
    Laser thermal annealing of lightly doped silicon substrates 有权

    公开(公告)号：US20060252282A1

    公开(公告)日：2006-11-09

    申请号：US11481458

    申请日：2006-07-06

    申请人： Somit Talwar ,  David Markle

    发明人： Somit Talwar ,  David Markle

    IPC分类号： H01L21/00

    CPC分类号： H01L21/268 ,  B23K26/0604 ,  B23K26/0608 ,  B23K26/60 ,  B23K2101/40 ,  H01L21/2026

    摘要： Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of long-wavelength annealing radiation is substantial, and then irradiating the substrate with the annealing radiation to generate a temperature capable of annealing the substrate.

    Laser thermal processing with laser diode radiation
    7.
    发明申请
    Laser thermal processing with laser diode radiation 审中-公开
    激光二极管辐射激光热处理

    公开(公告)号：US20050189329A1

    公开(公告)日：2005-09-01

    申请号：US10838076

    申请日：2004-05-03

    申请人： Somit Talwar ,  David Markle

    发明人： Somit Talwar ,  David Markle

    IPC分类号： B23K26/00 ,  B23K26/06 ,  B23K26/067 ,  B23K26/073 ,  B23K26/08 ,  G03B20060101 ,  H01L21/20 ,  H01L21/268

    CPC分类号： B23K26/0608 ,  B23K26/0604 ,  B23K26/067 ,  B23K26/073 ,  B23K26/0853 ,  B23K2101/40 ,  H01L21/268

    摘要： A method and apparatus for performing laser thermal processing (LTP) using one or more two-dimensional arrays of laser diodes and corresponding one or more LTP optical systems to form corresponding one or more line images. The line images are scanned across a substrate, e.g., by moving the substrate relative to the one or more line images. The apparatus also includes one or more recycling optical systems arranged to re-image reflected annealing radiation back onto the substrate. The use of one or more recycling optical systems greatly improves the heating efficiency and uniformity during LTP.

    摘要翻译： 一种使用一个或多个激光二极管阵列和对应的一个或多个LTP光学系统进行激光热处理（LTP）的方法和装置，以形成对应的一个或多个线图像。 线图像跨基板扫描，例如通过相对于一个或多个线图像移动基板。 该装置还包括一个或多个再循环光学系统，其布置成将反射的退火辐射重新映射回衬底上。 使用一个或多个再循环光学系统大大提高了LTP期间的加热效率和均匀性。

    Laser thermal processing with laser diode radiation
    8.
    发明申请
    Laser thermal processing with laser diode radiation 有权
    激光二极管辐射激光热处理

    公开(公告)号：US20050045604A1

    公开(公告)日：2005-03-03

    申请号：US10653625

    申请日：2003-09-02

    申请人： Somit Talwar ,  David Markle

    发明人： Somit Talwar ,  David Markle

    IPC分类号： B23K26/00 ,  B23K26/06 ,  B23K26/073 ,  G03B20060101 ,  H01L21/20

    CPC分类号： B23K26/0604 ,  B23K26/073 ,  B23K2101/40

    摘要： A method and apparatus for performing laser thermal processing (LTP) using a two-dimensional array of laser diodes to form a line image, which is scanned across a substrate. The apparatus includes a two-dimensional array of laser diodes, the radiation from which is collimated in one plane using a cylindrical lens array, and imaged onto the substrate as a line image using an anomorphic, telecentric optical imaging system. The apparatus also includes a scanning substrate stage for supporting a substrate to be LTP processed. The laser diode radiation beam is incident on the substrate at angles at or near the Brewster's angle for the given substrate material and the wavelength of the radiation beam, which is linearly P-polarized. The use of a two-dimensional laser diode array allows for a polarized radiation beam of relatively high energy density to be delivered to the substrate, thereby allowing for LTP processing with good uniformity, reasonably short dwell times, and thus reasonably high throughput.

    摘要翻译： 一种使用激光二极管的二维阵列进行激光热处理（LTP）的方法和装置，以形成跨越衬底扫描的线像。 该装置包括激光二极管的二维阵列，使用柱面透镜阵列在一个平面中准直的辐射，并使用异常远心光学成像系统作为线图像成像到基板上。 该装置还包括用于支撑待处理LTP的衬底的扫描衬底台。 对于给定的衬底材料，激光二极管辐射束以布鲁斯特角度或附近的角度入射到衬底上，并且是线性P偏振的辐射束的波长。 使用二维激光二极管阵列允许将相对较高能量密度的偏振辐射束输送到衬底，从而允许具有良好均匀性，合理短暂停留时间以及因此合理高的通量的LTP处理。

    Methods and apparatus for truncating an image formed with coherent radiation
    10.
    发明申请
    Methods and apparatus for truncating an image formed with coherent radiation 有权
    用于截断用相干辐射形成的图像的方法和装置

    公开(公告)号：US20060163223A1

    公开(公告)日：2006-07-27

    申请号：US11040739

    申请日：2005-01-21

    申请人： Shiyu Zhang ,  Igor Landau ,  Arnold Lungershausen ,  David Markle ,  Casey Donaher

    发明人： Shiyu Zhang ,  Igor Landau ,  Arnold Lungershausen ,  David Markle ,  Casey Donaher

    IPC分类号： B23K26/06

    CPC分类号： B23K26/0738 ,  B23K26/066 ,  B23K26/082 ,  B23K2101/40

    摘要： Methods and apparatus for truncating an image formed with coherent radiation. The optical relay system is adapted to form a line image at the image plane. The image is truncated by a variable aperture at or near the aperture plane conjugate to the image plane, to block progressively increasing portions of an incident coherent radiation beam used to form the line image. An apodizing pupil filter having a maximum transmission or reflection in the center and a transmission or reflection profile that varies with direction corresponding to long direction of the line image is provided in the pupil plane. The apodization is designed to prevent hot-spots from forming in the truncated image and ensures a relatively smooth, flat intensity profile. Thus, one end or another of a coherent line image scanned over a substrate can be truncated during scanning without substantially changing the image intensity extending into the product area.

    摘要翻译： 用于截断用相干辐射形成的图像的方法和装置。 光学继电器系统适于在图像平面处形成线图像。 图像被与图像平面共轭的孔径平面处或附近的可变孔截断，以阻止逐渐增加用于形成线图像的入射相干辐射束的部分。 在瞳孔平面中设置有在中心具有最大透射或反射的变迹瞳孔滤光器以及与线图像的长方向相对应的方向变化的透射或反射图。 该变迹被设计成防止在截断图像中形成热点并确保相对光滑，平坦的强度分布。 因此，在扫描期间扫描的相干线图像的一端或另一端可以在扫描期间被截断，而基本上不改变延伸到产品区域中的图像强度。