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    (AZA)INDOLIZINE DERIVATIVE AND PHARMACEUTICAL USE THEREOF
    3.
    发明申请
    (AZA)INDOLIZINE DERIVATIVE AND PHARMACEUTICAL USE THEREOF 有权
    （AZA）吲哚衍生物及其药物用途

    公开(公告)号：US20130217878A1

    公开(公告)日：2013-08-22

    申请号：US13824147

    申请日：2011-09-28

    申请人： Masato Iizuka ,  Kazuo Shimizu

    发明人： Masato Iizuka ,  Kazuo Shimizu

    IPC分类号： C07D487/04 ,  C07D471/04

    CPC分类号： C07D487/04 ,  C07D471/04

    摘要： (Aza)indolizine derivatives represented by Formula (I) having xanthine oxidase inhibitory activities and useful as agents for the prevention or treatment of a disease associated with abnormality of serum uric acid level, prodrugs thereof, salts thereof or the like. In Formula (I), 0 to 2 of X1, X2, X3 and X4 are a nitrogen atom and the others are CR1; one of T1 and T2 represents cyano and the other represents a group represented by Formula (A), with the proviso that when T1 is cyano, at least one of X1 to X4 is a nitrogen atom; R1 independently represents a hydrogen atom, a halogen atom, a hydroxy group, C1-6 alkyl, C1-6 alkoxy or the like; ring U represents a benzene ring or the like; m represents integral number from 0 to 2; R2 independently represents a fluorine atom, a hydroxy group or the like.

    摘要翻译： 具有黄嘌呤氧化酶抑制活性的式（I）表示的（Aza）中氮茚衍生物，可用作预防或治疗与血清尿酸水平异常相关的疾病，其前药，其盐等的药剂。 在式（I）中，X 1，X 2，X 3和X 4的0〜2为氮原子，其余为CR 1; T1和T2之一表示氰基，另一个表示由式（A）表示的基团，条件是当T1为氰基时，X 1至X 4中的至少一个为氮原子; R1独立地表示氢原子，卤素原子，羟基，C1-6烷基，C1-6烷氧基等; 环U表示苯环等; m表示0〜2的整数; R2独立地表示氟原子，羟基等。

    FUSED HETEROCYCLIC DERIVATIVE AND USE THEREOF FOR MEDICAL PURPOSES
    5.
    发明申请
    FUSED HETEROCYCLIC DERIVATIVE AND USE THEREOF FOR MEDICAL PURPOSES 审中-公开
    熔融杂环衍生物及其用于医疗用途的方法

    公开(公告)号：US20110201815A1

    公开(公告)日：2011-08-18

    申请号：US13124336

    申请日：2009-10-14

    申请人： Kazuo Shimizu ,  Masato Iizuka ,  Hideki Fujikura ,  Yasushi Takigawa ,  Masahiro Hiratochi

    发明人： Kazuo Shimizu ,  Masato Iizuka ,  Hideki Fujikura ,  Yasushi Takigawa ,  Masahiro Hiratochi

    IPC分类号： C07D401/10 ,  C07D417/10

    CPC分类号： C07D401/04 ,  A61K31/427 ,  A61K31/443 ,  A61K31/4439 ,  C07D405/04 ,  C07D417/04

    摘要： The present invention provides compounds useful as agents for the prevention or treatment of a disease associated with abnormal plasma uric acid level and the like. The present invention relates to fused heterocyclic derivatives represented by the following formula (I) having xanthine oxidase inhibitory activities and useful as agents for the prevention or treatment of a disease associated with abnormality of plasma uric acid level, prodrugs thereof, salts thereof or the like. In the formula (I), T represents trifluoromethyl, nitro or cyano; ring Q represents heteroaryl; X1 and X2 independently represent CH or N; ring U represents aryl or heteroaryl; m represents integral number from 0 to 2; n represents integral number from 0 to 3; R1 represents a hydroxy group, amino or C1-6 alkyl; R2 represents C1-6 alkyl, C1-6 alkoxy C1-6 alkyl or the like.

    摘要翻译： 本发明提供了可用作预防或治疗与异常血浆尿酸水平等相关的疾病的药剂的化合物。 本发明涉及具有黄嘌呤氧化酶抑制活性的由下式（I）表示的稠合杂环衍生物，可用作预防或治疗与血浆尿酸水平异常有关的疾病，其前体药物，其盐或类似物 。 在式（I）中，T代表三氟甲基，硝基或氰基; 环Q表示杂芳基; X1和X2独立地表示CH或N; 环U表示芳基或杂芳基; m表示0〜2的整数; n表示0〜3的整数; R1表示羟基，氨基或C1-6烷基; R 2表示C 1-6烷基，C 1-6烷氧基C 1-6烷基等。

    METHOD FOR SEPARATION AND RECOVERY OF NOBLE METALS
    6.
    发明申请
    METHOD FOR SEPARATION AND RECOVERY OF NOBLE METALS 有权
    用于分离和回收贵金属的方法

    公开(公告)号：US20100224029A1

    公开(公告)日：2010-09-09

    申请号：US12160852

    申请日：2007-01-12

    申请人： Kazuhiro Niisawa ,  Kazuo Shimizu ,  Tadashi Nozaki

    发明人： Kazuhiro Niisawa ,  Kazuo Shimizu ,  Tadashi Nozaki

    IPC分类号： C22B11/00

    CPC分类号： C22B11/04 ,  B01D15/1871 ,  B01D15/265 ,  B01D15/426 ,  B01J20/24 ,  B01J2220/4825 ,  C22B3/10 ,  C22B3/24 ,  C22B11/042 ,  C22B11/048 ,  C22B11/06 ,  Y02P10/214 ,  Y02P10/234

    摘要： A method for separation and recovery of noble metals which makes it possible to isolate noble metal components efficiently by easy operation, that is, a method which comprises passing a solution of metals in hydrochloric acid prepared by treating a metal material with hydrochloric acid through the first cellulose column, eluting through development the noble metal component adsorbed on the cellulose with a hydrochloric acid/2-propanone mixture to obtain a fraction containing light platinum-group metals and a fraction containing heavy platinum-group metals and gold, separating the former fraction with the above mixture into fractions containing palladium, ruthenium and rhodium respectively, passing the fraction containing heavy platinum-group metals and gold through the second cellulose column to made them adsorbed on the cellulose, eluting them from the cellulose with a hydrochloric acid/1-butanol mixture to obtain fractions containing gold, osmium, iridium and platinum respectively, and recovering the noble metals from the fractions containing them respectively as simple substances.

    摘要翻译： 贵金属的分离回收方法，能够容易地使贵金属成分有效地分离，也就是将金属溶液中的金属在盐酸中的溶液通过第1次 纤维素柱，通过用盐酸/ 2-丙酮混合物显影吸附在纤维素上的贵金属组分，得到含有轻铂族金属的部分和含有重铂族金属和金的部分，将前一部分与 将上述混合物分别含有含有钯，钌和铑的级分，使含有重铂族金属和金的级分通过第二纤维素柱，使其吸附在纤维素上，用盐酸/ 1-丁醇从纤维素中洗脱出来 混合物以分别得到含有金，锇，铱和铂的级分，a 并从分别含有它们的级分中回收贵金属作为简单物质。

    Benzimidazole derivatives and medical uses thereof
    8.
    发明授权
    Benzimidazole derivatives and medical uses thereof 失效
    苯并咪唑衍生物及其医疗用途

    公开(公告)号：US07547680B2

    公开(公告)日：2009-06-16

    申请号：US11473957

    申请日：2006-06-23

    申请人： Norihiko Kikuchi ,  Yoshinori Nonaka ,  Kazuya Tatani ,  Masahiro Hiratochi ,  Yu Kuramochi ,  Masayuki Isaji ,  Kazuo Shimizu ,  Takashi Miyagi

    发明人： Norihiko Kikuchi ,  Yoshinori Nonaka ,  Kazuya Tatani ,  Masahiro Hiratochi ,  Yu Kuramochi ,  Masayuki Isaji ,  Kazuo Shimizu ,  Takashi Miyagi

    IPC分类号： A01N43/04 ,  A61K31/70

    CPC分类号： C07H19/052

    摘要： The present invention provides benzimidazole derivatives represented by the following formula (I) or pharmaceutically acceptable salts thereof, or prodrugs thereof, which exert an inhibitory activity on sodium-dependent nucleoside transporter 2 and are useful for a disease associated with an abnormality of plasma uric acid level. The compounds of the present invention are useful for the prevention or treatment of gout, hyperuricemia, urinary lithiasis, hyperuricemic nephropathy or the like.In the formula, n is 1 or 2; R1 and R2 are H, a halogen atom, cyano group, optionally substituted alkyl group, optionally substituted aryl group or the like; R3 is H, a halogen atom, optionally substituted alkyl group or the like; R4 and R5 are H, a halogen atom, OH or the like; and R6 and RX are H or OH: RY is F or OH.

    摘要翻译： 本发明提供由下式（I）表示的苯并咪唑衍生物或其药学上可接受的盐或其前药，其对钠依赖性核苷转运蛋白2具有抑制活性，并且可用于与血浆尿酸异常有关的疾病 水平。 本发明的化合物可用于预防或治疗痛风，高尿酸血症，尿结石病，高尿酸性肾病等。 在该式中，n为1或2; R 1和R 2是H，卤素原子，氰基，任选取代的烷基，任选取代的芳基等; R3是H，卤素原子，任选取代的烷基等; R 4和R 5是H，卤素原子，OH等; R6和RX是H或OH：RY是F或OH。

    Polishing apparatus
    9.
    发明授权
    Polishing apparatus 失效
    抛光设备

    公开(公告)号：US07021991B2

    公开(公告)日：2006-04-04

    申请号：US10670499

    申请日：2003-09-26

    申请人： Kazuo Shimizu ,  Shinro Ohta ,  Akihiro Tsukada

    发明人： Kazuo Shimizu ,  Shinro Ohta ,  Akihiro Tsukada

    IPC分类号： B24B49/00

    CPC分类号： B24B37/013 ,  B23H5/08 ,  B24B37/046 ,  B24B49/12 ,  G01B11/0625

    摘要： A polishing apparatus has a polishing table having a polishing surface, a top ring for holding a workpiece to be polished and pressing the workpiece against the polishing surface on the polishing table, and a film thickness measuring device embedded in the polishing table. The film thickness measuring device includes a light source for applying light having a predetermined wavelength to a surface of the workpiece, a spectroscope for separating light reflected from the surface of the workpiece, and a charge coupled device array for capturing light separated by the spectroscope. The polishing apparatus also has a controller operable to analyze information captured by the charge coupled device array over the entire surface of the workpiece to obtain a film thickness at a desired point on the surface of the workpiece.

    摘要翻译： 抛光装置具有：具有研磨面的研磨台，用于保持待研磨的工件的顶环，并将工件压靠在研磨台上的研磨面上，以及嵌入在研磨台中的膜厚测量装置。 膜厚测量装置包括：用于将一个具有预定波长的光施加到工件的表面的光源，用于分离从工件表面反射的光的分光器和用于捕获由分光镜分离的光的电荷耦合器件阵列。 抛光装置还具有控制器，其可操作以分析由电荷耦合器件阵列在工件的整个表面上捕获的信息，以在工件表面上的期望点处获得膜厚度。

    Polishing apparatus
    10.
    发明授权
    Polishing apparatus 有权

    公开(公告)号：US06984164B2

    公开(公告)日：2006-01-10

    申请号：US10864322

    申请日：2004-06-10

    申请人： Norio Kimura ,  Hideji Isobe ,  Kazuo Shimizu ,  Hiroyuki Osawa

    发明人： Norio Kimura ,  Hideji Isobe ,  Kazuo Shimizu ,  Hiroyuki Osawa

    IPC分类号： B24B49/10

    CPC分类号： B24B37/013 ,  B24B49/04 ,  B24B49/10 ,  H01L21/30625

    摘要： A polishing apparatus is used for polishing a substrate such as a semiconductor wafer, and has a sensor capable of continuously detecting the thickness of an electrically conductive layer. The polishing apparatus includes a polishing table having a polishing surface, and a top ring for holding and pressing the substrate against the polishing surface to polish the surface of the substrate. A sensor such as an eddy-current sensor is disposed below the polishing surface of the polishing table for measuring the thickness of a conductive layer formed on the surface of the substrate.