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公开(公告)号：US06875335B2
公开(公告)日：2005-04-05
申请号：US10449515
申请日：2003-06-02
申请人： Yuzo Mori , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Akira Fukunaga , Itsuki Kobata
发明人： Yuzo Mori , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Akira Fukunaga , Itsuki Kobata
摘要： An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
摘要翻译： 将作为工件的阳极和与阳极相对的具有预定间隔的阴极置于超纯水中。 在工件和阴极之间设置促进超纯水的离解并具有透水性的催化材料。 在催化材料内部形成超纯水流，在工件和阴极之间施加电压，将超纯水中的水分子分解为氢离子和氢氧根离子，并将得到的氢氧根离子供给到 从而通过化学溶解反应或由氢氧根离子介导的氧化反应来进行工件的去除处理或氧化膜形成。 因此，可以通过在超纯水中使用氢氧根离子进行清洁处理，在工件的加工表面上不会留下杂质。
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公开(公告)号：US20060289298A1
公开(公告)日：2006-12-28
申请号：US10554594
申请日：2004-04-22
申请人： Itsuki Kobata , Yasushi Toma , Yuzo Mori
发明人： Itsuki Kobata , Yasushi Toma , Yuzo Mori
IPC分类号： C25D17/00
CPC分类号： C25F7/00 , C25F3/00 , H01L21/32115
摘要： The present invention provides an electrolytic processing apparatus which can suppress the growth of a gas, which is inevitably generated during electrochemical processing, into bubbles thereby effectively preventing the formation of pits in a surface of a workpiece. The electrolytic processing apparatus includes an electrode section (44) including processing electrodes (76) and feeding electrodes (78) both having a diameter of not more than 1 mm, a substrate holder (42) for holding a workpiece (W), a power source (46) for applying a voltage between the processing electrodes and the feeding electrodes, a fluid supply section (72) for supplying a fluid between the electrode section and the workpiece, and a drive section (56, 62) for moving the electrode section and the workpiece relative to each other in such a manner that the processing electrodes pass every point in a processing surface of the workpiece.
摘要翻译： 本发明提供一种电解处理装置，其可以将电化学处理中不可避免地产生的气体的生长抑制成气泡，从而有效地防止在工件的表面中形成凹坑。 所述电解处理装置包括具有直径不大于1mm的处理电极和馈电电极（78）的电极部（44），用于保持工件（W）的基板保持架（42） 用于在处理电极和馈电电极之间施加电压的源极（46），用于在电极部分和工件之间提供流体的流体供应部分（72），以及用于使电极部分 以及相对于彼此的工件，使得处理电极通过工件的处理表面中的每个点。
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公开(公告)号：US06368493B1
公开(公告)日：2002-04-09
申请号：US09645405
申请日：2000-08-25
申请人： Yuzo Mori , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Akira Fukunaga , Itsuki Kobata
发明人： Yuzo Mori , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Akira Fukunaga , Itsuki Kobata
IPC分类号： B23H300
摘要： An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
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公开(公告)号：US20050115838A1
公开(公告)日：2005-06-02
申请号：US10500576
申请日：2003-01-07
申请人： Yuzo Mori , Mitsuhiko Shirakashi , Masayuki Kumekawa , Hozumi Yasuda , Itsuki Kobata , Yasushi Toma
发明人： Yuzo Mori , Mitsuhiko Shirakashi , Masayuki Kumekawa , Hozumi Yasuda , Itsuki Kobata , Yasushi Toma
摘要： There is provided an electrolytic processing apparatus and method that can effect processing of a substrate with high processing precision and can produce an intended form of processed substrate with high accuracy of form. The electrolytic processing apparatus includes: a holder (30) for holding a substrate (W); a processing electrode (32) that can come close to the substrate; a feeding electrode (34) for feeding electricity to the substrate; an ion exchanger (40) disposed in the space between the substrate and the processing electrode, or the substrate and the feeding electrode; a fluid supply section (70) for supplying a fluid into the space; a power source (68) for applying a voltage between the processing electrode and the feeding electrode; a drive sections (44, 56 and 60) for allowing the substrate and the processing electrode, facing each other, to make a relative movement; and a numerical controller (72) for effecting a numerical control of the drive sections. ATTACHMENT “B”
摘要翻译： 提供了一种能够以高加工精度对基板进行加工的电解处理装置和方法，并且可以以高精度的形式产生预期形式的处理基板。 电解处理装置包括：用于保持基板（W）的保持器（30）。 可以靠近所述基板的处理电极（32）; 用于向基板供电的供电电极（34）; 设置在基板和处理电极之间的空间中的离子交换器（40），或基板和馈电电极; 用于将流体供应到所述空间中的流体供应部分（70） 用于在所述处理电极和所述馈电电极之间施加电压的电源（68）; 用于允许基板和处理电极彼此面对的驱动部分（44,56和60）进行相对运动; 以及用于对驱动部进行数值控制的数值控制器（72）。 附件“B”
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公开(公告)号：US06743349B2
公开(公告)日：2004-06-01
申请号：US09897913
申请日：2001-07-05
申请人： Yuzo Mori , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata , Takayuki Saito
发明人： Yuzo Mori , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata , Takayuki Saito
IPC分类号： C25F316
摘要： An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure water. The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.
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公开(公告)号：US06602396B2
公开(公告)日：2003-08-05
申请号：US09996674
申请日：2001-11-30
申请人： Yuzo Mori , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Akira Fukunaga , Itsuki Kobata
发明人： Yuzo Mori , Mitsuhiko Shirakashi , Takayuki Saito , Yasushi Toma , Akira Fukunaga , Itsuki Kobata
IPC分类号： B23H300
摘要： An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
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公开(公告)号：US07255778B2
公开(公告)日：2007-08-14
申请号：US10828346
申请日：2004-04-21
申请人： Yuzo Mori , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata , Takayuki Saito
发明人： Yuzo Mori , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata , Takayuki Saito
摘要： An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure water. The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.
摘要翻译： 电化学加工装置包括用于保持超纯水的加工室，浸没在保持在加工室中的超纯水中的阴极/阳极和用于将工件保持在距离阴极/阳极预定距离的工件保持部分， 被加工的工件与超纯水接触。 电化学加工装置还包括阳极/阴极接触件，其与由工件保持部分保持的工件接触，使得工件用作阳极/阴极，具有强碱性阴离子交换功能或强酸性阳离子交换功能的催化剂 用于在阴极/阳极和工件之间施加电压的电源，以及用于相对移动工件和催化剂的移动机构。 催化剂设置在阴极/阳极和被工件保持部分保持的工件之间。
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公开(公告)号：US20050183963A1
公开(公告)日：2005-08-25
申请号：US11076067
申请日：2005-03-10
申请人： Yuzo Mori , Hidekazu Goto , Yasushi Toma
发明人： Yuzo Mori , Hidekazu Goto , Yasushi Toma
摘要： An electrode for electrolytic processing has a conductive material and an organic compound having an ion exchange group. The organic compound is chemically bonded to a surface of the conductive material. The organic compound comprises thiol or disulfide. The ion exchange group comprises at least one of a sulfo group, a carboxyl group, a quaternary ammonium group, and an amino group. The conductive material includes at least one of gold, silver, platinum, copper, gallium arsenide, cadmium sulfide, and indium oxide (III).
摘要翻译： 用于电解处理的电极具有导电材料和具有离子交换基团的有机化合物。 有机化合物化学键合到导电材料的表面。 有机化合物包括硫醇或二硫化物。 离子交换基团包括磺基，羧基，季铵基和氨基中的至少一个。 导电材料包括金，银，铂，铜，砷化镓，硫化镉和氧化铟（III）中的至少一种。
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公开(公告)号：US4960495A
公开(公告)日：1990-10-02
申请号：US211184
申请日：1988-06-24
申请人： Yuzo Mori , Kazuto Yamauchi
发明人： Yuzo Mori , Kazuto Yamauchi
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer of the like on the surface.
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公开(公告)号：US06652658B1
公开(公告)日：2003-11-25
申请号：US09856458
申请日：2001-06-06
申请人： Yuzo Mori , Toshio Ishikawa
发明人： Yuzo Mori , Toshio Ishikawa
IPC分类号： B08B702
CPC分类号： H01L21/67051 , C25D11/32 , C25F1/00 , C25F3/00 , Y10S134/902 , Y10S438/906
摘要： A method for clean processing wherein an object and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amount of hydroxide ions is provided between the processing surface of said workpiece and the distal end of the high pressure nozzle facing said surface, a voltage is applied using the high pressure nozzle as the cathode and the object as the anode and the hydroxide ions produced from the ultra-pure water are supplied to the surface of the object.
摘要翻译： 一种清洁处理方法，其中物体和高压喷嘴在仅含有超纯水，离子交换材料或催化剂材料的洗涤槽内相隔特定距离设置，所述洗涤槽中增加氢氧根离子的量， 所述工件的加工表面和面向所述表面的高压喷嘴的远端，使用高压喷嘴作为阴极和物体作为阳极施加电压，并且从超纯水中提供产生的氢氧根离子 到物体的表面。
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