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    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
    4.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND 有权
    辐射敏感性树脂组合物，聚合物和化合物

    公开(公告)号：US20130216951A1

    公开(公告)日：2013-08-22

    申请号：US13853254

    申请日：2013-03-29

    Applicant: JSR Corporation

    Inventor： Norihiko IKEDA ,  Shin-ichi NAKAMURA

    IPC: G03F7/004

    CPC classification number: G03F7/0397 ,  C08F220/18 ,  C08F224/00 ,  C08L2312/06 ,  C09D133/04 ,  G03F7/004 ,  G03F7/2041

    Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

    Abstract translation: 辐射敏感性树脂组合物包括聚合物，产酸剂和有机溶剂。 聚合物包括衍生自由式（1）表示的化合物的第一结构单元和由式（2）表示的化合物衍生的第二结构单元。 R1表示与构成内酯环的碳原子一起表示具有3〜8个碳原子的环结构的化合价（a + 2）的有机基团。 R2表示氟原子，羟基，碳原子数1〜20的有机基等。

    PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE
    6.
    发明申请
    PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, ACID GENERATING AGENT, AND PHOTODEGRADABLE BASE 有权
    光电组合物，耐光图案形成方法，化合物，酸产生剂和可光控基

    公开(公告)号：US20140363769A1

    公开(公告)日：2014-12-11

    申请号：US14470108

    申请日：2014-08-27

    Applicant: JSR CORPORATION

    Inventor： Hayato NAMAI ,  Kazuo NAKAHARA ,  Norihiko IKEDA

    IPC: G03F7/004 ,  C07D317/70 ,  G03F7/20

    CPC classification number: G03F7/0045 ,  C07D317/70 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

    Abstract: A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1). m is an integer of 2 to 5. R3 and R4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. n is an integer of 0 to 5. At least two of a plurality of R1 s optionally taken together represent a ring structure, together with a plurality of oxygen atoms bonding to R1 and the carbon atom(s) constituting R2 and bonding to these oxygen atoms. M+ represents a monovalent radiation-degradable onium cation.

    Abstract translation: 一种含有具有包含酸不稳定基团的结构单元的聚合物和由式（1）表示的化合物的光致抗蚀剂组合物。 在式（1）中，R 1表示氢原子或一价酸不稳定基团。 R 2表示碳原子数3〜20的脂环式烃基，（m + 1）价。 m为2〜5的整数.R 3和R 4各自独立地表示氢原子，氟原子，碳原子数1〜20的一价烃基或碳原子数1〜20的1价氟代烃基。 n是0至5的整数。任选地并入多个R 1中的至少两个表示环结构，以及与R1结合的多个氧原子和构成R 2的碳原子并键合到这些氧上 原子 M +表示一价可辐射降解的鎓阳离子。

    PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD
    7.
    发明申请
    PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD 有权
    光电组合物和电阻形成方法

    公开(公告)号：US20130280657A1

    公开(公告)日：2013-10-24

    申请号：US13852147

    申请日：2013-03-28

    Applicant: JSR CORPORATION

    Inventor： Kazuki KASAHARA ,  Norihiko IKEDA

    IPC: G03F7/004 ,  G03F7/20 ,  G03F7/027

    CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

    Abstract: A photoresist composition includes a polymer component that includes a first structural unit represented by the formula (1) and a second structural unit represented by the formula (2), an acid generator, and a compound represented by the formula (3). The first structural unit and the second structural unit are included in an identical polymer, or different polymers. R1 is hydrogen atom, fluorine atom, etc., R2 and R3 are independently hydrogen atom, fluorine atom, etc., a is an integer from 1 to 6, R4 and R5 independently hydrogen atom, fluorine atom, etc., R6 is hydrogen atom, fluorine atom, etc., R7 and R8 are each independently alkyl group having 1 to 4 carbon atoms, etc., R9 is alkyl group having 1 to 4 carbon atoms, etc., R10 is hydrogen atom, etc., A− is —N−—SO2—Ra, etc., and X+ is onium cation.

    Abstract translation: 光致抗蚀剂组合物包括聚合物组分，其包含由式（1）表示的第一结构单元和由式（2）表示的第二结构单元，酸产生剂和由式（3）表示的化合物。 第一结构单元和第二结构单元包含在相同的聚合物中，或不同的聚合物。 R1是氢原子，氟原子等，R2和R3独立地是氢原子，氟原子等，a是1〜6的整数，R4和R5独立地是氢原子，氟原子等，R6是氢 原子，氟原子等，R 7和R 8各自独立地为具有1〜4个碳原子的烷基等，R 9为具有1〜4个碳原子的烷基等，R 10为氢原子等，A- 是-N-SO 2 -Ra等，X +是鎓阳离子。

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