公开(公告)号：US20180356725A1

公开(公告)日：2018-12-13

申请号：US16104163

申请日：2018-08-17

Applicant: JSR CORPORATION

Inventor： Kazuki KASAHARA

IPC: G03F7/004

CPC classification number: G03F7/0047 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/16 ,  G03F7/2004 ,  G03F7/322

Abstract: A radiation-sensitive composition includes: particles including a metal oxide as a principal component; and a radiation-sensitive base-generating agent, wherein a percentage content of metal atoms included in the composition with respect to an entirety of metal atoms and metalloid atoms included in the composition is no less than 50 atom %. A metal atom constituting the metal oxide preferably includes a zirconium atom, a hafnium atom, a chromium atom, a nickel atom, a cobalt atom, a tin atom, an indium atom, a titanium atom, a ruthenium atom, a tantalum atom, a tungsten atom, an iron atom, a copper atom, a zinc atom, an aluminum atom, a gallium atom, a thallium atom, a bismuth atom or a combination thereof. A pattern-forming method includes: applying the aforementioned radiation-sensitive composition on one face side of a substrate to form a film; exposing the film; and developing the film exposed.

公开(公告)号：US20130216948A1

公开(公告)日：2013-08-22

申请号：US13851158

申请日：2013-03-27

Applicant: JSR CORPORATION

Inventor： Kazuki KASAHARA ,  Hiromitsu NAKASHIMA ,  Masafumi HORI ,  Masafumi YOSHIDA

IPC: G03F7/004

CPC classification number: G03F7/004 ,  C07D307/93 ,  C07D493/18 ,  C08F220/20 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38 ,  H01L21/0274 ,  H01L21/0275

Abstract: A radiation-sensitive resin composition for forming a resist film includes a polymer including a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). The first structural unit and the second structural unit are included in an identical polymer molecule or different polymer molecules. R1 represents a hydrogen atom or a methyl group. Q represents a divalent linking group having 1 to 4 carbon atoms. X represents a monovalent lactone group. A part or all of hydrogen atoms included in the monovalent lactone group represented by X are not substituted or substituted. R2 represents a hydrogen atom or a methyl group. Y represents a monovalent lactone group. A part or all of hydrogen atoms included in the monovalent lactone group represented by Y are not substituted or substituted.

Abstract translation: 用于形成抗蚀剂膜的辐射敏感性树脂组合物包括含有由式（1）表示的第一结构单元和由式（2）表示的第二结构单元的聚合物。 第一结构单元和第二结构单元包含在相同的聚合物分子或不同的聚合物分子中。 R1表示氢原子或甲基。 Q表示碳原子数为1〜4的二价连接基团。 X表示单价内酯基。 由X表示的一价内酯基中的一部分或全部氢原子不被取代或取代。 R2表示氢原子或甲基。 Y表示单价内酯基。 由Y表示的一价内酯基中包含的一部分或全部氢原子不被取代或取代。

公开(公告)号：US20190033713A1

公开(公告)日：2019-01-31

申请号：US16145499

申请日：2018-09-28

Applicant: JSR CORPORATION ,  CORNELL UNIVERSITY

Inventor： Kazuki KASAHARA ,  Vasiliki Kosma ,  Mufei Yu ,  Emmanuel P. Giannelis ,  Christopher K. Ober

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/32 ,  G03F7/20

Abstract: A radiation-sensitive composition includes a metal-containing component and an organic solvent. The metal-containing component includes particles including a metal oxide as a principal component. The metal-containing component includes at least two metal atoms which are different from one another, and a percentage content of the at least two metal atoms with respect to an entirety of metal atoms and metalloid atoms in the composition is no less than 50 atom %. The metal-containing component preferably includes: a first metal atom that is at least one selected from a titanium atom, a zirconium atom, a hafnium atom, a zinc atom, a tin atom and an indium atom; and a second metal atom that is at least one selected from a lanthanum atom and an yttrium atom.

公开(公告)号：US20130095428A1

公开(公告)日：2013-04-18

申请号：US13653468

申请日：2012-10-17

Applicant: JSR Corporation

Inventor： Kazuki KASAHARA ,  Kazuo NAKAHARA ,  Hiromu MIYATA ,  Tomoki NAGAI

IPC: G03F7/027

CPC classification number: G03F7/0397 ,  C08F220/18 ,  C08K5/42 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  C08L33/14 ,  C08F2220/1841 ,  C08F2220/283 ,  C08F2220/382 ,  C08F220/42 ,  C08F220/22 ,  C08F2220/1875 ,  C08L33/16

Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1) and a base polymer. In the formula (1), R1 represents a monovalent cyclic organic group having a cyclic ester structure or a cyclic ketone structure; R2 represents a single bond or —CH2—; X is —O—*, —COO—*, —O—CO—O—* or —SO2-O—*, wherein * denotes a binding site to R3; R3 represents a bivalent chain hydrocarbon group having 1 to 5 carbon atoms; and M+ is a monovalent cation. The base polymer has a structural unit derived from (meth)acrylate that includes a lactone skeleton, a structural unit derived from (meth)acrylate that includes a cyclic carbonate skeleton, a structural unit derived from (meth)acrylate that includes a sultone skeleton, a structural unit derived from (meth)acrylate that includes a polar group, or a combination thereof. R1—R2—X—R3—CHF—CF2—SO3−M+  (1)

Abstract translation: 辐射敏感性树脂组合物包含由下式（1）表示的化合物和基础聚合物。 式（1）中，R 1表示具有环状酯结构或环状酮结构的1价的环状有机基团， R 2表示单键或-CH 2 - ; X是-O-，-COO- *，-O-CO-O- *或-SO2-O- *，其中*表示与R3的结合位点; R3表示碳原子数为1〜5的二价链烃基; M +是一价阳离子。 基础聚合物具有衍生自包含内酯骨架的（甲基）丙烯酸酯的结构单元，衍生自包含环状碳酸酯骨架的（甲基）丙烯酸酯的结构单元，衍生自包含磺内酯骨架的（甲基）丙烯酸酯的结构单元， 衍生自包括极性基团的（甲基）丙烯酸酯的结构单元或其组合。 R1-R2-X-R3-CHF-CF2-SO3-M +（1）

公开(公告)号：US20190094691A1

公开(公告)日：2019-03-28

申请号：US16140933

申请日：2018-09-25

Applicant: JSR CORPORATION

Inventor： Kazuki KASAHARA

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/32 ,  G03F7/20 ,  G03F7/38

Abstract: A radiation-sensitive composition includes: particles including a metal oxide as a principal component; a radiation-sensitive acid generator; and an acid trapper, wherein a percentage content of silicon atoms with respect to an entirety of metal atoms in the composition is less than 50 atom %. The mean particle diameter of the particles is preferably no greater than 20 nm. A pattern-forming method includes: applying the aforementioned radiation-sensitive composition on a substrate to form a film; exposing the film; and developing the film exposed. A developer solution used in the developing is preferably an alkaline aqueous solution. A developer solution used in the developing may be an organic solvent-containing liquid. A radioactive ray used in the exposing is preferably an extreme ultraviolet ray or an electron beam.

公开(公告)号：US20170242336A1

公开(公告)日：2017-08-24

申请号：US15435862

申请日：2017-02-17

Applicant: JSR CORPORATION

Inventor： Kazuki KASAHARA

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16 ,  G03F7/38

CPC classification number: G03F7/0043 ,  B32B5/16 ,  G03F7/0045 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/38

Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, a radiation-sensitive acid generator, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A van der Waals volume of an acid generated from the radiation-sensitive acid generator is no less than 2.0×10−28 m3. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %.

公开(公告)号：US20130280657A1

公开(公告)日：2013-10-24

申请号：US13852147

申请日：2013-03-28

Applicant: JSR CORPORATION

Inventor： Kazuki KASAHARA ,  Norihiko IKEDA

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/027

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041

Abstract: A photoresist composition includes a polymer component that includes a first structural unit represented by the formula (1) and a second structural unit represented by the formula (2), an acid generator, and a compound represented by the formula (3). The first structural unit and the second structural unit are included in an identical polymer, or different polymers. R1 is hydrogen atom, fluorine atom, etc., R2 and R3 are independently hydrogen atom, fluorine atom, etc., a is an integer from 1 to 6, R4 and R5 independently hydrogen atom, fluorine atom, etc., R6 is hydrogen atom, fluorine atom, etc., R7 and R8 are each independently alkyl group having 1 to 4 carbon atoms, etc., R9 is alkyl group having 1 to 4 carbon atoms, etc., R10 is hydrogen atom, etc., A− is —N−—SO2—Ra, etc., and X+ is onium cation.

Abstract translation: 光致抗蚀剂组合物包括聚合物组分，其包含由式（1）表示的第一结构单元和由式（2）表示的第二结构单元，酸产生剂和由式（3）表示的化合物。 第一结构单元和第二结构单元包含在相同的聚合物中，或不同的聚合物。 R1是氢原子，氟原子等，R2和R3独立地是氢原子，氟原子等，a是1〜6的整数，R4和R5独立地是氢原子，氟原子等，R6是氢 原子，氟原子等，R 7和R 8各自独立地为具有1〜4个碳原子的烷基等，R 9为具有1〜4个碳原子的烷基等，R 10为氢原子等，A- 是-N-SO 2 -Ra等，X +是鎓阳离子。

公开(公告)号：US20210318613A9

公开(公告)日：2021-10-14

申请号：US16897326

申请日：2020-06-10

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Ken MARUYAMA ,  Kazuki KASAHARA ,  Tsuyoshi FURUKAWA ,  Natsuko KINOSHITA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F212/14 ,  C08F220/18

Abstract: A radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and a compound represented by formula (2). The polymer includes a first structural unit including a phenolic hydroxyl group, a second structural unit including a group represented by formula (1), and a third structural unit including an acid-labile group. In the formula (1), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms, wherein at least one of R1, R2, R3, R4, R5, and R6 represents a fluorine atom or a fluorinated hydrocarbon group; RA represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to a part other than the group represented by the formula (1).

公开(公告)号：US20140212813A1

公开(公告)日：2014-07-31

申请号：US14242957

申请日：2014-04-02

Applicant: JSR Corporation

Inventor： Yuusuke ASANO ,  Mitsuo SATOU ,  Hiromitsu NAKASHIMA ,  Kazuki KASAHARA ,  Yoshifumi OIZUMI ,  Masafumi HORI ,  Takanori KAWAKAMI ,  Yasuhiko MATSUDA ,  Kazuo NAKAHARA

IPC: G03F7/038

CPC classification number: G03F7/0392 ,  C08F20/22 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1   (x)

Abstract translation: 辐射敏感性树脂组合物包括包含酸不稳定基团的第一聚合物，暴露于辐射时产生酸的酸产生剂和包含氟原子的第二聚合物和由通式（x）表示的官能团。 第二聚合物的氟原子含量高于第一聚合物的氟原子含量。 R1表示碱不稳定基团。 A表示氧原子，-NR' - ， - CO-O - 或-SO 2 -O - ，其中由A表示的氧原子不是直接与芳环键合的氧原子，羰基或 磺酰基，R'表示氢原子或碱不稳定基团，“＃”和“##”表示与R1键合的键。 -A-R1（x）

公开(公告)号：US20140023968A1

公开(公告)日：2014-01-23

申请号：US14037659

申请日：2013-09-26

Applicant: JSR CORPORATION

Inventor： Hiromitsu NAKASHIMA ,  Toru KIMURA ,  Yusuke ASANO ,  Masafumi HORI ,  Reiko KIMURA ,  Kazuki KASAHARA ,  Hiromu MIYATA ,  Masafumi YOSHIDA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0041 ,  C08F220/22 ,  C08F220/24 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/027 ,  H01L21/0274

Abstract: A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film

Abstract translation: 抗蚀剂图案形成方法包括使用辐射敏感性树脂组合物在基板上提供具有30至40mN / m的表面自由能的抗蚀剂膜。 通过经由掩模施加辐射来曝光抗蚀剂膜。 显影出抗蚀剂膜。 优选的是，抗蚀剂膜的曝光包括通过设置在抗蚀剂膜上的浸渍液体曝光抗蚀剂膜