公开(公告)号：US20230259032A1

公开(公告)日：2023-08-17

申请号：US18138873

申请日：2023-04-25

Applicant: JSR CORPORATION

Inventor： Miki TAMADA ,  Ryo KUMEGAWA ,  Hiroyuki KOMATSU ,  Motohiro SHIRATANI ,  Ken MARUYAMA ,  Sosuke OSAWA

IPC: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12

CPC classification number: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12 ,  C08F2810/40

Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.

公开(公告)号：US20230027151A1

公开(公告)日：2023-01-26

申请号：US17847228

申请日：2022-06-23

Applicant: JSR CORPORATION

Inventor： Ryo KUMEGAWA ,  Sosuke Osawa ,  Miki Tamada ,  Ken Maruyama ,  Motohiro Shiratani

IPC: B05D1/32 ,  C08J5/18

Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

公开(公告)号：US20230203229A1

公开(公告)日：2023-06-29

申请号：US18108108

申请日：2023-02-10

Applicant: JSR CORPORATION

Inventor： Miki TAMADA ,  Ryo KUMEGAWA ,  Motohiro SHIRATANI ,  Hiroyuki KOMATSU ,  Ken MARUYAMA ,  Sosuke OSAWA

IPC: C08F297/02 ,  G03F7/00 ,  G03F7/075

CPC classification number: C08F297/026 ,  G03F7/0035 ,  G03F7/0757 ,  C08F2810/40

Abstract: A composition includes a polymer (1) having a partial structure represented by formula (1), and a solvent. X is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Y is a monovalent organic group having 1 to 12 carbon atoms and containing a hetero atom or a monovalent inorganic acid group. Z is a linking group represented by —O—, —S—, or —NR—, where R is an organic group having 1 to 20 carbon atoms. R1 and R2 are each independently a hydrogen atom, a halogen atom, or an organic group having 1 to 20 carbon atoms, or the like.

公开(公告)号：US20210189553A1

公开(公告)日：2021-06-24

申请号：US17196006

申请日：2021-03-09

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Miki TAMADA ,  Ryo KUMEGAWA ,  Tatsuya SAKAI

IPC: C23C16/06 ,  B05D1/00 ,  C23C16/455

Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.