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公开(公告)号：US11572632B2
公开(公告)日：2023-02-07
申请号：US16674676
申请日：2019-11-05
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Kouichi Takemoto , Toru Imori , Takashi Ouchi , Hirofumi Takahashi
Abstract: Provided is a method for manufacturing high purity tin including: depositing electrodeposited tin on the surface of a cathode by electrowinning in an electrolytic bath in which a diaphragm is placed between an anode and the cathode, by using a raw material for tin as the anode and a leachate obtained by electrolytically leaching the raw material for tin in a sulfuric acid solution as an electrolytic solution, the electrolytic solution containing a smoothing agent for improving a surface property of the electrodeposited tin; discharging the electrolytic solution from the electrolytic bath such that lead in the discharged electrolytic solution is removed; and putting the electrolytic solution from which lead is removed back into the electrolytic bath.
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公开(公告)号：US10781024B2
公开(公告)日：2020-09-22
申请号：US16078139
申请日：2017-02-17
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Toru Imori , Koichi Takemoto , Hideaki Fukuyo , Shiro Tsukamoto , Takahiro Uchida , Masatomi Murakami
Abstract: Provided is a high-purity tin product that does not contain undesirable carbonaceous impurities as a result of the following: a vacuum-packed high-purity metal article (vacuum-packed high-purity tin article) is obtained by vacuum packaging a high-purity metal (high-purity tin), at least a portion of a surface of a high-purity metal being covered with a fluorocarbon resin sheet; and the vacuum-packed high-purity metal article(vacuum-packed high-purity tin article) is obtained by vacuum packaging, with a vacuum packaging film, the high-purity metal in which at least a portion of a surface is covered with the fluorocarbon resin sheet.
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3.发明申请公开(公告)号：US20160097139A1
公开(公告)日：2016-04-07
申请号：US14872316
申请日：2015-10-01
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Kouichi Takemoto , Toru Imori , Takashi Ouchi , Hirofumi Takahashi
Abstract: Provided is a method for manufacturing high purity tin including: depositing electrodeposited tin on the surface of a cathode 11 by electrowinning in an electrolytic bath in which a diaphragm 14 is placed between an anode 12 and the cathode 11, by using a raw material for tin as the anode 12 and a leachate obtained by electrolytically leaching the raw material for tin in a sulfuric acid solution as an electrolytic solution, the electrolytic solution containing a smoothing agent for improving a surface property of the electrodeposited tin; discharging the electrolytic solution from the electrolytic bath such that lead in the discharged electrolytic solution is removed; and putting the electrolytic solution from which lead is removed back into the electrolytic bath.
Abstract translation: 本发明提供一种制造高纯度锡的方法，包括：通过在阳极12和阴极11之间放置隔膜14的电解槽中电沉积在阴极11的表面上沉积电沉积锡，使用锡原料 作为阳极12和通过电解浸提硫酸原料中的锡作为电解液而获得的渗滤液，所述电解液含有用于提高电沉积锡的表面性质的平滑剂; 从电解槽排出电解液，使排出的电解液中的铅被除去; 并将从其中除去铅的电解溶液返回到电解槽中。
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公开(公告)号：US11118276B2
公开(公告)日：2021-09-14
申请号：US15775731
申请日：2017-03-02
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Toru Imori , Koichi Takemoto
Abstract: Provided is high purity tin having purity of 5N (99.999% by mass), which can suppress generation of particles. According to the high purity tin, the number of particles each having a particle diameter of 0.5 μm or more is 50,000 or less per a gram.
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公开(公告)号：US10400342B2
公开(公告)日：2019-09-03
申请号：US15574039
申请日：2016-10-12
Applicant: JX NIPPON MINING & METALS CORPORATION
Inventor： Toru Imori , Kouichi Takemoto
Abstract: Provided is a high purity tin (Sn) having an extremely low oxygen content. A high purity tin having a tin purity of 5N (99.999% by mass, provided that carbon, nitrogen, oxygen and hydrogen are excluded) or more, wherein the high purity tin has an oxygen content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS.
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Patent Agency Ranking
公开(公告)号：US20170108594A1
公开(公告)日：2017-04-20
申请号：US15391207
申请日：2016-12-27
Applicant: JX NIPPON MINING & METALS CORPORATION
Inventor： Masaomi Murakami , Makoto Mikami , Kouji Murakami , Akira Noda , Toru Imori
IPC: G01T1/24 , H01L31/02 , H01L31/115 , H01L31/0224
CPC classification number: G01T1/24 , H01L24/05 , H01L24/06 , H01L24/09 , H01L27/144 , H01L27/146 , H01L27/14634 , H01L27/14636 , H01L27/14676 , H01L27/14696 , H01L31/02005 , H01L31/022408 , H01L31/0296 , H01L31/02966 , H01L31/08 , H01L31/115 , H01L2224/0345 , H01L2224/03464 , H01L2224/0558 , H01L2224/05583 , H01L2224/05584 , H01L2224/05644 , H01L2224/05655 , H01L2224/05664
Abstract: The present invention provides a radiation detector UBM electrode structure body and a radiation detector which suppress the degradation of metal electrode layers at the time of formation of UBM layers and achieve sufficient electric characteristics, and a method of manufacturing the same. A radiation detector UBM electrode structure body according to the present invention includes a substrate made of CdTe or CdZnTe, comprising a Pt or Au electrode layer formed on the substrate by electroless plating, an Ni layer formed on the Pt or Au electrode layer by sputtering, and an Au layer formed on the Ni layer by sputtering.
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公开(公告)号：US12129529B2
公开(公告)日：2024-10-29
申请号：US17287205
申请日：2020-02-27
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Takahiro Uchida , Toru Imori , Koichi Takemoto , Shiro Tsukamoto
CPC classification number: C22C13/00 , B65D81/2007
Abstract: In the present invention, a high-purity metallic tin suitable for use in an EUV exposure device is provided through use of an oxidation-resistant metallic tin, the oxidation-resistant metallic tin containing 99.995 mass % or more of tin, and unavoidable impurities, and the thickness of an oxide film being 2.0 nm or less when the surface of a cut face of the oxidation-resistant metallic tin is measured by AES.
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公开(公告)号：US11136680B2
公开(公告)日：2021-10-05
申请号：US16514554
申请日：2019-07-17
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Toru Imori , Kouichi Takemoto
Abstract: Provided is a high purity tin (Sn) having an extremely low oxygen content. A high purity tin having a tin purity of 5N (99.999% by mass, provided that carbon, nitrogen, oxygen and hydrogen are excluded) or more, wherein the high purity tin has an oxygen content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS.
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9.发明申请公开(公告)号：US20200071842A1
公开(公告)日：2020-03-05
申请号：US16674676
申请日：2019-11-05
Applicant: JX Nippon Mining & Metals Corporation
Inventor： Kouichi Takemoto , Toru Imori , Takashi Ouchi , Hirofumi Takahashi
Abstract: Provided is a method for manufacturing high purity tin including: depositing electrodeposited tin on the surface of a cathode by electrowinning in an electrolytic bath in which a diaphragm is placed between an anode and the cathode, by using a raw material for tin as the anode and a leachate obtained by electrolytically leaching the raw material for tin in a sulfuric acid solution as an electrolytic solution, the electrolytic solution containing a smoothing agent for improving a surface property of the electrodeposited tin; discharging the electrolytic solution from the electrolytic bath such that lead in the discharged electrolytic solution is removed; and putting the electrolytic solution from which lead is removed back into the electrolytic bath.
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10.发明授权公开(公告)号：US09823362B2
公开(公告)日：2017-11-21
申请号：US15391207
申请日：2016-12-27
Applicant: JX NIPPON MINING & METALS CORPORATION
Inventor： Masaomi Murakami , Makoto Mikami , Kouji Murakami , Akira Noda , Toru Imori
IPC: G01T1/24 , H01L23/00 , H01L27/144 , H01L27/146 , H01L31/08 , H01L31/02 , H01L31/0224 , H01L31/115 , H01L31/0296
CPC classification number: G01T1/24 , H01L24/05 , H01L24/06 , H01L24/09 , H01L27/144 , H01L27/146 , H01L27/14634 , H01L27/14636 , H01L27/14676 , H01L27/14696 , H01L31/02005 , H01L31/022408 , H01L31/0296 , H01L31/02966 , H01L31/08 , H01L31/115 , H01L2224/0345 , H01L2224/03464 , H01L2224/0558 , H01L2224/05583 , H01L2224/05584 , H01L2224/05644 , H01L2224/05655 , H01L2224/05664
Abstract: The present invention provides a radiation detector UBM electrode structure body and a radiation detector which suppress the degradation of metal electrode layers at the time of formation of UBM layers and achieve sufficient electric characteristics, and a method of manufacturing the same. A radiation detector UBM electrode structure body according to the present invention includes a substrate made of CdTe or CdZnTe, comprising a Pt or Au electrode layer formed on the substrate by electroless plating, an Ni layer formed on the Pt or Au electrode layer by sputtering, and an Au layer formed on the Ni layer by sputtering.
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