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公开(公告)号：US20090268190A1
公开(公告)日：2009-10-29
申请号：US12428110
申请日：2009-04-22
CPC分类号： G03B27/58 , G03F7/70816
摘要： A lithographic apparatus includes a bearing configured to support a first part with respect to a second part of the apparatus in a first direction such that the first part is moveable in a second direction relative to the second part. The bearing passively supports the first part in three degrees of freedom. The first part is coupled to at least one permanent magnet, and the second part is coupled to at least two permanent magnets. The permanent magnet of the first part is positioned substantially between the permanent magnets of the second part. A field orientation of the permanent magnets is substantially parallel to the first direction and the permanent magnet of the first part has a substantially opposite polarity to at least one of the magnets of the second part.
摘要翻译： 光刻设备包括轴承，该轴承构造成在第一方向上相对于设备的第二部分支撑第一部分，使得第一部件可相对于第二部件在第二方向上移动。 轴承以三自由度被动地支撑第一部分。 第一部分耦合到至少一个永磁体，而第二部分耦合到至少两个永磁体。 第一部分的永磁体基本位于第二部分的永磁体之间。 永磁体的场方位基本上平行于第一方向，并且第一部分的永磁体具有与第二部分的至少一个磁体基本上相反的极性。
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公开(公告)号：US08059261B2
公开(公告)日：2011-11-15
申请号：US10855976
申请日：2004-05-28
申请人： Antoine Hendrik Verweij , Jacobus Frederik Molenaar , Gerbrand Petrus Johannes Van Den Hoven , Michael Johannes Vervoordeldonk , Michel Gerardus Pardoel , Gerardus Johannes Verdoes , Jan Van Eijk
发明人： Antoine Hendrik Verweij , Jacobus Frederik Molenaar , Gerbrand Petrus Johannes Van Den Hoven , Michael Johannes Vervoordeldonk , Michel Gerardus Pardoel , Gerardus Johannes Verdoes , Jan Van Eijk
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70858
摘要： A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.
摘要翻译： 一种具有掩模装置的光刻投影装置，其用于遮蔽在将图案化光束成像到基板上之前将投影光束图案化的图案形成装置中的至少一个的部分。 掩模装置包括第一掩模结构，以使第一方向上的所述图案形成装置的所述部分模糊，以及在第二不同方向上遮蔽所述部分的第二掩模结构，其中所述第一和第二掩模结构设置在所述焦点附近 平面相对于彼此以机械方式分离布置。
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公开(公告)号：US08900853B2
公开(公告)日：2014-12-02
申请号：US13063961
申请日：2008-09-23
CPC分类号： B01L7/52 , B01L3/50851 , B01L2300/18 , B01L2300/1838
摘要： A thermocycling device includes a sample holder, a thermal reference and a heating and cooling device which is arranged between the sample holder and thermal reference. The heating and cooling device is in thermally conductive contact with the sample holder and with the thermal reference. The thermocycling device further includes a reference heating and cooling device for maintaining the temperature of the thermal reference at a predetermined temperature level during cycling, and a heat sink which is in thermally conductive contact with the reference heating and/or cooling device.
摘要翻译： 热循环装置包括样品保持器，热参考和布置在样品保持器和热参考之间的加热和冷却装置。 加热和冷却装置与样品保持器和热参考件导热接触。 热循环装置还包括参考加热和冷却装置，用于在循环期间将热参考的温度保持在预定的温度水平，以及与参考加热和/或冷却装置导热接触的散热器。
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公开(公告)号：US20080219889A1
公开(公告)日：2008-09-11
申请号：US12064082
申请日：2006-08-11
申请人： Danny Genius Aldegonda Schaefer , Adrianus Wihelmus Dionisius Maria Van Den Bijgaart , Michiel De Jong , Ronald Cornelis De Gier , Jacobus Frederik Molenaar , Ralph Theodorus Hubertus Maessen , Roger Maria Helmut Godfried Wehrens , Peter Hermanus Bouma , Chris Van Haag
发明人： Danny Genius Aldegonda Schaefer , Adrianus Wihelmus Dionisius Maria Van Den Bijgaart , Michiel De Jong , Ronald Cornelis De Gier , Jacobus Frederik Molenaar , Ralph Theodorus Hubertus Maessen , Roger Maria Helmut Godfried Wehrens , Peter Hermanus Bouma , Chris Van Haag
CPC分类号： G01N35/00029 , B01L3/50273 , B01L3/502738 , B01L7/52 , B01L9/527 , B01L2200/10 , B01L2200/16 , B01L2300/021 , B01L2300/087 , B01L2400/0478 , B01L2400/0487 , B01L2400/0644 , G01N2035/00237
摘要： The invention provides a system, a processing apparatus, a sample unit, a reagent unit and a method for processing a biological sample in the inside of the sample unit. The system comprises at least a processing apparatus and a sample unit, the sample unit comprises a plurality of microfluidic elements, the processing apparatus comprises actuation means capable of actuating at the microfluidic elements such that a quick, cheap and accurate analysis of the biological sample is possible.
摘要翻译： 本发明提供了一种在样品单元内部处理生物样品的系统，处理装置，样品单元，试剂单元和方法。 所述系统至少包括处理装置和样品单元，所述样品单元包括多个微流体元件，所述处理装置包括能够致动所述微流体元件的致动装置，使得对所述生物样品进行快速，便宜且准确的分析是 可能。
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公开(公告)号：US20110165628A1
公开(公告)日：2011-07-07
申请号：US13063961
申请日：2008-09-23
CPC分类号： B01L7/52 , B01L3/50851 , B01L2300/18 , B01L2300/1838
摘要： The present invention is related to a thermocycling device (10), comprising at least one sample holder (11), at least one thermal reference (12) and at least one heating and/or cooling device (13), which is arranged between said sample holder(s) and said thermal reference. Said heating and/or cooling device is in thermally conductive contact with said sample holder(s) and with the thermal reference. Furthermore, the device comprises at least one reference heating and/or cooling device (14) for maintaining the temperature of the thermal reference at a predetermined temperature level during cycling and a heat sink (15) which is in thermally conductive contact with said reference heating and/or cooling device (14).
摘要翻译： 本发明涉及一种热循环装置（10），其包括至少一个样品保持器（11），至少一个热参考（12）和至少一个加热和/或冷却装置（13），其布置在所述 样品架和所述热参考。 所述加热和/或冷却装置与所述样品保持器和热参考物导热接触。 此外，该装置包括至少一个参考加热和/或冷却装置（14），用于在热循环期间将热参考基准的温度保持在预定的温度水平，以及与所述参考加热器导热接触的散热器（15） 和/或冷却装置（14）。
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公开(公告)号：US20100136525A1
公开(公告)日：2010-06-03
申请号：US11993508
申请日：2006-06-23
CPC分类号： B01L3/50857 , B01L3/5023 , B01L2400/0475
摘要： The invention provides an analysis device (1) and method, that enables repeatedly pumping a sample fluid (50) with one or more analytes through a substrate (10) with one or more binding materials, even when the wetted substrate has a relatively low bubble pressure. Thereto, the device (1) comprises a first volume (16) and a second volume (18), and a return channel (22) with a valve (24) as well as a pump (20). The pump (20) can establish a pressure difference between the first volume (16) and the second volume (18), to pump the sample fluid (50) through the substrate (10), thereby allowing analyte to bind to the substrate. By opening the valve (24) and establishing a reversed pressure difference, sample fluid (50) bypasses the substrate (10) through the return channel (22). After closing the valve, the device is ready for a subsequent cycle, if desired. The device and method allow the analysis of in principle any amount of sample fluid, and the use of any type of substrate with respect to bubble pressure, and is thus more versatile and robust.
摘要翻译： 本发明提供了一种分析装置（1）和方法，其使得能够通过具有一种或多种粘合材料的基底（10）将一种或多种分析物反复泵送样品流体（50），即使当润湿的基底具有相对较低的气泡 压力。 此外，装置（1）包括第一容积（16）和第二容积（18），以及具有阀（24）的回流通道（22）以及泵（20）。 泵（20）可以在第一容积（16）和第二容积（18）之间建立压力差，以将样品流体（50）泵送通过衬底（10），从而允许分析物结合衬底。 通过打开阀（24）并建立反向的压力差，样品流体（50）通过返回通道（22）绕过衬底（10）。 关闭阀门后，如果需要，设备可以进行后续循环。 该装置和方法允许原则上分析任何量的样品流体，以及使用相对于气泡压力的任何类型的底物，因此更具通用性和鲁棒性。
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