COMPOSITE MATERIAL PART HAVING A CERAMIC MATRIX, AND METHOD FOR MANUFACTURING SAME
    1.
    发明申请
    COMPOSITE MATERIAL PART HAVING A CERAMIC MATRIX, AND METHOD FOR MANUFACTURING SAME 审中-公开
    具有陶瓷矩阵的复合材料部件及其制造方法

    公开(公告)号:US20120164430A1

    公开(公告)日:2012-06-28

    申请号:US13393978

    申请日:2010-07-21

    Abstract: In a composite material part having a ceramic matrix and including a fibrous reinforcement which is densified by a matrix consisting of a plurality of ceramic layers having a crack-diverting matrix interphase positioned between two adjacent ceramic matrix layers, the interphase includes a first phase made of a material capable of promoting the diversion of a crack reaching the interphase according to a first propagation mode in the transverse direction through one of the two ceramic matrix layers adjacent to the interphase, such that the propagation of the crack continues according to a second propagation mode along the interphase, and a second phase consisting of discrete contact pads that are distributed within the interphase and capable of promoting the diversion of the crack that propagates along the interphase according to the second propagation mode, such that the propagation of the crack is diverted and continues according to the first propagation mode through the other ceramic matrix layer that is adjacent to the interphase.

    Abstract translation: 在具有陶瓷基体并且包括纤维增强物的复合材料部件中,所述纤维增强体由由位于两个相邻的陶瓷基体层之间的具有裂纹转向矩阵相的多个陶瓷层组成的基体致密化,所述界面包括由 能够通过与相间相邻的两个陶瓷基体层中的一个,沿横向促进根据第一传播模式到达界面的裂纹的转移的材料,使得裂纹的传播根据第二传播模式继续 以及第二相,其包括分布在界面内的离散接触垫,并且能够促进根据第二传播模式沿着相间传播的裂纹的转移,使得裂纹的传播被转移,并且 根据第一传播模式通过另一陶瓷继续 与相间相邻的基质层。

    METHOD OF DENSIFYING THIN POROUS SUBSTRATES BY CHEMICAL VAPOR INFILTRATION, AND A LOADING DEVICE FOR SUCH SUBSTRATES
    3.
    发明申请
    METHOD OF DENSIFYING THIN POROUS SUBSTRATES BY CHEMICAL VAPOR INFILTRATION, AND A LOADING DEVICE FOR SUCH SUBSTRATES 有权
    通过化学气相渗透法测量多孔基底的方法,以及用于这种基底的加载装置

    公开(公告)号:US20120171375A1

    公开(公告)日:2012-07-05

    申请号:US13420014

    申请日:2012-03-14

    CPC classification number: C23C16/045 C23C16/45578 C23C16/4587

    Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).

    Abstract translation: 为了通过化学气相渗透致密化多孔基底(1),本发明提出使用装载工具(10),其包括设置在第一和第二板(12,13)之间的管状管道(10),并且用于致密化的薄基底 径向地 然后以这种方式装载的工具然后放置在具有连接到管状管道(11)的反应气体进入入口(21)的浸入式烘箱中的反应室(20)内,以使反应气体能够进入管道 沿着基本上径向的流动方向沿着基板(1)上的主面分布气体。 反应气体也可以在相反的方向上流动,即可以从其外壳(16)进入工具(10),并且可以经由管道(11)移除。

    Method and installation for the densification of substrates by means of chemical vapor infiltration
    4.
    发明授权
    Method and installation for the densification of substrates by means of chemical vapor infiltration 有权
    通过化学气相渗透使基材致密化的方法和安装

    公开(公告)号:US07691440B2

    公开(公告)日:2010-04-06

    申请号:US10475464

    申请日:2003-01-14

    Abstract: A method of densifying porous substrates by chemical vapor infiltration comprises loading porous substrates for densification in a loading zone of an enclosure (10), heating the internal volume of the enclosure, and introducing a reagent gas into the enclosure though an inlet situated at one end of the enclosure. Before coming into contact with substrates (20) situated in the loading zone, the reagent gas admitted into the enclosure is preheated, at least in part, by passing along a duct (30) connected to the gas inlet and extending through the loading zone, the duct being raised to the temperature inside the enclosure, and the preheated reagent gas is distributed in the loading zone through one or more openings (33) formed in the side wall (32) of the duct, along the duct.

    Abstract translation: 通过化学气相渗透致密化多孔基材的方法包括在壳体(10)的装载区域中加载多孔基材用于致密化,加热外壳的内部体积,并且通过位于一端的入口将反应气体引入外壳 的外壳。 在与位于装载区域中的基板(20)接触之前,允许进入外壳的反应气体至少部分地通过连接到气体入口并延伸穿过装载区域的管道(30)进行预热, 所述管道升高到所述外壳内部的温度,并且所述预热的反应气体沿着所述管道通过形成在所述管道的侧壁(32)中的一个或多个开口(33)分布在所述装载区域中。

    Controllable Information Diffusion Method
    9.
    发明申请
    Controllable Information Diffusion Method 审中-公开
    可控信息扩散方法

    公开(公告)号:US20090276832A1

    公开(公告)日:2009-11-05

    申请号:US12085264

    申请日:2006-11-21

    CPC classification number: H04L12/189 H04L12/1854 H04L51/34

    Abstract: A method of sending data via a communications network NTWK interconnecting terminals (T0 Tj TN). The method includes a step of storing information (Int0) at the command of the initiator terminal (T0) in a memory space S(Inf0) which is accessible to non-initiator terminals (T1, . . . , Tj, . . . , TN) only in read mode and a step of sending a non-initiator terminal a solicitation message Sm(1,P,A0,T1,T2) giving the location (A0) of said memory space S(Inf0). This method makes it possible to prevent the formation of loops perpetually circulating out-of-date requests.

    Abstract translation: 一种通过通信网络NTWK互连终端(T0 Tj TN)发送数据的方法。 该方法包括以下步骤:在发起者终端(T0)的命令下将信息(Int0)存储在非发起者终端(T1 ...,Tj ...等)可访问的存储空间S(Inf0) TN),以及给非发起者终端发送给出所述存储器空间S(Inf0)的位置(A0)的请求消息Sm(1,P,A0,T1,T2)的步骤。 这种方法使得可以防止循环永久地循环过期请求。

    Device for Loading Porous Substrates of Three-Dimensional Shape in Order to be Densified by Directed Flow Chemical Vapor Infiltration
    10.
    发明申请
    Device for Loading Porous Substrates of Three-Dimensional Shape in Order to be Densified by Directed Flow Chemical Vapor Infiltration 审中-公开
    用于加载三维形状多孔基材的装置,以通过定向流化学气相渗透

    公开(公告)号:US20150075428A1

    公开(公告)日:2015-03-19

    申请号:US14348412

    申请日:2012-09-14

    CPC classification number: C23C16/045 C23C16/455 C23C16/458

    Abstract: A loader device for loading porous substrates of three-dimensional shapes extending mainly in a longitudinal direction into a reaction chamber of an infiltration oven for densification of the preforms by directed flow chemical vapor infiltration. The device comprising at least one annular loader stage formed by first and second annular vertical walls arranged coaxially relative to each other and defining between them an annular loader space for the porous substrates to be densified. First and second plates respectively cover the bottom portion and the top portion of the annular loader space. The first and second annular vertical walls include support elements arranged in the annular loader space so as to define between them unit loader cells, each for receiving a respective substrate to be densified. The device also comprises gas feed orifices and gas exhaust orifices in the vicinity of each unit loader cell.

    Abstract translation: 一种装载装置,用于将主要沿纵向延伸的三维形状的多孔基材装入浸入炉的反应室,用于通过定向流化学气相渗透致密化预制件。 该装置包括至少一个由第一和第二环形垂直壁形成的环形装载台,该第一和第二环形垂直壁相对于彼此同轴布置并且在它们之间限定用于使多孔基底致密的环形装载空间。 第一和第二板分别覆盖环形装载机空间的底部和顶部。 第一和第二环形垂直壁包括布置在环形加载器空间中的支撑元件,以便在它们之间限定单元装载单元,每个单元用于接收要被致密化的相应基板。 该装置还包括在每个装载单元附近的气体进料孔和排气孔。

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