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1.发明申请STORAGE CAPACITOR FOR ELECTROMECHANICAL SYSTEMS AND METHODS OF FORMING THE SAME 审中-公开用于机电系统的存储电容器及其形成方法公开(公告)号：US20130120416A1
公开(公告)日：2013-05-16
申请号：US13301539
申请日：2011-11-21
申请人： Jae Hyeong Seo , Ming-Hau Tung , Marc M. Mignard
发明人： Jae Hyeong Seo , Ming-Hau Tung , Marc M. Mignard
CPC分类号： F16D3/56 , F16C11/12 , G02B26/001 , H01G5/16 , Y10T29/435
摘要： This disclosure provides systems, methods and apparatus for storage capacitors. In one aspect, an electromechanical systems (EMS) device includes a substrate, an optical stack disposed over the substrate, a mechanical layer positioned over the optical stack, and a storage capacitor. The optical stack includes a stationary electrode and at least one dielectric layer disposed over the stationary electrode, and the storage capacitor includes a first plate, a second plate and a dielectric structure disposed between the first and second plates. The first plate includes a portion of the mechanical layer positioned over an optically non-active region of the device, and the dielectric structure of the storage capacitor includes a portion of the at least one dielectric layer of the optical stack.
摘要翻译： 本公开提供了用于存储电容器的系统，方法和装置。 一方面，机电系统（EMS）装置包括衬底，设置在衬底上的光学堆叠，位于光学堆叠上的机械层和存储电容器。 光学堆叠包括固定电极和设置在固定电极上的至少一个电介质层，并且存储电容器包括设置在第一和第二板之间的第一板，第二板和电介质结构。 第一板包括位于器件的光学无效区域上的机械层的一部分，并且存储电容器的电介质结构包括光学堆叠的至少一个电介质层的一部分。
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2.发明申请STORAGE CAPACITOR FOR ELECTROMECHANICAL SYSTEMS AND METHODS OF FORMING THE SAME 审中-公开用于机电系统的存储电容器及其形成方法公开(公告)号：US20130120327A1
公开(公告)日：2013-05-16
申请号：US13533778
申请日：2012-06-26
申请人： Jae Hyeong Seo , Ming-Hau Tung , Marc M. Mignard , Rihui He
发明人： Jae Hyeong Seo , Ming-Hau Tung , Marc M. Mignard , Rihui He
CPC分类号： G02B26/001
摘要： This disclosure provides systems, methods and apparatus for storage capacitors. In one aspect, a device includes an array having at least a first display element and a second display element, at least one switch configured to control a flow of charge between a source and the first display element, and at least one interferometric optical mask structure disposed in a non-active area of the array between the first display element and the second display element. The optical mask structure includes a storage capacitor formed by a first conductive layer and a second conductive layer. The storage capacitor is electrically coupled to the at least one switch and the first display element.
摘要翻译： 本公开提供了用于存储电容器的系统，方法和装置。 一方面，一种装置包括具有至少第一显示元件和第二显示元件的阵列，至少一个开关，被配置为控制源极与第一显示元件之间的电荷流动，以及至少一个干涉光学掩模结构 设置在第一显示元件和第二显示元件之间的阵列的非有源区域中。 光掩模结构包括由第一导电层和第二导电层形成的存储电容器。 存储电容器电耦合到至少一个开关和第一显示元件。
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公开(公告)号：US20120274611A1
公开(公告)日：2012-11-01
申请号：US13094480
申请日：2011-04-26
CPC分类号： H01L27/1214 , G02B26/001 , H01L29/78633 , H01L29/78645 , H01L29/78696
摘要： This disclosure provides systems, methods and apparatus relating to pixel designs for use in active matrix displays which employ poly-silicon (p-Si) thin-film transistors (TFTs) having dual gate structures to control the pixels. The poly-silicon island of the TFT is configured to take advantage of the black mask area attributable to other non-reflective display components, thus enhancing the fill factor of the display.
摘要翻译： 本公开提供了与使用具有双栅极结构的多晶硅（p-Si）薄膜晶体管（TFT））来控制像素的有源矩阵显示器中用于像素设计的系统，方法和装置。 TFT的多晶硅岛被配置为利用归因于其他非反射显示元件的黑色掩模区域，从而增强了显示器的填充因子。
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公开(公告)号：US09110281B2
公开(公告)日：2015-08-18
申请号：US13624530
申请日：2012-09-21
CPC分类号： G02B26/001 , G02B5/08 , G02F1/19 , G06F3/044 , G06F15/00
摘要： This disclosure provides systems, methods and apparatus for masked reflective structures which can be integrated into display devices. In one aspect, masks and etch leading layers can be used to control the etching of a stack of layers to form masked reflective structures having a desired profile. In particular, tapered edges at a particular angle can be formed, and the resulting structures used in a roll-to-roll process to fabricate a device component.
摘要翻译： 本公开提供了可以集成到显示装置中的用于掩模反射结构的系统，方法和装置。 在一个方面，掩模和蚀刻引导层可用于控制层叠层的蚀刻以形成具有所需轮廓的掩模反射结构。 特别地，可以形成特定角度的锥形边缘，并且所得到的结构用于卷对卷过程以制造器件部件。
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公开(公告)号：US09019590B2
公开(公告)日：2015-04-28
申请号：US13337494
申请日：2011-12-27
IPC分类号： G02B26/00 , G02F1/1335
CPC分类号： G02F1/21 , G02B26/001 , G02F1/1335 , G02F2001/13356
摘要： A spatial light modulator comprises an integrated optical compensation structure, e.g., an optical compensation structure arranged between a substrate and a plurality of individually addressable light-modulating elements, or an optical compensation structure located on the opposite side of the light-modulating elements from the substrate. The individually addressable light-modulating elements are configured to modulate light transmitted through or reflected from the transparent substrate. Methods for making such spatial light modulators involve fabricating an optical compensation structure over a substrate and fabricating a plurality of individually addressable light-modulating elements over the optical compensation structure. The optical compensation structure may be a passive optical compensation structure. The optical compensation structure may include one or more of a supplemental frontlighting source, a diffuser, a black mask, a diffractive optical element, a color filter, an anti-reflective layer, a structure that scatters light, a microlens array, and a holographic film.
摘要翻译： 空间光调制器包括集成的光学补偿结构，例如，布置在基板和多个可单独寻址的光调制元件之间的光学补偿结构，或位于光调制元件的相对侧上的光学补偿结构 基质。 可单独寻址的光调制元件被配置为调制透射通过或从透明基板反射的光。 制造这种空间光调制器的方法包括在衬底上制造光学补偿结构，并在光学补偿结构上制造多个单独可寻址的光调制元件。 光学补偿结构可以是无源光学补偿结构。 光学补偿结构可以包括补充前照明光源，漫射器，黑色掩模，衍射光学元件，滤色器，抗反射层，散射光的结构，微透镜阵列和全息图中的一个或多个 电影。
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公开(公告)号：US08300299B2
公开(公告)日：2012-10-30
申请号：US13098292
申请日：2011-04-29
申请人： Ming-Hau Tung , Lior Kogut
发明人： Ming-Hau Tung , Lior Kogut
IPC分类号： G02B26/00 , H01L21/311
CPC分类号： B81C1/00801 , B81B3/001 , B81B3/0072 , B81B2201/042 , B81C2201/0109 , B81C2201/017 , B81C2201/112 , B81C2201/115 , G02B26/001 , Y10T428/30 , Y10T428/31678 , Y10T428/31935
摘要： Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.
摘要翻译： 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。
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公开(公告)号：US08045252B2
公开(公告)日：2011-10-25
申请号：US12034499
申请日：2008-02-20
CPC分类号： G02F1/21 , G02B26/001 , G02F1/1335 , G02F2001/13356
摘要： A spatial light modulator comprises an integrated optical compensation structure, e.g., an optical compensation structure arranged between a substrate and a plurality of individually addressable light-modulating elements, or an optical compensation structure located on the opposite side of the light-modulating elements from the substrate. The individually addressable light-modulating elements are configured to modulate light transmitted through or reflected from the transparent substrate. Methods for making such spatial light modulators involve fabricating an optical compensation structure over a substrate and fabricating a plurality of individually addressable light-modulating elements over the optical compensation structure. The optical compensation structure may be a passive optical compensation structure. The optical compensation structure may include one or more of a supplemental frontlighting source, a diffuser, a black mask, a diffractive optical element, a color filter, an anti-reflective layer, a structure that scatters light, a microlens array, and a holographic film.
摘要翻译： 空间光调制器包括集成的光学补偿结构，例如，布置在基板和多个可单独寻址的光调制元件之间的光学补偿结构，或位于光调制元件的相对侧上的光学补偿结构 基质。 可单独寻址的光调制元件被配置为调制透射通过或从透明基板反射的光。 制造这种空间光调制器的方法包括在衬底上制造光学补偿结构，并在光学补偿结构上制造多个单独可寻址的光调制元件。 光学补偿结构可以是无源光学补偿结构。 光学补偿结构可以包括补充前照明光源，漫射器，黑色掩模，衍射光学元件，滤色器，抗反射层，散射光的结构，微透镜阵列和全息图中的一个或多个 电影。
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8.发明申请公开(公告)号：US20110205197A1
公开(公告)日：2011-08-25
申请号：US13099221
申请日：2011-05-02
申请人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
发明人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, both rivets and posts may be used. In certain embodiments, these support structures are formed from rigid inorganic materials, such as metals or oxides. In certain embodiments, etch barriers may also be deposited to facilitate the use of materials in the formation of support structures which are not selectively etchable with respect to other components within the MEMS device.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。 在某些实施例中，可以使用铆钉和柱。 在某些实施方案中，这些支撑结构由诸如金属或氧化物的刚性无机材料形成。 在某些实施例中，还可以沉积蚀刻阻挡层以促进材料在形成相对于MEMS器件内的其它部件不能选择性蚀刻的支撑结构的形成中的使用。
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公开(公告)号：US20110199667A1
公开(公告)日：2011-08-18
申请号：US13092827
申请日：2011-04-22
IPC分类号： G02B26/02 , G02F1/13357
CPC分类号： G02B26/001
摘要： Methods and apparatus for providing lighting in a display are provided. In one embodiment, a microelectromechanical system (MEMS) is provided that includes a transparent substrate and a plurality of interferometric modulators. The interferometric modulators include an optical stack coupled to the transparent substrate, a reflective layer over the optical stack, and one or more posts to support the reflective layer and to provide a path for light from a backlight for lighting the display.
摘要翻译： 提供了用于在显示器中提供照明的方法和装置。 在一个实施例中，提供了包括透明基板和多个干涉式调制器的微机电系统（MEMS）。 干涉式调制器包括耦合到透明衬底的光学叠层，光学叠层上的反射层，以及支撑反射层的一个或多个柱，以及为来自背光源的光提供用于点亮显示器的路径。
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公开(公告)号：US07936031B2
公开(公告)日：2011-05-03
申请号：US11491490
申请日：2006-07-21
申请人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
发明人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
IPC分类号： H01L31/0232
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, both rivets and posts may be used. In certain embodiments, these support structures are formed from rigid inorganic materials, such as metals or oxides. In certain embodiments, etch barriers may also be deposited to facilitate the use of materials in the formation of support structures which are not selectively etchable with respect to other components within the MEMS device.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。 在某些实施例中，可以使用铆钉和柱。 在某些实施方案中，这些支撑结构由诸如金属或氧化物的刚性无机材料形成。 在某些实施例中，还可以沉积蚀刻阻挡层以促进材料在形成相对于MEMS器件内的其它部件不能选择性蚀刻的支撑结构的形成中的使用。
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