Communication system network interconnecting a plurality of
communication systems
    2.
    发明授权
    Communication system network interconnecting a plurality of communication systems 失效
    通信系统网络互连多个通信系统

    公开(公告)号:US5175727A

    公开(公告)日:1992-12-29

    申请号:US509915

    申请日:1990-04-16

    IPC分类号: H04W84/08

    摘要: The present invention discloses a communication system network that comprises a plurality of communication systems and a processing multiplexer. The communication systems, which may be either conventional communication systems and/or trunked communication systems, transmit digitized audio signals and communication system data to the processing multiplexer. Based on signal destination data, which is part of the communication system data, the processing multiplexer processes the digitized signals and routes the resultant signals to the appropriate signal destinations of the communication systems.

    摘要翻译: 本发明公开了一种包括多个通信系统和处理多路复用器的通信系统网络。 可以是常规通信系统和/或集群通信系统的通信系统将数字化音频信号和通信系统数据发送到处理多路复用器。 基于作为通信系统数据的一部分的信号目的地数据,处理多路复用器处理数字化的信号并将结果信号路由到通信系统的适当的信号目的地。

    Stereolithographic patterning with variable size exposure areas
    3.
    发明授权
    Stereolithographic patterning with variable size exposure areas 失效
    具有可变尺寸曝光区域的立体光刻图案

    公开(公告)号:US06833234B1

    公开(公告)日:2004-12-21

    申请号:US09922973

    申请日:2001-08-06

    IPC分类号: G03F700

    摘要: Methods for the preparation of multilayered resists are described. To efficiently pattern large contiguous areas rapidly, a procedure has been developed using spot-size modulation of the focused laser beam to more efficiently pattern interior portions. Critical portions at the perimeter are patterned at high resolutions. The spot-size is progressively increased towards the interior allowing a controlled transition to coarser spot-sizes without impacting the exposure dose in critical portions. Patterning times are significantly reduced since in effect shells are patterned. An algorithm is defined to subdivide a layer into different zones, determine the appropriate focused spot-sizes used for each zone, and define the laser scan trace within a zone to enable efficient patterning of broad areas in positive tone resists.

    摘要翻译: 描述制备多层抗蚀剂的方法。 为了有效地模拟大的连续区域,已经开发了使用聚焦激光束的聚焦尺寸调制以更有效地模制内部部分的程序。 周边的临界部分以高分辨率图案化。 斑点尺寸逐渐增加到内部,允许可控过渡到较粗的斑点尺寸,而不影响临界部分中的曝光剂量。 图案化时间显着减少,因为实际上壳被图案化。 定义一种算法来将图层细分为不同的区域,确定用于每个区域的合适的聚焦点尺寸,并在区域内定义激光扫描轨迹,以实现正色调抗蚀剂中广泛区域的有效图案化。

    PHOTON PROCESSING WITH NANOPATTERNED MATERIALS
    5.
    发明申请
    PHOTON PROCESSING WITH NANOPATTERNED MATERIALS 审中-公开
    光子加工与纳米材料

    公开(公告)号:US20100089443A1

    公开(公告)日:2010-04-15

    申请号:US12566278

    申请日:2009-09-24

    摘要: Methods, devices, and compositions related to organic solar cells, sensors, and other photon processing devices are disclosed. In some aspects, an organic semiconducting composition is formed with nano-sized features, e.g., a layer conforming to a shape exhibiting nano-sized tapered features. Such structures can be formulated as an organic n-type and/or an organic p-type layer incorporated in a device that exhibits enhanced conductor mobility relative to conventional structures such as planar layered formed organic semiconductors. The nanofeatures can be formed on an exciton blocking layer (“EBL”) surface, with an organic semiconducting layer deposited thereon to conform with the EBL's surface features. A variety of material possibilities are disclosed, as well as a number of different configurations. Such organic structures can be used to form flexible solar cells in a roll-out format.

    摘要翻译: 公开了与有机太阳能电池,传感器和其他光子处理装置有关的方法,装置和组合物。 在一些方面,有机半导体组合物形成有纳米尺寸的特征,例如符合呈纳米尺寸锥形特征的形状的层。 这种结构可以配制成结合在相对于常规结构如平面层状形成的有机半导体的表现出增强的导体迁移率的器件中的有机n型和/或有机p型层。 纳米尺度可以在激子阻挡层(“EBL”)表面上形成,其上沉积有机半导体层以符合EBL的表面特征。 公开了各种材料的可能性,以及许多不同的配置。 这种有机结构可用于以滚出格式形成柔性太阳能电池。

    Stereolithographic patterning with interlayer surface modifications
    6.
    发明授权
    Stereolithographic patterning with interlayer surface modifications 失效
    具有层间表面改性的立体光刻图案

    公开(公告)号:US06730256B1

    公开(公告)日:2004-05-04

    申请号:US09923164

    申请日:2001-08-06

    IPC分类号: B29C3508

    摘要: Methods for the preparation of multilayered resists include exposure of the a first layer to radiation followed by exposure to an oxidizing agent. The oxidizing agent alters the surface characteristics of the first resist layer such that it is rendered more hydrophilic than the original resist layer. A second layer of resist is then applied to the oxidized surface of the first resist layer and exposed to radiation. This process can be repeated for thousands of coating layers, thereby permitting stereolithographic patterning of parts and construction of micromachines. A final treatment with a dissolution solution will dissolve unwanted resist material. Dependent upon the type of resist material used in the multilayered resist, the dissolution solution can remove the radiation exposed areas, e.g., a positive resist, or remove unexposed areas, e.g., a negative resist.

    摘要翻译: 制备多层抗蚀剂的方法包括将第一层暴露于辐射,然后暴露于氧化剂。 氧化剂改变第一抗蚀剂层的表面特性,使其比原始抗蚀剂层变得更亲水。 然后将第二层抗蚀剂施加到第一抗蚀剂层的氧化表面并暴露于辐射。 该过程可以重复数千个涂层,从而允许部件的立体光刻图案和微机械的构造。 用溶解溶液的最终处理将溶解不需要的抗蚀剂材料。 取决于在多层抗蚀剂中使用的抗蚀剂材料的类型,溶解溶液可以去除辐射暴露区域,例如正性抗蚀剂,或去除未曝光的区域,例如负性抗蚀剂。

    Stereolithographic patterning by variable dose light delivery
    7.
    发明授权
    Stereolithographic patterning by variable dose light delivery 失效
    通过可变剂量光输送的立体光刻图案

    公开(公告)号:US06777170B1

    公开(公告)日:2004-08-17

    申请号:US09922974

    申请日:2001-08-06

    IPC分类号: G03F700

    摘要: Methods for the preparation of multilayered resists are described. A first layer of photoresist is deposited onto a substrate. First portions of the first layer are exposed to a first dose of radiant energy. A second layer of photoresist is deposited at atop the first layer and second portions of the second layer are exposed to a second varied dose of radiant energy. The dose is modulated over different portions of a layer to preferentially enhance development within the interior of the structure to reduce total development times.

    摘要翻译: 描述制备多层抗蚀剂的方法。 第一层光致抗蚀剂沉积在基底上。 第一层的第一部分暴露于第一剂量的辐射能。 第二层光致抗蚀剂沉积在第一层的顶部,第二层的第二部分暴露于第二变化量的辐射能。 剂量在层的不同部分进行调节,以优先增强结构内部的发育,以减少总开发时间。

    Methods for fabricating three-dimensional micro structures
    8.
    发明授权
    Methods for fabricating three-dimensional micro structures 失效
    制造三维微结构的方法

    公开(公告)号:US5389196A

    公开(公告)日:1995-02-14

    申请号:US828247

    申请日:1992-01-30

    摘要: A method for producing a three-dimensional object includes the steps of providing an interface plane within a chamber and generating a beam of radiant energy having varied levels of beam energy density. The beam is directed to selectively expose a pattern of address points on the interface plane to the beam of radiant energy for a limited duration. Conditions are established in the chamber to enable the beam to induce a micro-chemical reaction at the interface plane at a rate which serves to form a portion of the three-dimensional object. A significant feature of the invention is that the micro-chemical reaction is substantially binary with respect to the beam energy density. That is, the reaction is either substantially "on" or substantially "off."

    摘要翻译: 一种用于制造三维物体的方法包括以下步骤:在室内提供界面,并产生具有不同程度的束能量密度的辐射能束。 光束被引导以在有限的持续时间内选择性地将接口平面上的地址点的图案暴露于辐射能量束。 在腔室中建立了条件,以使束能够以界面处的微量化学反应,其速率用于形成三维物体的一部分。 本发明的一个重要特征是微量化学反应相对于束能量密度基本上是二进制的。 也就是说,反应基本上“开”或基本上“脱落”。