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    POLYMERIZABLE PHOTOACID GENERATORS
    1.
    发明申请
    POLYMERIZABLE PHOTOACID GENERATORS 有权
    聚合光电发生器

    公开(公告)号：US20120171616A1

    公开(公告)日：2012-07-05

    申请号：US13339948

    申请日：2011-12-29

    申请人： James W. Thackeray ,  Suzanne M. Coley ,  Vipul Jain ,  Owendi Ongayi ,  James F. Cameron ,  Paul J. LaBeaume ,  Ahmad E. Madkour

    发明人： James W. Thackeray ,  Suzanne M. Coley ,  Vipul Jain ,  Owendi Ongayi ,  James F. Cameron ,  Paul J. LaBeaume ,  Ahmad E. Madkour

    IPC分类号： G03F7/20 ,  C07C69/593 ,  G03F7/004 ,  C07C69/54 ,  C08F228/06 ,  C08G63/688

    CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

    摘要： A compound has formula (I): Q-O-(A)-Z−G+  (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

    摘要翻译： 化合物具有式（I）：QO-（A）-Z-G +（I）其中Q是卤代或非卤代的含C30-30烯烃基团，A是氟取代的C1-30亚烷基， 氟取代的C3-30亚环烷基，氟取代的C6-30亚芳基或氟取代的C7-30亚烷基 - 亚芳基，Z是包含磺酸酯，磺酰胺或磺酰胺的阴离子基团，G +具有式 （II）：其中X为S或I，每个R 0为卤代或非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R0中的一个可任选地通过单键连接到一个相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X 是S，a是3。公开了共聚物，光致抗蚀剂，涂布的基材和图案化方法。

    PHOTOACID GENERATORS
    4.
    发明申请
    PHOTOACID GENERATORS 有权
    光电发生器

    公开(公告)号：US20120141939A1

    公开(公告)日：2012-06-07

    申请号：US13307198

    申请日：2011-11-30

    申请人： James W. Thackeray ,  Suzanne M. Coley ,  James F. Cameron ,  Paul J. LaBeaume ,  Ahmad E. Madkour ,  Owendi Ongayi ,  Vipul Jain

    发明人： James W. Thackeray ,  Suzanne M. Coley ,  James F. Cameron ,  Paul J. LaBeaume ,  Ahmad E. Madkour ,  Owendi Ongayi ,  Vipul Jain

    IPC分类号： G03F7/20 ,  C07C309/06 ,  G03F7/027

    CPC分类号： C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A photoacid generator compound has formula (I): G+Z−  (I) wherein G has formula (II): In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R0 groups are further attached to an adjacent R0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.

    摘要翻译： 光致酸发生剂化合物具有式（I）：G + Z-（I）其中G具有式（II）：在式（II）中，X是S或I，每个R 0通常与X连接并且独立地为C 1-30 烷基; 多环或单环C 3-30环烷基; 多环或单环C 6-30芳基; 或包含前述组中的至少一个的组合。 G的分子量大于263.4g / mol，或小于263.4g / mol。 一个或多个R 0基团进一步连接到相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X是S时，a是2或3.在式（I）中的Z包括 磺酸的阴离子，磺酰亚胺或磺酰胺。 光致抗蚀剂和涂膜也包括光致酸产生剂，并且形成电子器件的方法使用光致抗蚀剂。

    PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION
    5.
    发明申请
    PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION 有权
    光敏共聚物和光电组合物

    公开(公告)号：US20120129105A1

    公开(公告)日：2012-05-24

    申请号：US13298761

    申请日：2011-11-17

    申请人： James W. Thackeray ,  Emad Aqad ,  Su Jin Kang ,  Owendi Ongayi

    发明人： James W. Thackeray ,  Emad Aqad ,  Su Jin Kang ,  Owendi Ongayi

    IPC分类号： G03F7/20 ,  C08F228/06 ,  G03F7/027 ,  C08F220/68 ,  G03F7/004

    CPC分类号： G03F7/0392 ,  C08F212/08 ,  C08F212/14 ,  C08F212/34 ,  C08F216/12 ,  G03F7/0045 ,  G03F7/0046 ,  C08F216/125 ,  C08F216/165 ,  C08F216/1466

    摘要： A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

    摘要翻译： 共聚物具有式：其中R1-R5独立地为H，C1-6烷基或C4-6芳基，R6为氟化或非氟化C5-30酸可分解基团; 每个Ar是单环，多环或稠合的多环C 6-20芳基; 每个R 7和R 8是-OR 11或-C（CF 3）2 OR 11，其中每个R 11是H，氟化或非氟化的C5-30酸可分解基团或其组合; 每个R 9独立地为F，C 1-10烷基，C 1-10氟烷基，C 1-10烷氧基或C 1-10氟烷氧基; R10是含阳离子结合的C10-40光酸产生剂基团，摩尔分数a，b和d分别为0〜0.80，c为0.01〜0.80，e为0〜0.50，a，b，d为0， e大于0，和a + b + c + d + e为1,1，m为1〜4的整数，n为0〜5的整数。光致抗蚀剂和被覆基材各自包含共聚物 。

    Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom
    6.
    发明授权
    Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom 有权
    光敏共聚物，包含共聚物的光致抗蚀剂，以及由其形成的制品

    公开(公告)号：US09182662B2

    公开(公告)日：2015-11-10

    申请号：US13752523

    申请日：2013-01-29

    申请人： Owendi Ongayi ,  James W. Thackeray

    发明人： Owendi Ongayi ,  James W. Thackeray

    IPC分类号： C08F220/22 ,  G03F7/039 ,  G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/004 ,  C08F220/22 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    摘要： A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.

    摘要翻译： 一种共聚物，其包含电子敏化酸可脱保护单体的聚合产物，例如具有式（XX）的单体和共聚单体：其中R a是H，F，-CN，C 1-10烷基或C 1-10氟烷基 ; Rx和Ry各自独立地为取代或未取代的C 1-10烷基或C 3-10环烷基; Rz是取代或未取代的含C6-20芳族基团或含C6-20脂环族基团; 其中Rx和Ry一起可选地形成环; 并且其中Rx，Ry和Rz中的至少一个被卤化。 还公开了包含共聚物的光致抗蚀剂和涂覆的基材，以及制造使用光致抗蚀剂的电子器件的方法。

    Photosensitive copolymer and photoresist composition
    7.
    发明授权
    Photosensitive copolymer and photoresist composition 有权
    光敏共聚物和光致抗蚀剂组合物

    公开(公告)号：US08703383B2

    公开(公告)日：2014-04-22

    申请号：US13298761

    申请日：2011-11-17

    申请人： James W. Thackeray ,  Emad Aqad ,  Su Jin Kang ,  Owendi Ongayi

    发明人： James W. Thackeray ,  Emad Aqad ,  Su Jin Kang ,  Owendi Ongayi

    IPC分类号： G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  C08F212/08 ,  C08F212/14 ,  C08F212/34 ,  C08F216/12 ,  G03F7/0045 ,  G03F7/0046 ,  C08F216/125 ,  C08F216/165 ,  C08F216/1466

    摘要： A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

    摘要翻译： 共聚物具有式：其中R1-R5独立地为H，C1-6烷基或C4-6芳基，R6为氟化或非氟化C5-30酸可分解基团; 每个Ar是单环，多环或稠合的多环C 6-20芳基; 每个R 7和R 8是-OR 11或-C（CF 3）2 OR 11，其中每个R 11是H，氟化或非氟化的C5-30酸可分解基团或其组合; 每个R 9独立地为F，C 1-10烷基，C 1-10氟烷基，C 1-10烷氧基或C 1-10氟烷氧基; R10是含阳离子结合的C10-40光酸产生剂基团，摩尔分数a，b和d分别为0〜0.80，c为0.01〜0.80，e为0〜0.50，a，b，d为0， e大于0，和a + b + c + d + e为1,1，m为1〜4的整数，n为0〜5的整数。光致抗蚀剂和被覆基材各自包含共聚物 。

    PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND ARTICLES FORMED THEREFROM
    8.
    发明申请
    PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND ARTICLES FORMED THEREFROM 有权
    光学共聚物，包含共聚物的光电子体及其形成的物品

    公开(公告)号：US20130209934A1

    公开(公告)日：2013-08-15

    申请号：US13752523

    申请日：2013-01-29

    申请人： Owendi Ongayi ,  James W. Thackeray

    发明人： Owendi Ongayi ,  James W. Thackeray

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  C08F220/22 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    摘要： A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.

    摘要翻译： 一种共聚物，其包含电子敏化酸可脱保护单体的聚合产物，例如具有式（XX）的单体和共聚单体：其中R a是H，F，-CN，C 1-10烷基或C 1-10氟烷基 ; Rx和Ry各自独立地为取代或未取代的C 1-10烷基或C 3-10环烷基; Rz是取代或未取代的含C6-20芳族基团或含C6-20脂环族基团; 其中Rx和Ry一起可选地形成环; 并且其中Rx，Ry和Rz中的至少一个被卤化。 还公开了包含共聚物的光致抗蚀剂和涂覆的基材，以及制造使用光致抗蚀剂的电子器件的方法。