公开(公告)号：US07834975B2

公开(公告)日：2010-11-16

申请号：US11441348

申请日：2006-05-26

申请人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

发明人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

IPC分类号： G03B27/42

CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

公开(公告)号：US07518706B2

公开(公告)日：2009-04-14

申请号：US11020557

申请日：2004-12-27

申请人： Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer ,  Jacobus Burghoorn

发明人： Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer ,  Jacobus Burghoorn

IPC分类号： G03B27/72 ,  G03B24/42 ,  G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70191 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70641

摘要： The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.

摘要翻译： 本发明涉及一种曝光装置，其包括用于提供投影射线束的照明系统，用于支撑设置有图案的装置的支撑结构，该装置用于使投影光束在其横截面上具有图案; 用于保持目标物体的桌子，用于将图案化的光束投影到目标物体上的投影系统和用于向投影光束提供倾斜的倾斜装置。 倾斜装置基本上设置在投影系统的光瞳平面中。

公开(公告)号：US07042550B2

公开(公告)日：2006-05-09

申请号：US10716939

申请日：2003-11-20

申请人： Martin Lowisch ,  Marcel Mathijs Theodore Marie Dierichs ,  Koen Van Ingen Schenau ,  Hans Van Der Laan ,  Martinus Hendrikus Antonius Leenders ,  Elaine McCoo ,  Uwe Mickan

发明人： Martin Lowisch ,  Marcel Mathijs Theodore Marie Dierichs ,  Koen Van Ingen Schenau ,  Hans Van Der Laan ,  Martinus Hendrikus Antonius Leenders ,  Elaine McCoo ,  Uwe Mickan

IPC分类号： G03B27/42 ,  G03B27/32 ,  G03F1/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/706

摘要： System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism.

摘要翻译： 系统像差在光刻设备的投影系统中实现，以优化具有倾斜照明的厚吸收体的厚反射掩模的成像。 像差可能包括Z 5散光，Z 9球形和Z 12散光。

公开(公告)号：US09158206B2

公开(公告)日：2015-10-13

申请号：US13032222

申请日：2011-02-22

申请人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

发明人： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。

公开(公告)号：US08687168B2

公开(公告)日：2014-04-01

申请号：US13083966

申请日：2011-04-11

申请人： Roelof Frederik De Graaf ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Roelof Frederik De Graaf ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G02B27/42 ,  G02B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US08427629B2

公开(公告)日：2013-04-23

申请号：US12871631

申请日：2010-08-30

申请人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

公开(公告)号：US08416395B2

公开(公告)日：2013-04-09

申请号：US12436635

申请日：2009-05-06

申请人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

发明人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

IPC分类号： G03B27/52 ,  G03B27/58

摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

公开(公告)号：US08237912B2

公开(公告)日：2012-08-07

申请号：US13043192

申请日：2011-03-08

申请人： Herman Boom ,  Borgert Kruizinga ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Huibert Visser ,  Peter Julian Pollard

发明人： Herman Boom ,  Borgert Kruizinga ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Huibert Visser ,  Peter Julian Pollard

IPC分类号： G03B27/52

CPC分类号： G03B27/522 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

摘要： A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.

摘要翻译： 用于投影系统的透镜元件包括凹面。 透镜元件还包括膜和喷嘴，所述膜至少覆盖透镜元件的凹面。 喷嘴布置成用于在凹面和膜之间提供和/或去除液体和/或气体。

公开(公告)号：US20110292357A1

公开(公告)日：2011-12-01

申请号：US13098830

申请日：2011-05-02

申请人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

发明人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/70 ,  G03F7/70341

摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。

公开(公告)号：US20110096307A1

公开(公告)日：2011-04-28

申请号：US12960947

申请日：2010-12-06

申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。