公开(公告)号：US07854820B2

公开(公告)日：2010-12-21

申请号：US11639264

申请日：2006-12-15

申请人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, Jr.

发明人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, Jr.

IPC分类号： H01L21/306 ,  C23C16/00

CPC分类号： H01J37/32449 ,  H01J37/32009 ,  H01J37/32541 ,  H01J37/3255

摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.

摘要翻译： 等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。 为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。 由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。 剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

公开(公告)号：US08702866B2

公开(公告)日：2014-04-22

申请号：US11640193

申请日：2006-12-18

申请人： Jason Augustino ,  Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, Jr.

发明人： Jason Augustino ,  Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, Jr.

IPC分类号： C23C16/455 ,  C23C16/50 ,  H01L21/3065

CPC分类号： H01L21/67069 ,  C23C16/45565 ,  C23C16/45582 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01L21/67017

摘要： A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.

摘要翻译： 提供了一种用于等离子体处理装置的喷头电极组件。 喷头电极组件包括附接到第二构件的第一构件。 第一和第二构件具有流体连通的第一和第二气体通道。 当处理气体流过气体通道时，跨越第一和第二气体通道产生总压降。 跨越第二气体通道的总压降的一小部分大于跨越第一气体通道的总压降的一部分。

公开(公告)号：US20110086513A1

公开(公告)日：2011-04-14

申请号：US12967750

申请日：2010-12-14

申请人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, JR.

发明人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, JR.

IPC分类号： H01L21/04 ,  C23C16/455

CPC分类号： H01J37/32449 ,  H01J37/32009 ,  H01J37/32541 ,  H01J37/3255

摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.

摘要翻译： 等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。 为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。 由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。 剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

公开(公告)号：US08709202B2

公开(公告)日：2014-04-29

申请号：US12967750

申请日：2010-12-14

申请人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, Jr.

发明人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty, Jr.

IPC分类号： H01L21/306 ,  C23C16/00

CPC分类号： H01J37/32449 ,  H01J37/32009 ,  H01J37/32541 ,  H01J37/3255

摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.

摘要翻译： 等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。 为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。 由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。 剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

公开(公告)号：US20080090417A1

公开(公告)日：2008-04-17

申请号：US11639264

申请日：2006-12-15

申请人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty

发明人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty

IPC分类号： H05H1/24 ,  C23F1/00 ,  H01L21/302

CPC分类号： H01J37/32449 ,  H01J37/32009 ,  H01J37/32541 ,  H01J37/3255

摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.

摘要翻译： 等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。 为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。 由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。 剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

公开(公告)号：US20080141941A1

公开(公告)日：2008-06-19

申请号：US11640193

申请日：2006-12-18

申请人： Jason Augustino ,  Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty

发明人： Jason Augustino ,  Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty

IPC分类号： C23C16/00 ,  H01L21/31

CPC分类号： H01L21/67069 ,  C23C16/45565 ,  C23C16/45582 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01L21/67017

摘要： A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.

摘要翻译： 提供了一种用于等离子体处理装置的喷头电极组件。 喷头电极组件包括附接到第二构件的第一构件。 第一和第二构件具有流体连通的第一和第二气体通道。 当处理气体流过气体通道时，跨越第一和第二气体通道产生总压降。 跨越第二气体通道的总压降的一小部分大于跨越第一气体通道的总压降的一部分。

公开(公告)号：US08628268B2

公开(公告)日：2014-01-14

申请号：US12922382

申请日：2009-03-13

申请人： Michael C. Kellogg ,  Anthony J. Norell ,  Anthony de la Llera ,  Rajinder Dhindsa

发明人： Michael C. Kellogg ,  Anthony J. Norell ,  Anthony de la Llera ,  Rajinder Dhindsa

IPC分类号： B25B5/08

CPC分类号： H01L21/68728 ,  H01L21/687 ,  Y10T403/7005 ,  Y10T403/7007 ,  Y10T403/7041

摘要： A cam lock clamp comprises a stud having a substantially cylindrical body with a first end including a head area and a second end arranged to support one or more disc springs concentrically about the stud. A socket is arranged to mechanically couple concentrically around the stud with the head area of the stud being exposed above an uppermost portion of the socket. The socket is configured to be firmly attached to a consumable material. A camshaft has a substantially cylindrical body and is configured to mount within a bore of a backing plate. The camshaft further comprises an eccentric cutout area located in a central portion of the camshaft body. The camshaft is configured to engage and lock the head area of the stud when the consumable material and the backing plate are proximate to one another.

摘要翻译： 凸轮锁定夹具包括具有基本上圆柱形主体的螺柱，其具有包括头部区域的第一端和布置成围绕螺柱同心地支撑一个或多个盘簧的第二端。 插座布置成以同心的方式围绕螺柱共同连接，螺柱的头部区域暴露在插座的最上部分之上。 插座被配置为牢固地连接到消耗材料上。 凸轮轴具有基本上圆柱形的主体并被构造成安装在背板的孔内。 凸轮轴还包括位于凸轮轴主体的中心部分的偏心切口区域。 凸轮轴构造成当消耗材料和背板彼此靠近时接合并锁定螺柱的头部区域。

公开(公告)号：US20110042879A1

公开(公告)日：2011-02-24

申请号：US12922382

申请日：2009-03-13

申请人： Michael C. Kellogg ,  Anthony J. Norell ,  Anthony de la Llera ,  Rajinder Dhindsa

发明人： Michael C. Kellogg ,  Anthony J. Norell ,  Anthony de la Llera ,  Rajinder Dhindsa

IPC分类号： B25B5/08

CPC分类号： H01L21/68728 ,  H01L21/687 ,  Y10T403/7005 ,  Y10T403/7007 ,  Y10T403/7041

摘要： A cam lock clamp comprises a stud having a substantially cylindrical body with a first end including a head area and a second end arranged to support one or more disc springs concentrically about the stud. A socket is arranged to mechanically couple concentrically around the stud with the head area of the stud being exposed above an uppermost portion of the socket. The socket is configured to be firmly attached to a consumable material. A camshaft has a substantially cylindrical body and is configured to mount within a bore of a backing plate. The camshaft further comprises an eccentric cutout area located in a central portion of the camshaft body. The camshaft is configured to engage and lock the head area of the stud when the consumable material and the backing plate are proximate to one another.

摘要翻译： 凸轮锁定夹具包括具有基本上圆柱形主体的螺柱，其具有包括头部区域的第一端和布置成围绕螺柱同心地支撑一个或多个盘簧的第二端。 插座布置成以同心的方式围绕螺柱共同连接，螺柱的头部区域暴露在插座的最上部分之上。 插座被配置为牢固地连接到消耗材料上。 凸轮轴具有基本上圆柱形的主体并被构造成安装在背板的孔内。 凸轮轴还包括位于凸轮轴主体的中心部分的偏心切口区域。 凸轮轴构造成当消耗材料和背板彼此靠近时接合并锁定螺柱的头部区域。