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    METHOD FOR SEPARATELY PROCESSING REGIONS ON A PATTERNED MEDIUM
    1.
    发明申请
    METHOD FOR SEPARATELY PROCESSING REGIONS ON A PATTERNED MEDIUM 有权
    在图形化介质上分离处理区域的方法

    公开(公告)号：US20140072830A1

    公开(公告)日：2014-03-13

    申请号：US13615131

    申请日：2012-09-13

    申请人： Jeffrey S. Lille ,  Kurt A. Rubin ,  Ricardo Ruiz ,  Lei Wan

    发明人： Jeffrey S. Lille ,  Kurt A. Rubin ,  Ricardo Ruiz ,  Lei Wan

    IPC分类号： G11B5/84 ,  G11B5/73 ,  B44C1/22

    CPC分类号： G11B5/855 ,  B81C1/00031 ,  G03F7/0035 ,  G11B5/743 ,  H01L21/0338 ,  Y10S977/888

    摘要： The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.

    摘要翻译： 本公开一般涉及一种用于制造图案化介质的方法。 该方法包括在光刻图案化的表面层下提供具有外部层的基底，光刻图案化的表面层包括第一区域中的第一图案和第二区域中的第二图案，在第一区域上施加第一掩蔽材料，转移 在第二区域中的第二图案进入外层，在光刻图案化表面层上形成自组装的嵌段共聚物结构，自组装嵌段共聚物结构与第一区域中的第一图案对准，在第一区域上施加第二掩模材料 第二区域，将聚合物嵌段图案转移到第一区域中的外部层中，并且根据转移到第二区域中的外部层的第二图案和在第一区域中转印到外部层的聚合物嵌段图案来蚀刻基板。

    Method for separately processing regions on a patterned medium
    2.
    发明授权
    Method for separately processing regions on a patterned medium 有权
    在图案化介质上单独处理区域的方法

    公开(公告)号：US09034197B2

    公开(公告)日：2015-05-19

    申请号：US13615131

    申请日：2012-09-13

    申请人： Jeffrey S. Lille ,  Kurt A. Rubin ,  Ricardo Ruiz ,  Lei Wan

    发明人： Jeffrey S. Lille ,  Kurt A. Rubin ,  Ricardo Ruiz ,  Lei Wan

    IPC分类号： B44C1/22 ,  G11B5/855 ,  G11B5/74 ,  G03F7/00 ,  B81C1/00 ,  H01L21/033

    CPC分类号： G11B5/855 ,  B81C1/00031 ,  G03F7/0035 ,  G11B5/743 ,  H01L21/0338 ,  Y10S977/888

    摘要： The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.

    摘要翻译： 本公开一般涉及一种用于制造图案化介质的方法。 该方法包括在光刻图案化的表面层下提供具有外部层的基底，光刻图案化的表面层包括第一区域中的第一图案和第二区域中的第二图案，在第一区域上施加第一掩蔽材料，转移 在第二区域中的第二图案进入外层，在光刻图案化表面层上形成自组装的嵌段共聚物结构，自组装嵌段共聚物结构与第一区域中的第一图案对准，在第一区域上施加第二掩模材料 第二区域，将聚合物嵌段图案转移到第一区域中的外部层中，并且根据转移到第二区域中的外部层的第二图案和在第一区域中转印到外部层的聚合物嵌段图案来蚀刻基板。

    Method to reduce written-in errors in storage media
    3.
    发明授权
    Method to reduce written-in errors in storage media 有权
    减少存储介质中写入错误的方法

    公开(公告)号：US08922922B2

    公开(公告)日：2014-12-30

    申请号：US13554281

    申请日：2012-07-20

    申请人： Michael K. Grobis ,  Kurt A. Rubin

    发明人： Michael K. Grobis ,  Kurt A. Rubin

    IPC分类号： G11B27/36

    CPC分类号： G11B5/09 ,  G11B5/1278 ,  G11B5/314 ,  G11B5/746 ,  G11B20/10009 ,  G11B2005/0021

    摘要： A method of storing data in a storage medium includes determining a compensation unit for a portion of the storage medium, reading a first set of bit values from the portion of the storage medium, determining a compensation value based at least in part on an erroneous bit value of the first set of bit values and the compensation unit, and storing the compensation value in association with the portion of the storage medium.

    摘要翻译： 一种在存储介质中存储数据的方法包括确定存储介质的一部分的补偿单元，从存储介质的该部分读取第一组位值，至少部分地基于错误位确定补偿值 所述第一组位值的值和所述补偿单元，并且将所述补偿值与所述存储介质的所述部分相关联地存储。

    Optical disk recording device using two modulated laser beams for recording information data
    6.
    发明授权
    Optical disk recording device using two modulated laser beams for recording information data 失效
    使用两个调制激光束记录信息数据的光盘记录装置

    公开(公告)号：US5530688A

    公开(公告)日：1996-06-25

    申请号：US332234

    申请日：1994-10-31

    申请人： Jerry E. Hurst, Jr. ,  Kurt A. Rubin ,  Yenyu Hsieh

    发明人： Jerry E. Hurst, Jr. ,  Kurt A. Rubin ,  Yenyu Hsieh

    IPC分类号： G11B7/0045 ,  G11B7/125 ,  G11B11/105 ,  G11B7/00

    CPC分类号： G11B7/126 ,  G11B11/1053 ,  G11B7/00454 ,  G11B7/127 ,  G11B7/0045

    摘要： An optical disk data storage system uses two lasers to write data on the disk, preferably using pulse width modulation (PWM). The lasers direct two independently controllable laser beams to the disk to form two spots that are spaced apart a fixed distance along the data track. Each laser is independently controlled by a modulator that causes the laser to emit the laser beam in a highly pulsed manner. The two laser beams can be simultaneously and independently pulsed along a single track and each beam may be pulsed on any given write clock period and at any of several different power levels. The pulsed lasers write spots of substantially the same size on the disk. The PWM run lengths are recorded on the disk as marks comprising either a single isolated spot or a series of contiguous or overlapping spots. The pulsing of the two lasers is synchronously interleaved so that either adjacent marks (mark-interleaved writing) or adjacent mark edges (edge-interleaved writing) are alternately written by the two lasers. In this manner, an amount of time elapses between the writing of successive marks or mark edges, thereby significantly reducing the effect of thermal buildup by allowing time for the data layer in the optical disk to cool.

    摘要翻译： 光盘数据存储系统使用两个激光器来在盘上写数据，优选地使用脉宽调制（PWM）。 激光器将两个可独立控制的激光束引导到盘，以形成沿着数据轨道间隔开固定距离的两个点。 每个激光器由调制器独立控制，该调制器使得激光以高度脉冲的方式发射激光束。 两个激光束可以沿着单个轨道同时且独立地脉冲，并且每个波束可以在任何给定的写时钟周期和几个不同功率电平中的任一个处被脉冲。 脉冲激光器在盘上写入基本上相同尺寸的光斑。 PWM运行长度作为标记记录在磁盘上，标记包括单个孤立点或一系列连续或重叠的点。 两个激光器的脉冲同步交错，使得两个激光器交替地写入相邻标记（标记交错写入）或相邻标记边缘（边缘交错写入）。 以这种方式，在连续标记或标记边缘的写入之间经过一段时间，从而通过允许光盘中的数据层的时间冷却来显着减少热积累的影响。

    Data storage method using state transformable materials
    9.
    发明授权
    Data storage method using state transformable materials 失效
    数据存储方法采用状态转换材料

    公开(公告)号：US4916688A

    公开(公告)日：1990-04-10

    申请号：US175835

    申请日：1988-03-31

    申请人： John S. Foster ,  Kurt A. Rubin ,  Daniel Rugar

    发明人： John S. Foster ,  Kurt A. Rubin ,  Daniel Rugar

    IPC分类号： G01Q60/00 ,  G11B9/00 ,  G11B9/14

    CPC分类号： G11B9/14 ,  G11B9/149 ,  B82Y10/00 ,  G11B9/1472 ,  Y10S977/947

    摘要： A unique method for recording, reading and erasing data bits in a data storage device is described. Using extended scanning tunneling microscopy (STM) techniques, a tunneling electron current by resistive heating selectively melts discrete areas of a state-transformable film; then heat is dissipated rapidly, writing data bits by changing the film in said areas from a first state to a second state wherein an electronic property, such as conductance, work function or band gap, in said areas is changed.Again, using extended STM techniques, the effect of this changed electronic property of said film on the tunneling current is measured for reading the written data bits. Minimizing the effect of blemishes on the material is effected, during operation in STM constant current mode by measuring dI/dV or dI/ds, and during operation in STM variable current (constant gap) mode by measuring (dI/dV)/I or (dI/ds)/I.Also by using extended STM techniques, data bits can be selectively erased by resistance heating the film to a temperature higher than the crystallization temperature for a sufficient period of time, restoring selected discrete areas to said first state and each affected electronic property substantially to its original condition.

    Method of fabricating a mask structure for patterning a workpiece by ions
    10.
    发明授权
    Method of fabricating a mask structure for patterning a workpiece by ions 有权
    通过离子制造用于图案化工件的掩模结构的方法

    公开(公告)号：US08906706B2

    公开(公告)日：2014-12-09

    申请号：US13415659

    申请日：2012-03-08

    申请人： Kanaiyalal C. Patel ,  Kurt A. Rubin

    发明人： Kanaiyalal C. Patel ,  Kurt A. Rubin

    IPC分类号： H01L21/00

    CPC分类号： G11B5/746 ,  G11B5/855 ,  H01F41/34 ,  H01L21/266

    摘要： A method of fabricating workpieces includes one or more layers on a substrate that are masked with an ion implantation mask comprising two or more layers. The mask layers include a first mask layer closer to the substrate, and a second mask layer on the first mask layer. The method also comprises ion implanting one or more of the layers on the substrate. Ion implantation may form portions with altered physical properties from the layers under the mask. The portions may form a plurality of non-magnetic regions corresponding to apertures in the mask.

    摘要翻译： 制造工件的方法包括在衬底上的一层或多层，其被包含两层或多层的离子注入掩模掩蔽。 掩模层包括靠近基板的第一掩模层和第一掩模层上的第二掩模层。 该方法还包括在衬底上离子注入一层或多层。 离子注入可以形成具有从掩模下面的层具有改变的物理性质的部分。 这些部分可以形成对应于掩模中的孔的多个非磁性区域。