Organic micro-cavity laser
    6.
    发明授权
    Organic micro-cavity laser 失效
    有机微腔激光器

    公开(公告)号:US06498802B1

    公开(公告)日:2002-12-24

    申请号:US09475118

    申请日:1999-12-30

    IPC分类号: H01S314

    摘要: An organic micro-cavity lasers which can reduce an optical loss and derive the lasing by the electrical pumping is disclosed. The laser of the present invention has a bottom mirror layer formed on a substrate, a bottom electrode formed on the bottom mirror layer, an active layer formed on the bottom electrode, a top electrode formed on a peripheral portion of the active layer and a top mirror layer formed on the active layer except the peripheral portion. Therefore, the laser of the present invention can greatly reduce the optical loss since it has the bottom mirror layer, the active layer and the top mirror layer. Also, the injection of current can sufficiently accomplished because the top electrode having a ring shape is formed at the peripheral portion of the active layer so as to inject the current to the active layer.

    摘要翻译: 公开了一种有机微腔激光器,其可以减少光学损耗并通过电泵浦导出激光。 本发明的激光器具有形成在基板上的底镜层,形成在底镜层上的底电极,形成在底电极上的有源层,形成在有源层周边部分上的顶电极和顶电极 除了外围部分之外,在活性层上形成的镜层。 因此,本发明的激光器由于具有底镜层,有源层和顶镜层,因此可以大大减少光损耗。 此外,由于在有源层的周边部分形成具有环形的顶部电极,以便将电流注入到有源层,所以可以充分地实现电流注入。

    Self aligned field effect transistor structure
    7.
    发明授权
    Self aligned field effect transistor structure 有权
    自对准场效应晶体管结构

    公开(公告)号:US08143670B2

    公开(公告)日:2012-03-27

    申请号:US12619116

    申请日:2009-11-16

    申请人: Lee-Mi Do Kyu-Ha Baek

    发明人: Lee-Mi Do Kyu-Ha Baek

    IPC分类号: H01L29/76

    摘要: Provided is a self aligned filed effect transistor structure. The self aligned field effect transistor structure includes: an active region on a substrate; a U-shaped gate insulation pattern on the active region; and a gate electrode self-aligned by the gate insulation pattern and disposed in an inner space of the gate insulation pattern.

    摘要翻译: 提供了自对准的场效应晶体管结构。 自对准场效应晶体管结构包括:衬底上的有源区; 活动区域上的U形栅绝缘图案; 以及通过栅极绝缘图案自对准并设置在栅极绝缘图案的内部空间中的栅电极。

    TEMPLATES USED FOR NANOIMPRINT LITHOGRAPHY AND METHODS FOR FABRICATING THE SAME
    8.
    发明申请
    TEMPLATES USED FOR NANOIMPRINT LITHOGRAPHY AND METHODS FOR FABRICATING THE SAME 审中-公开
    用于纳米压印的模板及其制作方法

    公开(公告)号:US20110104322A1

    公开(公告)日:2011-05-05

    申请号:US12763380

    申请日:2010-04-20

    IPC分类号: B28B11/08 B05D3/10

    摘要: Provided are a template used for nanoimprint lithography and a method for fabricating the same. A raised first deposition layer pattern including at least one downwardly sloped side surface is formed on a substrate. A second deposition layer pattern covering the side surface of the raised first deposition layer pattern and progressively decreasing in width downward along the side surface of the raised first deposition layer pattern is formed. A third deposition layer is formed on the entire surface of a structure on which the second deposition layer pattern. A second deposition layer nano pattern between the raised first deposition layer pattern and a planarized third deposition layer is formed by planarizing the third deposition layer to expose upper surfaces of the raised first deposition layer pattern and the second deposition layer pattern. An intaglio nano pattern defined by side surfaces sloped downward from upper surfaces of the raised first deposition layer pattern and the planarized third deposition layer to the surface of the substrate is formed by removing the second deposition layer nano pattern.

    摘要翻译: 提供了用于纳米压印光刻的模板及其制造方法。 在衬底上形成包括至少一个向下倾斜的侧表面的升高的第一沉积层图案。 形成覆盖凸起的第一沉积层图案的侧表面并且沿着凸起的第一沉积层图案的侧表面沿着宽度逐渐减小的第二沉积层图案。 第三沉积层形成在其上具有第二沉积层图案的结构的整个表面上。 在凸起的第一沉积层图案和平坦化的第三沉积层之间的第二沉积层纳米图案通过平坦化第三沉积层以暴露升高的第一沉积层图案和第二沉积层图案的上表面而形成。 通过去除第二沉积层纳米图案,形成由从凸起的第一沉积层图案的上表面向下倾斜的侧表面和平坦化的第三沉积层到基板的表面限定的凹版纳米图案。

    Self aligned field effect transistor structure
    9.
    发明授权
    Self aligned field effect transistor structure 有权
    自对准场效应晶体管结构

    公开(公告)号:US08324689B2

    公开(公告)日:2012-12-04

    申请号:US12635661

    申请日:2009-12-10

    申请人: Lee-Mi Do Kyu-Ha Baek

    发明人: Lee-Mi Do Kyu-Ha Baek

    IPC分类号: H01L29/66

    摘要: Provided is a self aligned field effect transistor structure. The self aligned field effect transistor structure includes: an active region pattern on a substrate; a first gate electrode and a second gate electrode facing each other with the active region pattern therebetween; and a source electrode and a drain electrode connected to the active region pattern and disposed to be symmetric with respect to a line connecting the first and second gate electrodes, wherein the first and second gate electrodes and the source and drain electrodes are disposed on the same plane of the substrate.

    摘要翻译: 提供了自对准场效应晶体管结构。 自对准场效应晶体管结构包括:衬底上的有源区图案; 第一栅极电极和第二栅极电极,其间具有有源区域图案; 以及源极电极和漏电极,连接到有源区域图案并且被设置为相对于连接第一和第二栅电极的线对称,其中第一和第二栅电极以及源电极和漏极彼此配置 基板的平面。